NL109549C - - Google Patents

Info

Publication number
NL109549C
NL109549C NL109549DA NL109549C NL 109549 C NL109549 C NL 109549C NL 109549D A NL109549D A NL 109549DA NL 109549 C NL109549 C NL 109549C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL109549C publication Critical patent/NL109549C/xx

Links

Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00Radiation therapy
    • A61N5/10X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/081Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing particle radiation or gamma-radiation
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21HOBTAINING ENERGY FROM RADIOACTIVE SOURCES; APPLICATIONS OF RADIATION FROM RADIOACTIVE SOURCES, NOT OTHERWISE PROVIDED FOR; UTILISING COSMIC RADIATION
    • G21H5/00Applications of radiation from radioactive sources or arrangements therefor, not otherwise provided for 
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00Irradiation devices
    • G21K5/04Irradiation devices with beam-forming means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/20Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15External mechanical adjustment of electron or ion optical components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301Arrangements enabling beams to pass between regions of different pressure
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S164/00Metal founding
    • Y10S164/04Dental

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Biomedical Technology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Public Health (AREA)
  • Animal Behavior & Ethology (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Pathology (AREA)
  • Veterinary Medicine (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Particle Accelerators (AREA)
  • Electron Beam Exposure (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
NL109549D 1952-10-17 NL109549C (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DESCH10753A DE971610C (de) 1952-10-17 1952-10-17 Dynamische Druckstufenstrecke zur UEberfuehrung eines Korpuskular-strahlbuendels aus Raeumen niederen Gasdruckes in Raeume hoeheren Gasdruckes
DE332987X 1952-10-17

Publications (1)

Publication Number Publication Date
NL109549C true NL109549C (da)

Family

ID=25813300

Family Applications (1)

Application Number Title Priority Date Filing Date
NL109549D NL109549C (da) 1952-10-17

Country Status (6)

