NL165604C - Veldmissie-elektonenmicroscoop. - Google Patents

Veldmissie-elektonenmicroscoop.

Info

Publication number
NL165604C
NL165604C NL7209179.A NL7209179A NL165604C NL 165604 C NL165604 C NL 165604C NL 7209179 A NL7209179 A NL 7209179A NL 165604 C NL165604 C NL 165604C
Authority
NL
Netherlands
Prior art keywords
electronic microscope
field mission
mission electronic
field
microscope
Prior art date
Application number
NL7209179.A
Other languages
English (en)
Other versions
NL165604B (nl
NL7209179A (nl
Original Assignee
American Optical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Optical Corp filed Critical American Optical Corp
Publication of NL7209179A publication Critical patent/NL7209179A/xx
Publication of NL165604B publication Critical patent/NL165604B/nl
Application granted granted Critical
Publication of NL165604C publication Critical patent/NL165604C/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/248—Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H01J37/292—Reflection microscopes using scanning ray
NL7209179.A 1970-06-15 1972-06-30 Veldmissie-elektonenmicroscoop. NL165604C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US4642570A 1970-06-15 1970-06-15
US17181571A 1971-08-16 1971-08-16

Publications (3)

Publication Number Publication Date
NL7209179A NL7209179A (nl) 1973-02-20
NL165604B NL165604B (nl) 1980-11-17
NL165604C true NL165604C (nl) 1981-04-15

Family

ID=26723901

Family Applications (2)

Application Number Title Priority Date Filing Date
NL7108096.A NL161297C (nl) 1970-06-15 1971-06-14 Veldemissie-elektronenkanon.
NL7209179.A NL165604C (nl) 1970-06-15 1972-06-30 Veldmissie-elektonenmicroscoop.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL7108096.A NL161297C (nl) 1970-06-15 1971-06-14 Veldemissie-elektronenkanon.

Country Status (7)

