NL163029C - Werkwijze voor het vormen van een ondersteund fotografisch reliefbeeld. - Google Patents

Werkwijze voor het vormen van een ondersteund fotografisch reliefbeeld.

Info

Publication number
NL163029C
NL163029C NL6814660.A NL6814660A NL163029C NL 163029 C NL163029 C NL 163029C NL 6814660 A NL6814660 A NL 6814660A NL 163029 C NL163029 C NL 163029C
Authority
NL
Netherlands
Prior art keywords
forming
relief image
photographic relief
supported
supported photographic
Prior art date
Application number
NL6814660.A
Other languages
English (en)
Dutch (nl)
Other versions
NL6814660A (xx
NL163029B (nl
Original Assignee
Grace W R & Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Grace W R & Co filed Critical Grace W R & Co
Publication of NL6814660A publication Critical patent/NL6814660A/xx
Publication of NL163029B publication Critical patent/NL163029B/xx
Application granted granted Critical
Publication of NL163029C publication Critical patent/NL163029C/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67—Unsaturated compounds having active hydrogen
    • C08G18/671—Unsaturated compounds having only one group containing active hydrogen
    • C08G18/6715—Unsaturated monofunctional alcohols or amines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/83—Chemically modified polymers
    • C08G18/834—Chemically modified polymers by compounds containing a thiol group
    • C08G18/835—Unsaturated polymers modified by compounds containing a thiol group
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32—Polymers modified by chemical after-treatment
    • C08G65/329—Polymers modified by chemical after-treatment with organic compounds
    • C08G65/334—Polymers modified by chemical after-treatment with organic compounds containing sulfur
    • C08G65/3342—Polymers modified by chemical after-treatment with organic compounds containing sulfur having sulfur bound to carbon and hydrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/12—Polythioether-ethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/14—Polysulfides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
NL6814660.A 1967-10-12 1968-10-14 Werkwijze voor het vormen van een ondersteund fotografisch reliefbeeld. NL163029C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67477367A 1967-10-12 1967-10-12
US6331270A 1970-08-11 1970-08-11

Publications (3)

Publication Number Publication Date
NL6814660A NL6814660A (xx) 1969-04-15
NL163029B NL163029B (nl) 1980-02-15
NL163029C true NL163029C (nl) 1980-07-15

Family

ID=26743268

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6814660.A NL163029C (nl) 1967-10-12 1968-10-14 Werkwijze voor het vormen van een ondersteund fotografisch reliefbeeld.

Country Status (5)

