GB1355365A - Electron guns - Google Patents

Electron guns

Info

Publication number
GB1355365A
GB1355365A GB2800371A GB2800371A GB1355365A GB 1355365 A GB1355365 A GB 1355365A GB 2800371 A GB2800371 A GB 2800371A GB 2800371 A GB2800371 A GB 2800371A GB 1355365 A GB1355365 A GB 1355365A
Authority
GB
United Kingdom
Prior art keywords
cathode
electrode
plate
sealed
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2800371A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
American Optical Corp
Original Assignee
American Optical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Optical Corp filed Critical American Optical Corp
Publication of GB1355365A publication Critical patent/GB1355365A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06Electron sources; Electron guns
    • H01J37/073Electron guns using field emission, photo emission, or secondary emission electron sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/18Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/248Components associated with high voltage supply
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29Reflection microscopes
    • H01J37/292Reflection microscopes using scanning ray

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

1355365 Electron guns; ion pumps AMERICAN OPTICAL CORP 15 June 1971 [15 June 1970] 28003/71 Heading H1D An electron gun for an electron microscope comprises a field emission cathode 45, Fig. 4, surrounded by a shield electrode 90 operated at or near cathode potential and adapted to protect the cathode from excessive discharge voltages and preferably also forming a magnetic shield and an enclosure which can be evacuated to a lower pressure than the rest of the apparatus. A titanium coated filament 91 operated either continuously or discontinuously evaporates titanium on to the electrode 90 to getter reactive gases, and their action is assisted by cooling the electrode via a beryllium oxide ring 102 which conducts heat to a tank 100 filled with liquid nitrogen. An electrode 95 at 500-3000V accelerates electrons from the cathode and intercepts part of the beam thereby forming an electron cloud which tends to ionize any stray gas molecules which are then attracted to electrode 90, so that a local getter-ion pump is established. In this way the pressure within electrode 90 may be reduced to about 10<SP>-10</SP> Torr, whilst the rest of the apparatus is kept at about 10<SP>-6</SP>-10<SP>-7</SP> Torr by the pump 135. The cathode 45 may be 1000Š in diameter and is attached to a mount 51 crimped between two electrodes (of which one, 52, is shown in Fig. 4) connected by respective leads 80 and 81 to a terminal 77. The electrodes plug into an insulating post 55 secured to a metal shaft 60 received in a support plate 65 and sealed to the end cap 62 by a bellows 61. Four screws 66 (only two shown in Fig. 4) allow the plate 65 to be tilted in order to displace the cathode 45 in X and Y directions; a knob 68 allows the shaft 60 and therefore the cathode 45 to be moved longitudinally in order to focus the beam. A first anode 75 is connected through a resistance 83 to electrode 95 which is connected to input terminal 79, and a second anode 85 is maintained at 20 kV relative to the cathode. A plate 110 contains four holes ranging in diameter from 25 to 250 microns and is movable transversely; if this plate is fully retracted the seal 114 is withdrawn to allow the chamber 41 to be exhausted through a vent 125. For isolating the chamber 41 from atmosphere while a specimen is being changed, a plate containing an aperture 131 for the beam may be slid across the end of a tube 107 and sealed to it by a ring 143<SP>1</SP>. The chamber 41 is sealed by a ring at 113 and hinged at 152 so that it may be opened to replace the cathode.
GB2800371A 1970-06-15 1971-06-15 Electron guns Expired GB1355365A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US4642570A 1970-06-15 1970-06-15
US17181571A 1971-08-16 1971-08-16

Publications (1)

Publication Number Publication Date
GB1355365A true GB1355365A (en) 1974-06-05

Family

ID=26723901

Family Applications (2)

Application Number Title Priority Date Filing Date
GB2800371A Expired GB1355365A (en) 1970-06-15 1971-06-15 Electron guns
GB3819272A Expired GB1378554A (en) 1970-06-15 1972-08-16 Field emission scanning charged particle microscope

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB3819272A Expired GB1378554A (en) 1970-06-15 1972-08-16 Field emission scanning charged particle microscope

Country Status (7)

