NL7108096A - - Google Patents

Info

Publication number
NL7108096A
NL7108096A NL7108096A NL7108096A NL7108096A NL 7108096 A NL7108096 A NL 7108096A NL 7108096 A NL7108096 A NL 7108096A NL 7108096 A NL7108096 A NL 7108096A NL 7108096 A NL7108096 A NL 7108096A
Authority
NL
Netherlands
Application number
NL7108096A
Other versions
NL161297B (nl
NL161297C (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7108096A publication Critical patent/NL7108096A/xx
Publication of NL161297B publication Critical patent/NL161297B/xx
Application granted granted Critical
Publication of NL161297C publication Critical patent/NL161297C/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/248—Components associated with high voltage supply
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H01J37/292—Reflection microscopes using scanning ray

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
NL7108096.A 1970-06-15 1971-06-14 Veldemissie-elektronenkanon. NL161297C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US4642570A 1970-06-15 1970-06-15
US17181571A 1971-08-16 1971-08-16

Publications (3)

Publication Number Publication Date
NL7108096A true NL7108096A (en:Method) 1971-12-17
NL161297B NL161297B (nl) 1979-08-15
NL161297C NL161297C (nl) 1980-01-15

Family

ID=26723901

Family Applications (2)

Application Number Title Priority Date Filing Date
NL7108096.A NL161297C (nl) 1970-06-15 1971-06-14 Veldemissie-elektronenkanon.
NL7209179.A NL165604C (nl) 1970-06-15 1972-06-30 Veldmissie-elektonenmicroscoop.

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL7209179.A NL165604C (nl) 1970-06-15 1972-06-30 Veldmissie-elektonenmicroscoop.

Country Status (7)

Country Link
US (2) US3678333A (en:Method)
AU (1) AU466190B2 (en:Method)
CA (1) CA950592A (en:Method)
DE (2) DE2129636C2 (en:Method)
FR (2) FR2099295A5 (en:Method)
GB (2) GB1355365A (en:Method)
NL (2) NL161297C (en:Method)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5217392B1 (en:Method) * 1970-09-18 1977-05-14
JPS5015109B1 (en:Method) * 1970-12-24 1975-06-02
US3921078A (en) * 1971-04-20 1975-11-18 Jeol Ltd Breakdown protection for field emission electron gun
JPS5318862B1 (en:Method) * 1971-07-19 1978-06-17
DE2151167C3 (de) * 1971-10-14 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Mikroanalysator mit Auger-Elektronen-Nachweis
CA976594A (en) * 1972-02-14 1975-10-21 Vincent J. Coates Field emission electron gun
JPS5420828B2 (en:Method) * 1972-06-09 1979-07-25
DE2234381C3 (de) * 1972-07-10 1975-10-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Elektronenstrahl-Beleuchtungssystem
US3809899A (en) * 1972-08-17 1974-05-07 Tektronix Inc Electron-beam tube including a thermionic-field emission cathode for a scanning electron microscope
NL7213355A (en:Method) * 1972-10-03 1974-04-05
JPS49112565A (en:Method) * 1973-02-23 1974-10-26
US3842272A (en) * 1973-07-24 1974-10-15 American Optical Corp Scanning charged particle microprobe with external spurious electric field effect correction
US4041316A (en) * 1974-09-20 1977-08-09 Hitachi, Ltd. Field emission electron gun with an evaporation source
US3946268A (en) * 1974-10-21 1976-03-23 American Optical Corporation Field emission gun improvement
DE2548831C2 (de) * 1974-12-20 1985-11-14 Nanometrics Inc., Sunnyvale, Calif. Impulsgenerator für Rasteranzeigegeräte
DE2819165A1 (de) * 1978-05-02 1979-11-15 Siemens Ag Rasterelektronenmikroskop
FR2527383A1 (fr) * 1982-05-24 1983-11-25 Univ Reims Champagne Ardenne Canon a electrons avec cathode a emission de champ et lentille magnetique
US4427886A (en) 1982-08-02 1984-01-24 Wisconsin Alumni Research Foundation Low voltage field emission electron gun
US4663525A (en) * 1985-07-08 1987-05-05 Nanometrics Incorporated Method for electron gun alignment in electron microscopes
WO1988002180A1 (en) * 1986-09-18 1988-03-24 Crewe Albert V Differential pressure electron beam system, method and gun
JPH0640475B2 (ja) * 1988-01-25 1994-05-25 日本電子株式会社 電界放出型電子銃
US4833362A (en) * 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
US5150001A (en) * 1990-04-10 1992-09-22 Orchid One Corporation Field emission electron gun and method having complementary passive and active vacuum pumping
EP0473216B1 (en) * 1990-08-10 1997-03-19 Koninklijke Philips Electronics N.V. Charged particle beam device
US5401973A (en) * 1992-12-04 1995-03-28 Atomic Energy Of Canada Limited Industrial material processing electron linear accelerator
US5698942A (en) * 1996-07-22 1997-12-16 University Of North Carolina Field emitter flat panel display device and method for operating same
JP3147227B2 (ja) * 1998-09-01 2001-03-19 日本電気株式会社 冷陰極電子銃
DE60011031T2 (de) * 2000-02-01 2005-06-23 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Optische Säule für Teilchenstrahlvorrichtung
JP4262158B2 (ja) * 2004-07-13 2009-05-13 株式会社日立ハイテクサイエンスシステムズ 低真空走査電子顕微鏡
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
EP1983548A1 (en) * 2007-04-20 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter chamber, charged particle apparatus and method for operating same
US9189728B2 (en) 2009-07-23 2015-11-17 I-Property Holding Corp. Method for the authentication of dosage forms
US20130126731A1 (en) * 2010-02-08 2013-05-23 Hitachi High-Technologies Corporation Charged Particle Microscope and Ion Microscope
US8796620B2 (en) * 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for gas analysis with a one-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8796638B2 (en) 2011-06-08 2014-08-05 Mks Instruments, Inc. Mass spectrometry for a gas analysis with a two-stage charged particle deflector lens between a charged particle source and a charged particle analyzer both offset from a central axis of the deflector lens
US8450681B2 (en) 2011-06-08 2013-05-28 Mks Instruments, Inc. Mass spectrometry for gas analysis in which both a charged particle source and a charged particle analyzer are offset from an axis of a deflector lens, resulting in reduced baseline signal offsets
US9224572B2 (en) * 2012-12-18 2015-12-29 General Electric Company X-ray tube with adjustable electron beam
JP6283423B2 (ja) 2014-10-20 2018-02-21 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US9981293B2 (en) * 2016-04-21 2018-05-29 Mapper Lithography Ip B.V. Method and system for the removal and/or avoidance of contamination in charged particle beam systems

