NL6814882A - - Google Patents
Info
- Publication number
- NL6814882A NL6814882A NL6814882A NL6814882A NL6814882A NL 6814882 A NL6814882 A NL 6814882A NL 6814882 A NL6814882 A NL 6814882A NL 6814882 A NL6814882 A NL 6814882A NL 6814882 A NL6814882 A NL 6814882A
- Authority
- NL
- Netherlands
- Prior art keywords
- photo
- hard transparent
- masks
- quartz
- dec
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DES0113257 | 1967-12-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL6814882A true NL6814882A (de) | 1969-06-16 |
Family
ID=7532383
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6814882A NL6814882A (de) | 1967-12-12 | 1968-10-17 |
Country Status (7)
Country | Link |
---|---|
US (1) | US3644134A (de) |
AT (1) | AT287067B (de) |
CH (1) | CH486124A (de) |
FR (1) | FR1596843A (de) |
GB (1) | GB1210140A (de) |
NL (1) | NL6814882A (de) |
SE (1) | SE334424B (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1356430A (en) * | 1971-08-09 | 1974-06-12 | Rank Organisation Ltd | Optical elements |
US3873203A (en) * | 1973-03-19 | 1975-03-25 | Motorola Inc | Durable high resolution silicon template |
US4063812A (en) * | 1976-08-12 | 1977-12-20 | International Business Machines Corporation | Projection printing system with an improved mask configuration |
JPS5340281A (en) * | 1976-09-27 | 1978-04-12 | Konishiroku Photo Ind Co Ltd | Photo mask material and manufacturtof it |
US4361643A (en) * | 1981-01-05 | 1982-11-30 | Western Electric Co., Inc. | Photomask and method of using same |
US4536240A (en) * | 1981-12-02 | 1985-08-20 | Advanced Semiconductor Products, Inc. | Method of forming thin optical membranes |
US4411972A (en) * | 1981-12-30 | 1983-10-25 | International Business Machines Corporation | Integrated circuit photomask |
US4537813A (en) * | 1982-09-27 | 1985-08-27 | At&T Technologies, Inc. | Photomask encapsulation |
DE3712071A1 (de) * | 1987-04-09 | 1988-10-20 | Basf Ag | Vorlagenmaterial fuer die belichtung von lichtempfindlich beschichteten materialien |
DE10027060B4 (de) * | 2000-06-05 | 2006-11-30 | Nanosurf Ag | Abtastspitzen,Verfahren zur Herstellung und Verwendung derselben, insbesondere für die Rastersondenmikroskopie |
-
1968
- 1968-10-17 NL NL6814882A patent/NL6814882A/xx unknown
- 1968-12-10 AT AT12009/68A patent/AT287067B/de not_active IP Right Cessation
- 1968-12-10 CH CH1846168A patent/CH486124A/de not_active IP Right Cessation
- 1968-12-10 FR FR1596843D patent/FR1596843A/fr not_active Expired
- 1968-12-11 US US783784A patent/US3644134A/en not_active Expired - Lifetime
- 1968-12-11 GB GB58793/68A patent/GB1210140A/en not_active Expired
- 1968-12-12 SE SE17066/68A patent/SE334424B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
CH486124A (de) | 1970-02-15 |
GB1210140A (en) | 1970-10-28 |
DE1614677B2 (de) | 1975-10-02 |
FR1596843A (de) | 1970-06-22 |
AT287067B (de) | 1971-01-11 |
US3644134A (en) | 1972-02-22 |
DE1614677A1 (de) | 1970-03-05 |
SE334424B (de) | 1971-04-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DK120409B (da) | Fremgangsmåde til dannelse af en tynd, gennemsigtig metaloxidfilm indeholdende mindst 25 vægtprocent cobaltoxid på et glasunderlag samt filmdannende opløsning til gennemførelse af fremgangsmåden. | |
FR1596843A (de) | ||
JPS5340281A (en) | Photo mask material and manufacturtof it | |
GB1084081A (de) | ||
ES407613A1 (es) | Un procedimiento de formacion de imagen. | |
JPS576849A (en) | Photomask and its preparation | |
JPS53122427A (en) | Forming method for photo-resist pattern | |
JPS57147634A (en) | Photomask blank | |
GB1277037A (en) | Methods in or relating to photomasks | |
JPS5330283A (en) | Production of substrates for semiconductor integrated circuits | |
JPS56110939A (en) | Transfer mask for light exposure | |
JPS5726467A (en) | Manufacture of semiconductor device | |
JPS54141573A (en) | Mask for exposure | |
JPS5339060A (en) | Lot number marking method to wafers | |
JPS52131751A (en) | Measuring method for thickness of transparent film | |
JPS5421273A (en) | Manufacture for photo mask | |
JPS5619623A (en) | Photomask | |
JPS544077A (en) | Photo mask for far ultraviolet ray exposure | |
JPS57172750A (en) | Manufacture of semiconductor device | |
JPS5437579A (en) | Chrome plate | |
JPS57101837A (en) | Photomask | |
JPS5360177A (en) | Photo mask | |
JPS57115545A (en) | Method for shielding far ultraviolet rays | |
GB1031978A (en) | Improvements in or relating to photolithographic masks | |
GB1154212A (en) | The Production of an Image on a Substrate |