GB1355365A - Electron guns - Google Patents
Electron gunsInfo
- Publication number
- GB1355365A GB1355365A GB2800371A GB2800371A GB1355365A GB 1355365 A GB1355365 A GB 1355365A GB 2800371 A GB2800371 A GB 2800371A GB 2800371 A GB2800371 A GB 2800371A GB 1355365 A GB1355365 A GB 1355365A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cathode
- electrode
- plate
- sealed
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 239000010936 titanium Substances 0.000 abstract 2
- 229910052719 titanium Inorganic materials 0.000 abstract 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical group C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 abstract 1
- 102000006391 Ion Pumps Human genes 0.000 abstract 1
- 108010083687 Ion Pumps Proteins 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/248—Components associated with high voltage supply
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/29—Reflection microscopes
- H01J37/292—Reflection microscopes using scanning ray
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
1355365 Electron guns; ion pumps AMERICAN OPTICAL CORP 15 June 1971 [15 June 1970] 28003/71 Heading H1D An electron gun for an electron microscope comprises a field emission cathode 45, Fig. 4, surrounded by a shield electrode 90 operated at or near cathode potential and adapted to protect the cathode from excessive discharge voltages and preferably also forming a magnetic shield and an enclosure which can be evacuated to a lower pressure than the rest of the apparatus. A titanium coated filament 91 operated either continuously or discontinuously evaporates titanium on to the electrode 90 to getter reactive gases, and their action is assisted by cooling the electrode via a beryllium oxide ring 102 which conducts heat to a tank 100 filled with liquid nitrogen. An electrode 95 at 500-3000V accelerates electrons from the cathode and intercepts part of the beam thereby forming an electron cloud which tends to ionize any stray gas molecules which are then attracted to electrode 90, so that a local getter-ion pump is established. In this way the pressure within electrode 90 may be reduced to about 10<SP>-10</SP> Torr, whilst the rest of the apparatus is kept at about 10<SP>-6</SP>-10<SP>-7</SP> Torr by the pump 135. The cathode 45 may be 1000Š in diameter and is attached to a mount 51 crimped between two electrodes (of which one, 52, is shown in Fig. 4) connected by respective leads 80 and 81 to a terminal 77. The electrodes plug into an insulating post 55 secured to a metal shaft 60 received in a support plate 65 and sealed to the end cap 62 by a bellows 61. Four screws 66 (only two shown in Fig. 4) allow the plate 65 to be tilted in order to displace the cathode 45 in X and Y directions; a knob 68 allows the shaft 60 and therefore the cathode 45 to be moved longitudinally in order to focus the beam. A first anode 75 is connected through a resistance 83 to electrode 95 which is connected to input terminal 79, and a second anode 85 is maintained at 20 kV relative to the cathode. A plate 110 contains four holes ranging in diameter from 25 to 250 microns and is movable transversely; if this plate is fully retracted the seal 114 is withdrawn to allow the chamber 41 to be exhausted through a vent 125. For isolating the chamber 41 from atmosphere while a specimen is being changed, a plate containing an aperture 131 for the beam may be slid across the end of a tube 107 and sealed to it by a ring 143<SP>1</SP>. The chamber 41 is sealed by a ring at 113 and hinged at 152 so that it may be opened to replace the cathode.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4642570A | 1970-06-15 | 1970-06-15 | |
US17181571A | 1971-08-16 | 1971-08-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1355365A true GB1355365A (en) | 1974-06-05 |
Family
ID=26723901
