NL188192B - Elektronenmicroscoop. - Google Patents

Elektronenmicroscoop.

Info

Publication number
NL188192B
NL188192B NLAANVRAGE8001482,A NL8001482A NL188192B NL 188192 B NL188192 B NL 188192B NL 8001482 A NL8001482 A NL 8001482A NL 188192 B NL188192 B NL 188192B
Authority
NL
Netherlands
Prior art keywords
electron microscope
microscope
electron
Prior art date
Application number
NLAANVRAGE8001482,A
Other languages
English (en)
Other versions
NL188192C (nl
NL8001482A (nl
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of NL8001482A publication Critical patent/NL8001482A/nl
Publication of NL188192B publication Critical patent/NL188192B/nl
Application granted granted Critical
Publication of NL188192C publication Critical patent/NL188192C/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
NLAANVRAGE8001482,A 1979-03-14 1980-03-12 Elektronenmicroscoop. NL188192C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2870379A JPS55121259A (en) 1979-03-14 1979-03-14 Elelctron microscope
JP2870379 1979-03-14

Publications (3)

Publication Number Publication Date
NL8001482A NL8001482A (nl) 1980-09-16
NL188192B true NL188192B (nl) 1991-11-18
NL188192C NL188192C (nl) 1992-04-16

Family

ID=12255816

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE8001482,A NL188192C (nl) 1979-03-14 1980-03-12 Elektronenmicroscoop.

Country Status (3)

Country Link
US (1) US4379231A (nl)
JP (1) JPS55121259A (nl)
NL (1) NL188192C (nl)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57111936A (en) * 1980-12-27 1982-07-12 Jeol Ltd Astigmatism correcting device for electron microscope
JPS57176658A (en) * 1981-04-24 1982-10-30 Jeol Ltd Method and device for astigmatism correction of electron microscope
NL8304217A (nl) * 1983-12-07 1985-07-01 Philips Nv Automatisch instelbare electronenmicroscoop.
SE455736B (sv) * 1984-03-15 1988-08-01 Sarastro Ab Forfaringssett och anordning for mikrofotometrering och efterfoljande bildsammanstellning
US4680469A (en) * 1984-08-17 1987-07-14 Hitachi, Ltd. Focusing device for a television electron microscope
JPH07105209B2 (ja) * 1988-04-28 1995-11-13 株式会社日立製作所 電子顕微鏡
US5311028A (en) * 1990-08-29 1994-05-10 Nissin Electric Co., Ltd. System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions
US5479252A (en) * 1993-06-17 1995-12-26 Ultrapointe Corporation Laser imaging system for inspection and analysis of sub-micron particles
US5923430A (en) 1993-06-17 1999-07-13 Ultrapointe Corporation Method for characterizing defects on semiconductor wafers
US6148114A (en) * 1996-11-27 2000-11-14 Ultrapointe Corporation Ring dilation and erosion techniques for digital image processing
JP4795883B2 (ja) * 2006-07-21 2011-10-19 株式会社日立ハイテクノロジーズ パターン検査・計測装置
US8283631B2 (en) * 2008-05-08 2012-10-09 Kla-Tencor Corporation In-situ differential spectroscopy
JP7193694B2 (ja) * 2018-07-26 2022-12-21 国立研究開発法人理化学研究所 電子顕微鏡およびそれを用いた試料観察方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB832500A (en) * 1955-12-12 1960-04-13 Ass Elect Ind Improvements relating to electron optical apparatus
JPS4122595Y1 (nl) * 1964-08-25 1966-11-11
JPS4833903B1 (nl) * 1969-04-08 1973-10-17
JPS4922351B1 (nl) * 1969-12-25 1974-06-07
GB1441824A (en) * 1973-04-19 1976-07-07 Cambridge Scientific Instr Ltd Scanning electronbeam instrument
JPS51132885A (en) * 1975-01-17 1976-11-18 Hitachi Ltd Pasticle ray analyzing unit
NL7510276A (nl) * 1975-09-01 1977-03-03 Philips Nv Elektronenmikroskoop.
FR2341922A1 (fr) * 1976-02-17 1977-09-16 Cgr Mev Perfectionnement a un dispositif de balayage d'une cible par un faisceau de particules chargees
US4117339A (en) * 1977-07-01 1978-09-26 Burroughs Corporation Double deflection electron beam generator for employment in the fabrication of semiconductor and other devices
US4162403A (en) * 1978-07-26 1979-07-24 Advanced Metals Research Corp. Method and means for compensating for charge carrier beam astigmatism

Also Published As

Publication number Publication date
JPH0324015B2 (nl) 1991-04-02
NL188192C (nl) 1992-04-16
US4379231A (en) 1983-04-05
NL8001482A (nl) 1980-09-16
JPS55121259A (en) 1980-09-18

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Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
BC A request for examination has been filed
V4 Discontinued because of reaching the maximum lifetime of a patent

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