NL184386C - Kinematisch roentgenanalyse-apparaat. - Google Patents
Kinematisch roentgenanalyse-apparaat.Info
- Publication number
- NL184386C NL184386C NLAANVRAGE8300927,A NL8300927A NL184386C NL 184386 C NL184386 C NL 184386C NL 8300927 A NL8300927 A NL 8300927A NL 184386 C NL184386 C NL 184386C
- Authority
- NL
- Netherlands
- Prior art keywords
- roentgen
- kinematic
- analysis device
- analysis
- roentgen analysis
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/03—Investigating materials by wave or particle radiation by transmission
- G01N2223/04—Investigating materials by wave or particle radiation by transmission and measuring absorption
- G01N2223/041—X-ray absorption fine structure [EXAFS]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/32—Accessories, mechanical or electrical features adjustments of elements during operation
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NLAANVRAGE8300927,A NL184386C (nl) | 1983-03-15 | 1983-03-15 | Kinematisch roentgenanalyse-apparaat. |
CA000449131A CA1223093A (en) | 1983-03-15 | 1984-03-08 | Kinematic x-ray analysis apparatus |
US06/588,280 US4637041A (en) | 1983-03-15 | 1984-03-12 | Kinematic X-ray analyses apparatus |
EP84200360A EP0118965B1 (en) | 1983-03-15 | 1984-03-13 | Kinematic x-ray analysis apparatus |
DE8484200360T DE3471525D1 (en) | 1983-03-15 | 1984-03-13 | Kinematic x-ray analysis apparatus |
JP59048261A JPS6040943A (ja) | 1983-03-15 | 1984-03-15 | X線分析装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NLAANVRAGE8300927,A NL184386C (nl) | 1983-03-15 | 1983-03-15 | Kinematisch roentgenanalyse-apparaat. |
NL8300927 | 1983-03-15 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL8300927A NL8300927A (nl) | 1984-10-01 |
NL184386B NL184386B (nl) | 1989-02-01 |
NL184386C true NL184386C (nl) | 1989-07-03 |
Family
ID=19841549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE8300927,A NL184386C (nl) | 1983-03-15 | 1983-03-15 | Kinematisch roentgenanalyse-apparaat. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4637041A (nl) |
EP (1) | EP0118965B1 (nl) |
JP (1) | JPS6040943A (nl) |
CA (1) | CA1223093A (nl) |
DE (1) | DE3471525D1 (nl) |
NL (1) | NL184386C (nl) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8607481D0 (en) * | 1986-03-26 | 1986-04-30 | Howe S | Grading orientation errors in crystal specimens |
NL8702475A (nl) * | 1987-10-16 | 1989-05-16 | Philips Nv | Roentgen analyse apparaat. |
DE4102850A1 (de) * | 1991-01-31 | 1992-08-06 | Philips Patentverwaltung | Roentgenographisches spannungsmessgeraet |
EP0547695B1 (en) * | 1991-12-18 | 1997-09-03 | Koninklijke Philips Electronics N.V. | X-ray analysis apparatus |
US5268954A (en) * | 1992-10-14 | 1993-12-07 | Wisconsin Alumni Research Foundation | Mounting apparatus for double crystal monochromators and the like |
US5596620A (en) * | 1993-04-30 | 1997-01-21 | The University Of Connecticut | X-ray based extensometry device for radiography |
JP3488843B2 (ja) * | 1999-08-26 | 2004-01-19 | 理学電機株式会社 | X線分光装置及びxafs測定装置 |
US6680996B2 (en) * | 2002-02-19 | 2004-01-20 | Jordan Valley Applied Radiation Ltd. | Dual-wavelength X-ray reflectometry |
TW200948894A (en) * | 2007-12-19 | 2009-12-01 | Asahi Glass Co Ltd | Ether composition |
DE102008020108B3 (de) * | 2008-04-22 | 2010-01-14 | Bruker Axs Gmbh | Röntgendiffraktometer zum mechanisch korrelierten Verfahren von Quelle, Detektor und Probenposition |
US8259901B1 (en) | 2010-05-25 | 2012-09-04 | Rubicon Technology, Inc. | Intelligent machines and process for production of monocrystalline products with goniometer continual feedback |
US8724776B2 (en) | 2010-09-10 | 2014-05-13 | Brookhaven Science Associates, Llc | Two-axis sagittal focusing monochromator |
AU2016287001A1 (en) | 2015-06-30 | 2018-01-04 | Xplorex Gmbh | Improved X-ray diffractometer |
NL2015060B1 (en) * | 2015-06-30 | 2017-01-24 | Xplorex Gmbh | Improved X-ray diffractometer. |
ES2911717T3 (es) * | 2015-12-28 | 2022-05-20 | Univ Washington | Métodos para alinear un espectrómetro |
EP4048990A4 (en) * | 2019-10-21 | 2023-11-08 | Easyxafs, LLC | SPECTROMETER |
CN110702711B (zh) * | 2019-11-21 | 2022-02-25 | 山东建筑大学 | 非晶态合金结晶动力学特征的原位exafs表征方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3123710A (en) * | 1964-03-03 | Mechanical motion and x | ||
US2898469A (en) * | 1956-09-11 | 1959-08-04 | Gen Electric | X-ray diffraction apparatus |
US3051833A (en) * | 1959-03-30 | 1962-08-28 | Ontario Research Foundation | X-ray spectrometer |
DE1472373B2 (de) * | 1964-05-23 | 1970-02-26 | Chirana Praha n.p., Prag | Spindel, insbesondere für Röntgengo niomet er |
US3445653A (en) * | 1964-10-10 | 1969-05-20 | Hitachi Ltd | X-ray monochromator of linear type |
US3384756A (en) * | 1965-04-21 | 1968-05-21 | Applied Res Lab Inc | Peaked monochromator having a sharply blazed diffraction grating which is always operated at the peak of the blaze |
FR1575196A (nl) * | 1967-08-05 | 1969-07-18 | ||
DE2633114C2 (de) * | 1976-07-23 | 1978-08-03 | Allianz-Zentrum Fuer Technik Gmbh, 8000 Muenchen | Spannungsmeßgoniometer für die Bauteilprüfung |
JPS5772050A (en) * | 1980-10-22 | 1982-05-06 | Jeol Ltd | Goniometer such as x-ray microanalyzer |
US4446568A (en) * | 1981-06-05 | 1984-05-01 | California Institute Of Technology | Versatile focusing radiation analyzer |
JPS59124348U (ja) * | 1983-02-10 | 1984-08-21 | 日本エックス線株式会社 | X線測定装置 |
-
1983
- 1983-03-15 NL NLAANVRAGE8300927,A patent/NL184386C/nl not_active IP Right Cessation
-
1984
- 1984-03-08 CA CA000449131A patent/CA1223093A/en not_active Expired
- 1984-03-12 US US06/588,280 patent/US4637041A/en not_active Expired - Fee Related
- 1984-03-13 EP EP84200360A patent/EP0118965B1/en not_active Expired
- 1984-03-13 DE DE8484200360T patent/DE3471525D1/de not_active Expired
- 1984-03-15 JP JP59048261A patent/JPS6040943A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
US4637041A (en) | 1987-01-13 |
NL184386B (nl) | 1989-02-01 |
CA1223093A (en) | 1987-06-16 |
JPS6040943A (ja) | 1985-03-04 |
EP0118965A1 (en) | 1984-09-19 |
EP0118965B1 (en) | 1988-05-25 |
DE3471525D1 (en) | 1988-06-30 |
NL8300927A (nl) | 1984-10-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A1C | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
V1 | Lapsed because of non-payment of the annual fee |