Country Link
US (1) US3615450A (xx)
DE (1) DE1802559C3 (xx)
FR (1) FR1591116A (xx)
GB (1) GB1251232A (xx)
NL (1) NL163029C (xx)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3748190A (en) * 1971-05-13 1973-07-24 Grace W R & Co Laminated aluminum article and method
US3767398A (en) * 1971-10-26 1973-10-23 C Morgan Solid photoresist comprising a polyene and a polythiol
US3861917A (en) * 1972-02-22 1975-01-21 Grace W R & Co Continuous tone lithographic plate and method of making
US3864229A (en) * 1972-03-06 1975-02-04 Exxon Research Engineering Co Polythiol accelerated radiation cross-linking of olefinically unsaturated polymers
US3936530A (en) * 1972-05-05 1976-02-03 W. R. Grace & Co. Method for preparing coatings using curable solid styrene-allyl alcohol copolymer based polyene and polythiol compositions
US3832421A (en) * 1972-05-05 1974-08-27 Grace W R & Co Curable compositions containing solid styrene-allyl alcohol copolymer based polyenes and polythiols
US3856645A (en) * 1972-05-05 1974-12-24 Grace W R & Co Radiation curing of solid styrene-allyl alcohol copolymer based polyene-polythiol compositions
GB1464942A (en) * 1973-02-01 1977-02-16 Polychrome Corp Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images
US3883352A (en) * 1973-04-05 1975-05-13 Grace W R & Co Process for forming a photocured solder resist
US4042996A (en) * 1973-08-14 1977-08-23 W. R. Grace & Co. Air etching of polymeric printing plates
US4145790A (en) * 1975-06-25 1979-03-27 W. R. Grace & Co. Air etching of polymeric printing plates
US4197126A (en) * 1975-06-25 1980-04-08 W. R. Grace & Co. Air etching of polymeric printing plates
US4234676A (en) * 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4179531A (en) * 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
DE2834768A1 (de) * 1977-08-23 1979-03-08 Grace W R & Co Verfahren zur herstellung einer druckplatte und sie enthaltende haertbare polymerzusammensetzung
US4291116A (en) * 1977-10-28 1981-09-22 Tibbetts Charles C Method of image reproduction and materials therefor
US4407862A (en) 1978-03-31 1983-10-04 W. R. Grace & Co. Method of making letterpress printing plates
NL7902502A (nl) * 1978-03-31 1979-10-02 Grace W R & Co Drukplaat voor hoogdruk van het fotopolymeertype.
GB2030584B (en) 1978-10-03 1983-03-23 Lankro Chem Ltd Photopolymerisable solder resist compositions
US4286518A (en) * 1979-07-25 1981-09-01 Armstrong World Industries, Inc. Print screen stencil
US4340657A (en) * 1980-02-19 1982-07-20 Polychrome Corporation Novel radiation-sensitive articles
US4463169A (en) * 1981-09-19 1984-07-31 Ciba-Geigy Corporation Three component, carboxyl-containing compositions comprising dimercaptan
JPS59143158A (ja) * 1983-02-07 1984-08-16 W R Gureesu:Kk 印刷版の製造方法
US4582777A (en) * 1983-05-18 1986-04-15 W. R. Grace & Co. Compressible printing plate
JPS6184289A (ja) * 1984-09-28 1986-04-28 ハーキユリーズ・インコーポレーテツド 圧縮性印刷版とその製造方法
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
US5082914A (en) * 1989-12-15 1992-01-21 Eastman Kodak Company Grafted cellulose esters containing a silicon moiety
CN1143929A (zh) * 1994-11-24 1997-02-26 精工爱普生株式会社 图章坯料与使用该图章坯料制作图章的方法以及利用该图章制作方法制作出的图章
JP3317126B2 (ja) * 1995-03-30 2002-08-26 セイコーエプソン株式会社 スタンプ素材およびスタンプ素材の作成方法
DE29718387U1 (de) * 1996-10-25 1998-01-22 Koenig & Bauer-Albert Aktiengesellschaft, 97080 Würzburg Rakel für eine Rotationsdruckmaschine
US5731033A (en) * 1997-03-31 1998-03-24 Hanisco; Christine M. Medium and process for manufacturing a stamp
IL133355A (en) * 1999-12-07 2003-10-31 Creo Il Ltd Method and plate for digitally-imaged offset printing
US6559260B1 (en) * 2000-03-27 2003-05-06 Sartomer Technology Company, Inc. Allyl urethane resin compositions
US20050170287A1 (en) * 2004-01-30 2005-08-04 Kanga Rustom S. Photosensitive printing sleeves and method of forming the same
JP2007055224A (ja) * 2005-01-26 2007-03-08 Fujifilm Corp 平版印刷版原版、平版印刷方法および平版印刷版原版の梱包体
AT503223A1 (de) * 2006-01-20 2007-08-15 Trodat Gmbh Druckplatte
TWI307505B (en) * 2006-03-08 2009-03-11 Ind Tech Res Inst Apparatus for fabricating coverlayer of optical information storage media and operating method of the same
US20100141969A1 (en) * 2008-12-08 2010-06-10 Brazier David B Method and Apparatus for Making Liquid Flexographic Printing Elements

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3055758A (en) * 1958-01-16 1962-09-25 Du Pont Production of direct positive images and light sensitive element therefor
NL254306A (xx) * 1959-08-07
US3036914A (en) * 1960-01-22 1962-05-29 Du Pont Photopolymerizable compositions and elements

Also Published As

Publication number Publication date
GB1251232A (xx) 1971-10-27
NL6814660A (xx) 1969-04-15
FR1591116A (xx) 1970-04-27
DE1802559C3 (de) 1981-08-20
DE1802559A1 (de) 1969-06-26
NL163029B (nl) 1980-02-15
US3615450A (en) 1971-10-26
DE1802559B2 (de) 1980-12-18

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Legal Events

Date Code Title Description
V4 Discontinued because of reaching the maximum lifetime of a patent