NL1028349C2 - Systeem en werkwijze voor het gebruik van een zijdelings gemonteerde interferometer voor het verwerven van positie-informatie. - Google Patents
Systeem en werkwijze voor het gebruik van een zijdelings gemonteerde interferometer voor het verwerven van positie-informatie. Download PDFInfo
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- NL1028349C2 NL1028349C2 NL1028349A NL1028349A NL1028349C2 NL 1028349 C2 NL1028349 C2 NL 1028349C2 NL 1028349 A NL1028349 A NL 1028349A NL 1028349 A NL1028349 A NL 1028349A NL 1028349 C2 NL1028349 C2 NL 1028349C2
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- Netherlands
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Links
- 238000000034 method Methods 0.000 title claims description 14
- 238000006073 displacement reaction Methods 0.000 claims description 26
- 230000010287 polarization Effects 0.000 claims description 17
- 230000003287 optical effect Effects 0.000 claims description 16
- 230000033001 locomotion Effects 0.000 claims description 12
- 235000012773 waffles Nutrition 0.000 claims description 7
- 238000001459 lithography Methods 0.000 claims description 6
- 238000000206 photolithography Methods 0.000 claims description 5
- 238000005305 interferometry Methods 0.000 claims description 2
- 238000005259 measurement Methods 0.000 description 10
- 238000013459 approach Methods 0.000 description 9
- 230000006798 recombination Effects 0.000 description 6
- 238000005215 recombination Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
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- 238000007796 conventional method Methods 0.000 description 2
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/783,199 US7130056B2 (en) | 2004-02-20 | 2004-02-20 | System and method of using a side-mounted interferometer to acquire position information |
| US78319904 | 2004-02-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL1028349A1 NL1028349A1 (nl) | 2005-08-23 |
| NL1028349C2 true NL1028349C2 (nl) | 2006-11-27 |
Family
ID=34861174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL1028349A NL1028349C2 (nl) | 2004-02-20 | 2005-02-18 | Systeem en werkwijze voor het gebruik van een zijdelings gemonteerde interferometer voor het verwerven van positie-informatie. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7130056B2 (https=) |
| JP (1) | JP4880232B2 (https=) |
| CN (1) | CN1306241C (https=) |
| DE (1) | DE102004059400A1 (https=) |
| NL (1) | NL1028349C2 (https=) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7101053B2 (en) * | 2004-01-15 | 2006-09-05 | Associated Universities, Inc. | Multidirectional retroreflectors |
| US7362447B2 (en) * | 2004-02-20 | 2008-04-22 | Agilent Technologies, Inc. | Low walk-off interferometer |
| US7158236B2 (en) * | 2004-05-21 | 2007-01-02 | Agilent Technologies, Inc. | Heterodyne laser interferometer for measuring wafer stage translation |
| US8693006B2 (en) * | 2005-06-28 | 2014-04-08 | