NL163029C - Werkwijze voor het vormen van een ondersteund fotografisch reliefbeeld. - Google Patents
Werkwijze voor het vormen van een ondersteund fotografisch reliefbeeld.Info
- Publication number
- NL163029C NL163029C NL6814660.A NL6814660A NL163029C NL 163029 C NL163029 C NL 163029C NL 6814660 A NL6814660 A NL 6814660A NL 163029 C NL163029 C NL 163029C
- Authority
- NL
- Netherlands
- Prior art keywords
- forming
- relief image
- photographic relief
- supported
- supported photographic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/81—Unsaturated isocyanates or isothiocyanates
- C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/6715—Unsaturated monofunctional alcohols or amines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/83—Chemically modified polymers
- C08G18/834—Chemically modified polymers by compounds containing a thiol group
- C08G18/835—Unsaturated polymers modified by compounds containing a thiol group
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/334—Polymers modified by chemical after-treatment with organic compounds containing sulfur
- C08G65/3342—Polymers modified by chemical after-treatment with organic compounds containing sulfur having sulfur bound to carbon and hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
- C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
- C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/12—Polythioether-ethers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/14—Polysulfides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US67477367A | 1967-10-12 | 1967-10-12 | |
US6331270A | 1970-08-11 | 1970-08-11 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL6814660A NL6814660A (nl) | 1969-04-15 |
NL163029B NL163029B (nl) | 1980-02-15 |
NL163029C true NL163029C (nl) | 1980-07-15 |
Family
ID=26743268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6814660.A NL163029C (nl) | 1967-10-12 | 1968-10-14 | Werkwijze voor het vormen van een ondersteund fotografisch reliefbeeld. |
Country Status (5)
Country | Link |
---|---|
US (1) | US3615450A (nl) |
DE (1) | DE1802559C3 (nl) |
FR (1) | FR1591116A (nl) |
GB (1) | GB1251232A (nl) |
NL (1) | NL163029C (nl) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3748190A (en) * | 1971-05-13 | 1973-07-24 | Grace W R & Co | Laminated aluminum article and method |
US3767398A (en) * | 1971-10-26 | 1973-10-23 | C Morgan | Solid photoresist comprising a polyene and a polythiol |
US3861917A (en) * | 1972-02-22 | 1975-01-21 | Grace W R & Co | Continuous tone lithographic plate and method of making |
US3864229A (en) * | 1972-03-06 | 1975-02-04 | Exxon Research Engineering Co | Polythiol accelerated radiation cross-linking of olefinically unsaturated polymers |
US3856645A (en) * | 1972-05-05 | 1974-12-24 | Grace W R & Co | Radiation curing of solid styrene-allyl alcohol copolymer based polyene-polythiol compositions |
US3832421A (en) * | 1972-05-05 | 1974-08-27 | Grace W R & Co | Curable compositions containing solid styrene-allyl alcohol copolymer based polyenes and polythiols |
US3936530A (en) * | 1972-05-05 | 1976-02-03 | W. R. Grace & Co. | Method for preparing coatings using curable solid styrene-allyl alcohol copolymer based polyene and polythiol compositions |
GB1464942A (en) * | 1973-02-01 | 1977-02-16 | Polychrome Corp | Polymers process for their preparation and their use in photo polymerizable compositions and elements for relief images |
US3883352A (en) * | 1973-04-05 | 1975-05-13 | Grace W R & Co | Process for forming a photocured solder resist |
US4042996A (en) * | 1973-08-14 | 1977-08-23 | W. R. Grace & Co. | Air etching of polymeric printing plates |
US4145790A (en) * | 1975-06-25 | 1979-03-27 | W. R. Grace & Co. | Air etching of polymeric printing plates |
US4197126A (en) * | 1975-06-25 | 1980-04-08 | W. R. Grace & Co. | Air etching of polymeric printing plates |
DE2834768A1 (de) * | 1977-08-23 | 1979-03-08 | Grace W R & Co | Verfahren zur herstellung einer druckplatte und sie enthaltende haertbare polymerzusammensetzung |
