NL281922A - - Google Patents

Info

Publication number
NL281922A
NL281922A NL281922DA NL281922A NL 281922 A NL281922 A NL 281922A NL 281922D A NL281922D A NL 281922DA NL 281922 A NL281922 A NL 281922A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL281922A publication Critical patent/NL281922A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
    • C07D295/20—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
    • C07D295/21—Radicals derived from sulfur analogues of carbonic acid
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/30—Oxygen or sulfur atoms
    • C07D233/42—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Filtering Materials (AREA)
  • Chemically Coating (AREA)
NL281922D 1961-08-10 NL281922A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DED36777A DE1224111B (de) 1961-08-10 1961-08-10 Saure galvanische Kupfer- und Nickelbaeder und Verfahren zum Abscheiden der UEberzuege
DED0039520 1962-08-01

Publications (1)

Publication Number Publication Date
NL281922A true NL281922A (fr)

Family

ID=25971309

Family Applications (1)

Application Number Title Priority Date Filing Date
NL281922D NL281922A (fr) 1961-08-10

Country Status (6)

Country Link
US (2) US3257294A (fr)
BE (1) BE621297A (fr)
CH (1) CH429356A (fr)
DE (2) DE1224111B (fr)
GB (2) GB941823A (fr)
NL (1) NL281922A (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH494824A (de) * 1969-07-10 1970-08-15 Fluehmann Werner Verfahren zur elektrolytischen Abscheidung von Kupfer hoher Duktilität
US3669853A (en) * 1969-07-15 1972-06-13 Chemetron Corp Coumarin-carrier addition agent for nickel baths
US3518171A (en) * 1969-07-24 1970-06-30 Metalux Corp The Purification of nickel electroplating solutions
US4014761A (en) * 1975-01-06 1977-03-29 M & T Chemicals Inc. Bright acid zinc plating
CA1128458A (fr) * 1977-06-06 1982-07-27 Tokuyama Soda Kabushiki Kaisha Pile d'electrolyse a cathode de fer ou de nickel plaquee dans un bain de nickelage s/n
DE2921241A1 (de) * 1979-04-19 1980-10-23 Alusuisse Saurer zinn-ii-haltiger elektrolyt
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives
US4614568A (en) * 1983-06-14 1986-09-30 Nihon Kogyo Kabushiki Kaisha High-speed silver plating and baths therefor
GB8522046D0 (en) * 1985-09-05 1985-10-09 Interox Chemicals Ltd Stabilisation
ES2624637T3 (es) * 2008-05-30 2017-07-17 Atotech Deutschland Gmbh Aditivo de electrogalvanoplastia para la deposición de una aleación de un metal del grupo IB/binaria o ternaria del grupo IB-grupo IIIA/ternaria, cuaternaria o quinaria del grupo IB, el grupo IIIA-grupo VIA

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1071438B (de) * 1959-12-17 Deutsche Gold- und Silber-Scheideanstalt vormals Roessler, Frankfurt/M Anode für galvanische Bäder und Verfahren zu ihrer Herstellung
US1003092A (en) * 1907-04-11 1911-09-12 Ontario Nickel Company Ltd Method of electrolyzing nickel-sulfate solutions.
US1371414A (en) * 1919-06-17 1921-03-15 Thomas A Edison Nickel-plating
US2248092A (en) * 1934-10-26 1941-07-08 Sherka Chemical Co Inc Method for treating electroplating baths
US2449422A (en) * 1944-04-15 1948-09-14 Harshaw Chem Corp Electrodeposition of nickel
BE517665A (fr) * 1949-11-23
AT172066B (de) * 1950-03-27 1952-08-11 H C Dr Wilhelm Dipl Pfanhauser Verfahren zur Herstellung harter, glänzender Kupferniederschläge durch elektrolytische Abscheidung
NL109804C (fr) * 1953-09-19
US2799634A (en) * 1954-02-26 1957-07-16 Westinghouse Electric Corp Combined addition agents for acid copper plating
BE550706A (fr) * 1956-01-27
US2879211A (en) * 1956-11-16 1959-03-24 Hanson Van Winkle Munning Co Electroplating duplex nickel coatings
US2885399A (en) * 1957-03-04 1959-05-05 Univ Ohio State Res Found Hydrazinium hexafluorophosphate salts
DE1152863B (de) * 1957-03-16 1963-08-14 Riedel & Co Saure Baeder zur Herstellung von einebnenden Kupferueberzuegen

Also Published As

Publication number Publication date
DE1421977A1 (de) 1968-11-07
DE1224111B (de) 1966-09-01
CH429356A (de) 1967-01-31
GB941823A (en) 1963-11-13
GB1055243A (en) 1967-01-18
BE621297A (fr)
US3257294A (en) 1966-06-21
US3245886A (en) 1966-04-12
DE1421977B2 (de) 1970-02-19

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