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2800371A Expired GB1355365A (en) | 1970-06-15 | 1971-06-15 | Electron guns |
GB3819272A Expired GB1378554A (en) | 1970-06-15 | 1972-08-16 | Field emission scanning charged particle microscope |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB3819272A Expired GB1378554A (en) | 1970-06-15 | 1972-08-16 | Field emission scanning charged particle microscope |
Country Status (7)
Country | Link |
---|---|
US (2) | US3678333A (en) |
AU (1) | AU466190B2 (en) |
CA (1) | CA950592A (en) |
DE (2) | DE2129636C2 (en) |
FR (2) | FR2099295A5 (en) |
GB (2) | GB1355365A (en) |
NL (2) | NL161297C (en) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5217392B1 (en) * | 1970-09-18 | 1977-05-14 | ||
JPS5015109B1 (en) * | 1970-12-24 | 1975-06-02 | ||
US3921078A (en) * | 1971-04-20 | 1975-11-18 | Jeol Ltd | Breakdown protection for field emission electron gun |
JPS5318862B1 (en) * | 1971-07-19 | 1978-06-17 | ||
DE2151167C3 (en) * | 1971-10-14 | 1974-05-09 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Electron beam micro analyzer with Auger electron detection |
CA976594A (en) * | 1972-02-14 | 1975-10-21 | Vincent J. Coates | Field emission electron gun |
JPS5420828B2 (en) * | 1972-06-09 | 1979-07-25 | ||
DE2234381C3 (en) * | 1972-07-10 | 1975-10-16 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Electron beam lighting system |
US3809899A (en) * | 1972-08-17 | 1974-05-07 | Tektronix Inc | Electron-beam tube including a thermionic-field emission cathode for a scanning electron microscope |
NL7213355A (en) * | 1972-10-03 | 1974-04-05 | ||
JPS49112565A (en) * | 1973-02-23 | 1974-10-26 | ||
US3842272A (en) * | 1973-07-24 | 1974-10-15 | American Optical Corp | Scanning charged particle microprobe with external spurious electric field effect correction |
US4041316A (en) * | 1974-09-20 | 1977-08-09 | Hitachi, Ltd. | Field emission electron gun with an evaporation source |
US3946268A (en) * | 1974-10-21 | 1976-03-23 | American Optical Corporation | Field emission gun improvement |
DE2548831C2 (en) * | 1974-12-20 | 1985-11-14 | Nanometrics Inc., Sunnyvale, Calif. | Pulse generator for raster display devices |
DE2819165A1 (en) * | 1978-05-02 | 1979-11-15 | Siemens Ag | SCANNING ELECTRON MICROSCOPE |
FR2527383A1 (en) * | 1982-05-24 | 1983-11-25 | Univ Reims Champagne Ardenne | ELECTRON GUN WITH FIELD EMISSION CATHODE AND MAGNETIC LENS |
US4663525A (en) * | 1985-07-08 | 1987-05-05 | Nanometrics Incorporated | Method for electron gun alignment in electron microscopes |
WO1988002180A1 (en) * | 1986-09-18 | 1988-03-24 | Crewe Albert V | Differential pressure electron beam system, method and gun |
JPH0640475B2 (en) * | 1988-01-25 | 1994-05-25 | 日本電子株式会社 | Field emission electron gun |
US4833362A (en) * | 1988-04-19 | 1989-05-23 | Orchid One | Encapsulated high brightness electron beam source and system |
US5150001A (en) * | 1990-04-10 | 1992-09-22 | Orchid One Corporation | Field emission electron gun and method having complementary passive and active vacuum pumping |
DE69125229T2 (en) * | 1990-08-10 | 1997-08-28 | Koninkl Philips Electronics Nv | Charge particle beam arrangement |
US5401973A (en) * | 1992-12-04 | 1995-03-28 | Atomic Energy Of Canada Limited | Industrial material processing electron linear accelerator |
US5698942A (en) * | 1996-07-22 | 1997-12-16 | University Of North Carolina | Field emitter flat panel display device and method for operating same |
JP3147227B2 (en) * | 1998-09-01 | 2001-03-19 | 日本電気株式会社 | Cold cathode electron gun |
DE60011031T2 (en) * | 2000-02-01 | 2005-06-23 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Optical column for particle beam device |
JP4262158B2 (en) * | 2004-07-13 | 2009-05-13 | 株式会社日立ハイテクサイエンスシステムズ | Low vacuum scanning electron microscope |
JP2006216396A (en) * | 2005-02-04 | 2006-08-17 | Hitachi High-Technologies Corp | Charged particle beam device |