US4234676A (en) * | 1978-01-23 | 1980-11-18 | W. R. Grace & Co. | Polythiol effect curable polymeric composition |
US4179531A (en) * | 1977-08-23 | 1979-12-18 | W. R. Grace & Co. | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
US4291116A (en) * | 1977-10-28 | 1981-09-22 | Tibbetts Charles C | Method of image reproduction and materials therefor |
US4407862A (en) | 1978-03-31 | 1983-10-04 | W. R. Grace & Co. | Method of making letterpress printing plates |
GB2019023B (en) * | 1978-03-31 | 1982-11-17 | Grace W R & Co | Letterpress printing plate with a fibrous substrate |
GB2030584B (en) * | 1978-10-03 | 1983-03-23 | Lankro Chem Ltd | Photopolymerisable solder resist compositions |
US4286518A (en) * | 1979-07-25 | 1981-09-01 | Armstrong World Industries, Inc. | Print screen stencil |
US4340657A (en) * | 1980-02-19 | 1982-07-20 | Polychrome Corporation | Novel radiation-sensitive articles |
US4463169A (en) * | 1981-09-19 | 1984-07-31 | Ciba-Geigy Corporation | Three component, carboxyl-containing compositions comprising dimercaptan |
JPS59143158A (ja) * | 1983-02-07 | 1984-08-16 | W R Gureesu:Kk | 印刷版の製造方法 |
US4582777A (en) * | 1983-05-18 | 1986-04-15 | W. R. Grace & Co. | Compressible printing plate |
EP0177302A3 (en) * | 1984-09-28 | 1986-09-17 | Hercules Incorporated | Compressable printing plate |
US4702994A (en) * | 1984-10-01 | 1987-10-27 | W. R. Grace & Co. | Projection imaged relief printing plates |
US5082914A (en) * | 1989-12-15 | 1992-01-21 | Eastman Kodak Company | Grafted cellulose esters containing a silicon moiety |
CN1143929A (zh) * | 1994-11-24 | 1997-02-26 | 精工爱普生株式会社 | 图章坯料与使用该图章坯料制作图章的方法以及利用该图章制作方法制作出的图章 |
JP3317126B2 (ja) * | 1995-03-30 | 2002-08-26 | セイコーエプソン株式会社 | スタンプ素材およびスタンプ素材の作成方法 |
DE29718387U1 (de) * | 1996-10-25 | 1998-01-22 | Koenig & Bauer-Albert Aktiengesellschaft, 97080 Würzburg | Rakel für eine Rotationsdruckmaschine |
US5731033A (en) * | 1997-03-31 | 1998-03-24 | Hanisco; Christine M. | Medium and process for manufacturing a stamp |
IL133355A (en) * | 1999-12-07 | 2003-10-31 | Creo Il Ltd | Method and plate for digitally-imaged offset printing |
US6559260B1 (en) | 2000-03-27 | 2003-05-06 | Sartomer Technology Company, Inc. | Allyl urethane resin compositions |
US20050170287A1 (en) * | 2004-01-30 | 2005-08-04 | Kanga Rustom S. | Photosensitive printing sleeves and method of forming the same |
EP1798031A3 (en) * | 2005-01-26 | 2007-07-04 | FUJIFILM Corporation | Lithographic printing plate precursor and lithographic printing method |
AT503223A1 (de) * | 2006-01-20 | 2007-08-15 | Trodat Gmbh | Druckplatte |
TWI307505B (en) * | 2006-03-08 | 2009-03-11 | Ind Tech Res Inst | Apparatus for fabricating coverlayer of optical information storage media and operating method of the same |
US20100141969A1 (en) * | 2008-12-08 | 2010-06-10 | Brazier David B | Method and Apparatus for Making Liquid Flexographic Printing Elements |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3055758A (en) * | 1958-01-16 | 1962-09-25 | Du Pont | Production of direct positive images and light sensitive element therefor |
NL254306A (nl) * | 1959-08-07 | |||
US3036914A (en) * | 1960-01-22 | 1962-05-29 | Du Pont | Photopolymerizable compositions and elements |
-
1968
- 1968-10-10 GB GB1251232D patent/GB1251232A/en not_active Expired
- 1968-10-11 DE DE1802559A patent/DE1802559C3/de not_active Expired
- 1968-10-11 FR FR1591116D patent/FR1591116A/fr not_active Expired
- 1968-10-14 NL NL6814660.A patent/NL163029C/nl not_active IP Right Cessation
-
1970
- 1970-08-11 US US63312A patent/US3615450A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US3615450A (en) | 1971-10-26 |
DE1802559A1 (de) | 1969-06-26 |
DE1802559C3 (de) | 1981-08-20 |
GB1251232A (nl) | 1971-10-27 |
NL6814660A (nl) | 1969-04-15 |
NL163029B (nl) | 1980-02-15 |
FR1591116A (nl) | 1970-04-27 |
DE1802559B2 (de) | 1980-12-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
V4 | Discontinued because of reaching the maximum lifetime of a patent |