Country Link
US (2) US3678333A (en)
AU (1) AU466190B2 (en)
CA (1) CA950592A (en)
DE (2) DE2129636C2 (en)
FR (2) FR2099295A5 (en)
GB (2) GB1355365A (en)
NL (2) NL161297C (en)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5217392B1 (en) * 1970-09-18 1977-05-14
JPS5015109B1 (en) * 1970-12-24 1975-06-02
US3921078A (en) * 1971-04-20 1975-11-18 Jeol Ltd Breakdown protection for field emission electron gun
JPS5318862B1 (en) * 1971-07-19 1978-06-17
DE2151167C3 (en) * 1971-10-14 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Electron beam micro analyzer with Auger electron detection
CA976594A (en) * 1972-02-14 1975-10-21 Vincent J. Coates Field emission electron gun
JPS5420828B2 (en) * 1972-06-09 1979-07-25
DE2234381C3 (en) * 1972-07-10 1975-10-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Electron beam lighting system
US3809899A (en) * 1972-08-17 1974-05-07 Tektronix Inc Electron-beam tube including a thermionic-field emission cathode for a scanning electron microscope
NL7213355A (en) * 1972-10-03 1974-04-05
JPS49112565A (en) * 1973-02-23 1974-10-26
US3842272A (en) * 1973-07-24 1974-10-15 American Optical Corp Scanning charged particle microprobe with external spurious electric field effect correction
US4041316A (en) * 1974-09-20 1977-08-09 Hitachi, Ltd. Field emission electron gun with an evaporation source
US3946268A (en) * 1974-10-21 1976-03-23 American Optical Corporation Field emission gun improvement
DE2548831C2 (en) * 1974-12-20 1985-11-14 Nanometrics Inc., Sunnyvale, Calif. Pulse generator for raster display devices
DE2819165A1 (en) * 1978-05-02 1979-11-15 Siemens Ag SCANNING ELECTRON MICROSCOPE
FR2527383A1 (en) * 1982-05-24 1983-11-25 Univ Reims Champagne Ardenne ELECTRON GUN WITH FIELD EMISSION CATHODE AND MAGNETIC LENS
US4663525A (en) * 1985-07-08 1987-05-05 Nanometrics Incorporated Method for electron gun alignment in electron microscopes
WO1988002180A1 (en) * 1986-09-18 1988-03-24 Crewe Albert V Differential pressure electron beam system, method and gun
JPH0640475B2 (en) * 1988-01-25 1994-05-25 日本電子株式会社 Field emission electron gun
US4833362A (en) * 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
US5150001A (en) * 1990-04-10 1992-09-22 Orchid One Corporation Field emission electron gun and method having complementary passive and active vacuum pumping
DE69125229T2 (en) * 1990-08-10 1997-08-28 Koninkl Philips Electronics Nv Charge particle beam arrangement
US5401973A (en) * 1992-12-04 1995-03-28 Atomic Energy Of Canada Limited Industrial material processing electron linear accelerator
US5698942A (en) * 1996-07-22 1997-12-16 University Of North Carolina Field emitter flat panel display device and method for operating same
JP3147227B2 (en) * 1998-09-01 2001-03-19 日本電気株式会社 Cold cathode electron gun
DE60011031T2 (en) * 2000-02-01 2005-06-23 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Optical column for particle beam device
JP4262158B2 (en) * 2004-07-13 2009-05-13 株式会社日立ハイテクサイエンスシステムズ Low vacuum scanning electron microscope
JP2006216396A (en) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp Charged particle beam device
EP1983548A1 (en) * 2007-04-20 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter chamber, charged particle apparatus and method for operating same
US9189728B2 (en) 2009-07-23 2015-11-17 I-Property Holding Corp. Method for the authentication of dosage forms
WO2011096227A1 (en) * 2010-02-08 2011-08-11 株式会社日立ハイテクノロジーズ Charged particle microscope and ion microscope
US8796638B2 (en) 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8796620B2 (en) * 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8450681B2 (en) 2011-06-08 2013-05-28 Mks Instruments, Inc. Mass spectrometry for gas analysis in which both a charged particle source and a charged particle analyzer are offset from an axis of a deflector lens, resulting in reduced baseline signal offsets
US9224572B2 (en) * 2012-12-18 2015-12-29 General Electric Company X-ray tube with adjustable electron beam
WO2016063325A1 (en) 2014-10-20 2016-04-28 株式会社日立ハイテクノロジーズ Scanning electron microscope
US9981293B2 (en) * 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE735313C (en) * 1937-06-30 1943-05-12 Aeg Device for generating a preferably intensity-controlled electron beam by field emission from a cold cathode provided with a tip using an electron-optical imaging system
US2243362A (en) * 1938-08-20 1941-05-27 Thomas W Sukumlyn Electron microscope system
US2363359A (en) * 1941-05-01 1944-11-21 Gen Electric Electron microscope
US2289071A (en) * 1941-10-03 1942-07-07 Gen Electric Electron lens
FR937296A (en) * 1947-06-21 1948-08-12 Csf Improvements to focusing devices, for electron microscopes
BE481554A (en) * 1947-06-26
US3090882A (en) * 1960-04-13 1963-05-21 Rca Corp Electron gun
US3191028A (en) * 1963-04-22 1965-06-22 Albert V Crewe Scanning electron microscope
US3394874A (en) * 1967-02-09 1968-07-30 Gen Electrodynamics Corp Ion pumping electron gun

Also Published As

Publication number Publication date
GB1378554A (en) 1974-12-27
US3678333A (en) 1972-07-18
NL161297B (en) 1979-08-15
FR2149412A1 (en) 1973-03-30
AU4319672A (en) 1973-12-13
US3784815A (en) 1974-01-08
DE2129636A1 (en) 1971-12-23
CA950592A (en) 1974-07-02
FR2099295A5 (en) 1972-03-10
NL7209179A (en) 1973-02-20
NL7108096A (en) 1971-12-17
DE2235903C2 (en) 1986-04-17
NL165604C (en) 1981-04-15
DE2129636C2 (en) 1986-04-10
NL165604B (en) 1980-11-17
FR2149412B1 (en) 1978-02-03
DE2235903A1 (en) 1973-03-01
NL161297C (en) 1980-01-15
AU466190B2 (en) 1973-12-13

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PE20 Patent expired after termination of 20 years