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE735313C (de) * 1937-06-30 1943-05-12 Aeg Einrichtung zur Erzeugung eines vorzugsweise intensitaetsgesteuerten Elektronenstrahles durch Feldemission einer mit einer Spitze versehenen kalten Kathode unter Verwendung eines elektronenoptischen Abbildungssystems
US2243362A (en) * 1938-08-20 1941-05-27 Thomas W Sukumlyn Electron microscope system
US2363359A (en) * 1941-05-01 1944-11-21 Gen Electric Electron microscope
US2289071A (en) * 1941-10-03 1942-07-07 Gen Electric Electron lens
FR937296A (fr) * 1947-06-21 1948-08-12 Csf Perfectionnements aux dispositifs de mise au point, pour microscope électronique
BE481554A (en:Method) * 1947-06-26
US3090882A (en) * 1960-04-13 1963-05-21 Rca Corp Electron gun
US3191028A (en) * 1963-04-22 1965-06-22 Albert V Crewe Scanning electron microscope
US3394874A (en) * 1967-02-09 1968-07-30 Gen Electrodynamics Corp Ion pumping electron gun

Also Published As

Publication number Publication date
NL165604B (nl) 1980-11-17
DE2129636C2 (de) 1986-04-10
DE2235903C2 (de) 1986-04-17
CA950592A (en) 1974-07-02
GB1378554A (en) 1974-12-27
NL161297B (nl) 1979-08-15
NL165604C (nl) 1981-04-15
GB1355365A (en) 1974-06-05
FR2149412B1 (en:Method) 1978-02-03
US3784815A (en) 1974-01-08
NL7209179A (en:Method) 1973-02-20
US3678333A (en) 1972-07-18
DE2235903A1 (de) 1973-03-01
AU466190B2 (en) 1973-12-13
NL161297C (nl) 1980-01-15
DE2129636A1 (de) 1971-12-23
AU4319672A (en) 1973-12-13
FR2149412A1 (en:Method) 1973-03-30
FR2099295A5 (en:Method) 1972-03-10

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Legal Events

Date Code Title Description
SNR Assignments of patents or rights arising from examined patent applications

Owner name: WARNER LAMBERT TECHNOLOGIES, INC.

SNR Assignments of patents or rights arising from examined patent applications

Owner name: NANOMETRICS, INC.

NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: AM OPTICAL

V4 Discontinued because of reaching the maximum lifetime of a patent