EP1983548A1 (en) * | 2007-04-20 | 2008-10-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Emitter chamber, charged particle apparatus and method for operating same |
US9189728B2 (en) | 2009-07-23 | 2015-11-17 | I-Property Holding Corp. | Method for the authentication of dosage forms |
WO2011096227A1 (en) * | 2010-02-08 | 2011-08-11 | 株式会社日立ハイテクノロジーズ | Charged particle microscope and ion microscope |
US8796638B2 (en) | 2011-06-08 | 2014-08-05 | Mks Instruments, Inc. | Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens |
US8796620B2 (en) * | 2011-06-08 | 2014-08-05 | Mks Instruments, Inc. | Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens |
US8450681B2 (en) | 2011-06-08 | 2013-05-28 | Mks Instruments, Inc. | Mass spectrometry for gas analysis in which both a charged particle source and a charged particle analyzer are offset from an axis of a deflector lens, resulting in reduced baseline signal offsets |
US9224572B2 (en) * | 2012-12-18 | 2015-12-29 | General Electric Company | X-ray tube with adjustable electron beam |
WO2016063325A1 (en) | 2014-10-20 | 2016-04-28 | 株式会社日立ハイテクノロジーズ | Scanning electron microscope |
US9981293B2 (en) * | 2016-04-21 | 2018-05-29 | Mapper Lithography Ip B.V. | Method and system for the removal and/or avoidance of contamination in charged particle beam systems |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE735313C (en) * | 1937-06-30 | 1943-05-12 | Aeg | Device for generating a preferably intensity-controlled electron beam by field emission from a cold cathode provided with a tip using an electron-optical imaging system |
US2243362A (en) * | 1938-08-20 | 1941-05-27 | Thomas W Sukumlyn | Electron microscope system |
US2363359A (en) * | 1941-05-01 | 1944-11-21 | Gen Electric | Electron microscope |
US2289071A (en) * | 1941-10-03 | 1942-07-07 | Gen Electric | Electron lens |
FR937296A (en) * | 1947-06-21 | 1948-08-12 | Csf | Improvements to focusing devices, for electron microscopes |
BE481554A (en) * | 1947-06-26 | |||
US3090882A (en) * | 1960-04-13 | 1963-05-21 | Rca Corp | Electron gun |
US3191028A (en) * | 1963-04-22 | 1965-06-22 | Albert V Crewe | Scanning electron microscope |
US3394874A (en) * | 1967-02-09 | 1968-07-30 | Gen Electrodynamics Corp | Ion pumping electron gun |
-
1970
- 1970-06-15 US US46425A patent/US3678333A/en not_active Expired - Lifetime
-
1971
- 1971-06-14 NL NL7108096.A patent/NL161297C/en not_active IP Right Cessation
- 1971-06-14 FR FR7122754A patent/FR2099295A5/fr not_active Expired
- 1971-06-15 DE DE2129636A patent/DE2129636C2/en not_active Expired
- 1971-06-15 GB GB2800371A patent/GB1355365A/en not_active Expired
- 1971-08-16 US US00171815A patent/US3784815A/en not_active Expired - Lifetime
-
1972
- 1972-05-26 CA CA143,166,A patent/CA950592A/en not_active Expired
- 1972-06-07 AU AU43196/72A patent/AU466190B2/en not_active Expired
- 1972-06-30 NL NL7209179.A patent/NL165604C/en not_active IP Right Cessation
- 1972-07-21 DE DE2235903A patent/DE2235903C2/en not_active Expired
- 1972-07-28 FR FR7228997A patent/FR2149412B1/fr not_active Expired
- 1972-08-16 GB GB3819272A patent/GB1378554A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB1378554A (en) | 1974-12-27 |
US3678333A (en) | 1972-07-18 |
NL161297B (en) | 1979-08-15 |
FR2149412A1 (en) | 1973-03-30 |
AU4319672A (en) | 1973-12-13 |
US3784815A (en) | 1974-01-08 |
DE2129636A1 (en) | 1971-12-23 |
CA950592A (en) | 1974-07-02 |
FR2099295A5 (en) | 1972-03-10 |
NL7209179A (en) | 1973-02-20 |
NL7108096A (en) | 1971-12-17 |
DE2235903C2 (en) | 1986-04-17 |
NL165604C (en) | 1981-04-15 |
DE2129636C2 (en) | 1986-04-10 |
NL165604B (en) | 1980-11-17 |
FR2149412B1 (en) | 1978-02-03 |
DE2235903A1 (en) | 1973-03-01 |
NL161297C (en) | 1980-01-15 |
AU466190B2 (en) | 1973-12-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PE20 | Patent expired after termination of 20 years |