NL7105000A - - Google Patents

Info

Publication number
NL7105000A
NL7105000A NL7105000A NL7105000A NL7105000A NL 7105000 A NL7105000 A NL 7105000A NL 7105000 A NL7105000 A NL 7105000A NL 7105000 A NL7105000 A NL 7105000A NL 7105000 A NL7105000 A NL 7105000A
Authority
NL
Netherlands
Application number
NL7105000A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7105000A priority Critical patent/NL7105000A/xx
Priority to DE2216642A priority patent/DE2216642C3/de
Priority to AU40936/72A priority patent/AU470407B2/en
Priority to GB1660972A priority patent/GB1387021A/en
Priority to CH531272A priority patent/CH539952A/de
Priority to IT23017/72A priority patent/IT951314B/it
Priority to SE7204673A priority patent/SE383582B/xx
Priority to ES401687A priority patent/ES401687A1/es
Priority to BE782012A priority patent/BE782012A/xx
Priority to FR7213006A priority patent/FR2133692B1/fr
Priority to BR2251/72A priority patent/BR7202251D0/pt
Publication of NL7105000A publication Critical patent/NL7105000A/xx
Priority to US399860A priority patent/US3909318A/en
Priority to US05/539,634 priority patent/US4005453A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W15/00—Highly-doped buried regions of integrated devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67—Complementary BJTs
    • H10D84/673—Vertical complementary BJTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/87—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of PN-junction gate FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
    • H10W10/0121—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS] in regions recessed from the surface, e.g. in trenches or grooves
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/012—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS]
    • H10W10/0125—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS] comprising introducing electrical impurities in local oxidation regions, e.g. to alter LOCOS oxide growth characteristics
    • H10W10/0126—Manufacture or treatment of isolation regions comprising dielectric materials using local oxidation of silicon [LOCOS] comprising introducing electrical impurities in local oxidation regions, e.g. to alter LOCOS oxide growth characteristics introducing electrical active impurities in local oxidation regions to create channel stoppers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/13—Isolation regions comprising dielectric materials formed using local oxidation of silicon [LOCOS], e.g. sealed interface localised oxidation [SILO] or side-wall mask isolation [SWAMI]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W15/00—Highly-doped buried regions of integrated devices
    • H10W15/01—Manufacture or treatment
NL7105000A 1971-04-14 1971-04-14 NL7105000A (enExample)

Priority Applications (13)

Application Number Priority Date Filing Date Title
NL7105000A NL7105000A (enExample) 1971-04-14 1971-04-14
DE2216642A DE2216642C3 (de) 1971-04-14 1972-04-07 Halbleiteranordnung und Verfahren zu ihrer Herstellung
AU40936/72A AU470407B2 (en) 1971-04-14 1972-04-10 Semiconductor device and method of manufacturing same
IT23017/72A IT951314B (it) 1971-04-14 1972-04-11 Dispositivo semiconduttore e meto do per la sua fabbricazione
CH531272A CH539952A (de) 1971-04-14 1972-04-11 Halbleiteranordnung und Verfahren zur Herstellung derselben
GB1660972A GB1387021A (en) 1971-04-14 1972-04-11 Semiconductor device manufacture
SE7204673A SE383582B (sv) 1971-04-14 1972-04-11 Halvledaranordning och sett for dess framstellning
ES401687A ES401687A1 (es) 1971-04-14 1972-04-12 Un dispositivo semiconductor.
BE782012A BE782012A (fr) 1971-04-14 1972-04-12 Dispositif semiconducteur et procede permettant sa fabrication
FR7213006A FR2133692B1 (enExample) 1971-04-14 1972-04-13
BR2251/72A BR7202251D0 (pt) 1971-04-14 1972-04-14 Dispositivo semicondutor e processo de fazer o mesmo
US399860A US3909318A (en) 1971-04-14 1973-09-24 Method of forming complementary devices utilizing outdiffusion and selective oxidation
US05/539,634 US4005453A (en) 1971-04-14 1975-01-09 Semiconductor device with isolated circuit elements and method of making

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7105000A NL7105000A (enExample) 1971-04-14 1971-04-14

Publications (1)

Publication Number Publication Date
NL7105000A true NL7105000A (enExample) 1972-10-17

Family

ID=19812915

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7105000A NL7105000A (enExample) 1971-04-14 1971-04-14

Country Status (11)

Country Link
AU (1) AU470407B2 (enExample)
BE (1) BE782012A (enExample)
BR (1) BR7202251D0 (enExample)
CH (1) CH539952A (enExample)
DE (1) DE2216642C3 (enExample)
ES (1) ES401687A1 (enExample)
FR (1) FR2133692B1 (enExample)
GB (1) GB1387021A (enExample)
IT (1) IT951314B (enExample)
NL (1) NL7105000A (enExample)
SE (1) SE383582B (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL161301C (nl) * 1972-12-29 1980-01-15 Philips Nv Halfgeleiderinrichting en werkwijze voor de vervaar- diging daarvan.
JPS5534619U (enExample) * 1978-08-25 1980-03-06

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE740938A (enExample) * 1967-12-05 1970-04-01

Also Published As

Publication number Publication date
GB1387021A (en) 1975-03-12
IT951314B (it) 1973-06-30
DE2216642A1 (de) 1972-10-19
BR7202251D0 (pt) 1973-06-07
DE2216642B2 (de) 1979-04-12
AU470407B2 (en) 1973-10-18
DE2216642C3 (de) 1979-12-13
ES401687A1 (es) 1975-03-16
AU4093672A (en) 1973-10-18
CH539952A (de) 1973-07-31
FR2133692B1 (enExample) 1977-08-19
BE782012A (fr) 1972-10-13
FR2133692A1 (enExample) 1972-12-01
SE383582B (sv) 1976-03-15

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Legal Events

Date Code Title Description
BI The patent application has been withdrawn