Country Link
US (2) US3678333A (nl)
AU (1) AU466190B2 (nl)
CA (1) CA950592A (nl)
DE (2) DE2129636C2 (nl)
FR (2) FR2099295A5 (nl)
GB (2) GB1355365A (nl)
NL (2) NL161297C (nl)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5217392B1 (nl) * 1970-09-18 1977-05-14
JPS5015109B1 (nl) * 1970-12-24 1975-06-02
US3921078A (en) * 1971-04-20 1975-11-18 Jeol Ltd Breakdown protection for field emission electron gun
JPS5318862B1 (nl) * 1971-07-19 1978-06-17
DE2151167C3 (de) * 1971-10-14 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Mikroanalysator mit Auger-Elektronen-Nachweis
CA976594A (en) * 1972-02-14 1975-10-21 Vincent J. Coates Field emission electron gun
JPS5420828B2 (nl) * 1972-06-09 1979-07-25
DE2234381C3 (de) * 1972-07-10 1975-10-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Beleuchtungssystem
US3809899A (en) * 1972-08-17 1974-05-07 Tektronix Inc Electron-beam tube including a thermionic-field emission cathode for a scanning electron microscope
NL7213355A (nl) * 1972-10-03 1974-04-05
JPS49112565A (nl) * 1973-02-23 1974-10-26
US3842272A (en) * 1973-07-24 1974-10-15 American Optical Corp Scanning charged particle microprobe with external spurious electric field effect correction
US4041316A (en) * 1974-09-20 1977-08-09 Hitachi, Ltd. Field emission electron gun with an evaporation source
US3946268A (en) * 1974-10-21 1976-03-23 American Optical Corporation Field emission gun improvement
DE2548831C2 (de) * 1974-12-20 1985-11-14 Nanometrics Inc., Sunnyvale, Calif. Impulsgenerator für Rasteranzeigegeräte
DE2819165A1 (de) * 1978-05-02 1979-11-15 Siemens Ag Rasterelektronenmikroskop
FR2527383A1 (fr) * 1982-05-24 1983-11-25 Univ Reims Champagne Ardenne Canon a electrons avec cathode a emission de champ et lentille magnetique
US4663525A (en) * 1985-07-08 1987-05-05 Nanometrics Incorporated Method for electron gun alignment in electron microscopes
WO1988002180A1 (en) * 1986-09-18 1988-03-24 Crewe Albert V Differential pressure electron beam system, method and gun
JPH0640475B2 (ja) * 1988-01-25 1994-05-25 日本電子株式会社 電界放出型電子銃
US4833362A (en) * 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
US5150001A (en) * 1990-04-10 1992-09-22 Orchid One Corporation Field emission electron gun and method having complementary passive and active vacuum pumping
EP0689225B1 (en) * 1990-08-10 1999-12-22 Koninklijke Philips Electronics N.V. Charged particle beam device
US5401973A (en) * 1992-12-04 1995-03-28 Atomic Energy Of Canada Limited Industrial material processing electron linear accelerator
US5698942A (en) * 1996-07-22 1997-12-16 University Of North Carolina Field emitter flat panel display device and method for operating same
JP3147227B2 (ja) * 1998-09-01 2001-03-19 日本電気株式会社 冷陰極電子銃
DE60011031T2 (de) * 2000-02-01 2005-06-23 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Optische Säule für Teilchenstrahlvorrichtung
JP4262158B2 (ja) * 2004-07-13 2009-05-13 株式会社日立ハイテクサイエンスシステムズ 低真空走査電子顕微鏡
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
EP1983548A1 (en) * 2007-04-20 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter chamber, charged particle apparatus and method for operating same
US9189728B2 (en) 2009-07-23 2015-11-17 I-Property Holding Corp. Method for the authentication of dosage forms
DE112011100476T5 (de) * 2010-02-08 2012-12-27 Hitachi High-Technologies Corporation Ladungsteilchenmikroskop und Ionenmikroskop
US8796620B2 (en) * 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8450681B2 (en) 2011-06-08 2013-05-28 Mks Instruments, Inc. Mass spectrometry for gas analysis in which both a charged particle source and a charged particle analyzer are offset from an axis of a deflector lens, resulting in reduced baseline signal offsets
US8796638B2 (en) 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US9224572B2 (en) * 2012-12-18 2015-12-29 General Electric Company X-ray tube with adjustable electron beam
WO2016063325A1 (ja) 2014-10-20 2016-04-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US9981293B2 (en) * 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE735313C (de) * 1937-06-30 1943-05-12 Aeg Einrichtung zur Erzeugung eines vorzugsweise intensitaetsgesteuerten Elektronenstrahles durch Feldemission einer mit einer Spitze versehenen kalten Kathode unter Verwendung eines elektronenoptischen Abbildungssystems
US2243362A (en) * 1938-08-20 1941-05-27 Thomas W Sukumlyn Electron microscope system
US2363359A (en) * 1941-05-01 1944-11-21 Gen Electric Electron microscope
US2289071A (en) * 1941-10-03 1942-07-07 Gen Electric Electron lens
FR937296A (fr) * 1947-06-21 1948-08-12 Csf Perfectionnements aux dispositifs de mise au point, pour microscope électronique
BE481554A (nl) * 1947-06-26
US3090882A (en) * 1960-04-13 1963-05-21 Rca Corp Electron gun
US3191028A (en) * 1963-04-22 1965-06-22 Albert V Crewe Scanning electron microscope
US3394874A (en) * 1967-02-09 1968-07-30 Gen Electrodynamics Corp Ion pumping electron gun

Also Published As

Publication number Publication date
NL7108096A (nl) 1971-12-17
NL165604B (nl) 1980-11-17
GB1355365A (en) 1974-06-05
GB1378554A (en) 1974-12-27
DE2235903A1 (de) 1973-03-01
FR2149412A1 (nl) 1973-03-30
NL7209179A (nl) 1973-02-20
FR2099295A5 (nl) 1972-03-10
NL161297B (nl) 1979-08-15
DE2129636A1 (de) 1971-12-23
DE2235903C2 (de) 1986-04-17
CA950592A (en) 1974-07-02
AU4319672A (en) 1973-12-13
NL161297C (nl) 1980-01-15
US3678333A (en) 1972-07-18
US3784815A (en) 1974-01-08
FR2149412B1 (nl) 1978-02-03
AU466190B2 (en) 1973-12-13
DE2129636C2 (de) 1986-04-10

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Legal Events

Date Code Title Description
BK Erratum
SNR Assignments of patents or rights arising from examined patent applications

Owner name: WARNER LAMBERT TECHNOLOGIES, INC.

SNR Assignments of patents or rights arising from examined patent applications

Owner name: NANOMETRICS, INC.

V4 Discontinued because of reaching the maximum lifetime of a patent