Country Link
US (1) US2899556A (da)
CH (1) CH332987A (da)
DE (1) DE971610C (da)
FR (1) FR1090183A (da)
GB (3) GB777426A (da)
NL (1) NL109549C (da)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB85458A (da) * 1958-05-05
NL248568A (da) * 1959-02-20
US3082316A (en) * 1960-04-12 1963-03-19 Air Reduction Electron beam welding
NL271015A (da) * 1960-12-06
CH394629A (de) * 1961-03-20 1965-06-30 Trueb Taeuber & Co Ag Verfahren und Vorrichtung zur Aufnahme und Eichung von Elektronenbeugungsdiagrammen
US3197669A (en) * 1961-05-12 1965-07-27 Welding Research Inc Electron emitting element for electron gun
US3343828A (en) * 1962-03-30 1967-09-26 Air Reduction High vacuum furnace
US3174026A (en) * 1962-06-20 1965-03-16 Budd Co Method and means of circumventing cathode maintenance in electron beam devices
DE1253841B (de) * 1962-07-11 1967-11-09 United Aircraft Corp Vorrichtung zur Materialbearbeitung mittels eines Ladungstraegerstrahles
BE638949A (da) * 1962-11-05
US3218431A (en) * 1962-12-27 1965-11-16 Gen Electric Self-focusing electron beam apparatus
US3162749A (en) * 1962-12-31 1964-12-22 United Aircraft Corp Jet valve pressure staging device
US3585349A (en) * 1963-04-15 1971-06-15 Rohr Corp Nonvacuum environmentally controlled electron beam
US3322577A (en) * 1963-05-03 1967-05-30 Temescal Metallurgical Corp Method and apparatus for the continuous production of oxide coatings
US3294954A (en) * 1963-10-15 1966-12-27 Harnischfeger Corp Welding method and apparatus
US3271556A (en) * 1963-10-31 1966-09-06 Lockheed Aircraft Corp Atmospheric charged particle beam welding
DE1515201B2 (de) * 1964-08-08 1973-04-05 Steigerwald Strahltechnik GmbH, 8000 München Vorrichtung zur materialbearbeitung mittels eines korpuskularstrahles
US3346736A (en) * 1964-09-22 1967-10-10 Applied Res Lab Inc Electron probe apparatus having an objective lens with an aperture for restricting fluid flow
US3393289A (en) * 1964-11-12 1968-07-16 United Aircraft Corp Self-cleaning electron beam exit orifice
US3315732A (en) * 1965-03-29 1967-04-25 Edward L Garwin High energy particle beam dump and heat sink
US3444350A (en) * 1965-10-23 1969-05-13 United Aircraft Corp Jet diffuser plate for electron beam device
US3412196A (en) * 1966-07-13 1968-11-19 Sanders Associates Inc Electron beam vacuum melting furnace
US3469066A (en) * 1966-09-30 1969-09-23 Nasa Method and device for preventing high voltage arcing in electron beam welding
FR1528680A (fr) * 1967-03-21 1968-06-14 Onera (Off Nat Aerospatiale) Dispositif pour la mesure d'un rayonnement se produisant dans une enceinte dont l'atmosphère est à faible pression
US3474220A (en) * 1967-05-17 1969-10-21 Webb James E Device for preventing high voltage arcing in electron beam welding
FR2116931A5 (fr) * 1970-12-11 1972-07-21 Onera (Off Nat Aerospatiale) Dispositif de protection d'appareillages d'etude d'echantillons a l'aide d'un pinceau d'electrons
US3725633A (en) * 1971-01-08 1973-04-03 Westinghouse Electric Corp Corpuscular beam in the atmosphere
US3770934A (en) * 1971-10-29 1973-11-06 Machlett Lab Inc Electron beam heating apparatus
US3851273A (en) * 1972-05-02 1974-11-26 Avco Corp Aerodynamic laser window
US4484339A (en) * 1981-02-09 1984-11-20 Battelle Development Corporation Providing X-rays
EP0105261B1 (en) * 1982-04-14 1988-07-06 Battelle Development Corporation Providing x-rays
US4524261A (en) * 1983-09-19 1985-06-18 Varian Associates, Inc. Localized vacuum processing apparatus
US4823006A (en) * 1987-05-21 1989-04-18 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
US5103102A (en) * 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method
JP2732961B2 (ja) * 1991-07-18 1998-03-30 株式会社日立製作所 荷電粒子線装置
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US5828064A (en) * 1995-08-11 1998-10-27 Philips Electronics North America Corporation Field emission environmental scanning electron microscope
JPH11345584A (ja) * 1998-06-01 1999-12-14 Rikagaku Kenkyusho イオン散乱分光装置
DE10007650C2 (de) * 2000-02-19 2003-04-10 Leica Microsystems Lichtoptisches Mikroskop mit Elektronenstrahl-Einrichtung
US20090205947A1 (en) * 2005-02-10 2009-08-20 John Barkanic Method for the reduction of malodorous compounds
CN1862250A (zh) * 2005-05-09 2006-11-15 李炳寰 在真空或低压环境中操作液体且可供观测的方法及装置
IT1399182B1 (it) * 2010-01-28 2013-04-11 Pattini Metodo e apparecchiatura per il trasporto di fasci di elettroni
JP6735134B2 (ja) * 2016-04-18 2020-08-05 日立造船株式会社 ノズル式電子線照射装置およびこれを具備する電子線滅菌設備
US11469072B2 (en) 2021-02-17 2022-10-11 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam apparatus, scanning electron microscope, and method of operating a charged particle beam apparatus

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1326794A (en) * 1919-12-30 sinding-larsen
DE712434C (de) * 1938-01-26 1941-10-18 Siemens & Halske Akt Ges Verfahren zur Herstellung von reinen Oberflaechenfiltern und Ultrafiltern
BE434469A (da) * 1938-05-20
US2319061A (en) * 1941-01-31 1943-05-11 Rca Corp Demountable electron gun
CH233969A (de) * 1942-04-29 1944-08-31 Fides Gmbh Korpuskularstrahlapparat.
US2527747A (en) * 1946-01-03 1950-10-31 Margaret N Lewis Apparatus for coating articles by thermal evaporation
US2600151A (en) * 1946-08-15 1952-06-10 John G Backus Ion producing mechanism
BE500536A (da) * 1950-01-31
US2640948A (en) * 1950-09-21 1953-06-02 High Voltage Engineering Corp Apparatus for utilizing a beam of high energy electrons in sterilization and in therapy

Also Published As

Publication number Publication date
GB777428A (en) 1957-06-19
DE971610C (de) 1959-02-26
US2899556A (en) 1959-08-11
GB777426A (en) 1957-06-19
GB777427A (en) 1957-06-19
FR1090183A (fr) 1955-03-28
CH332987A (de) 1958-09-30

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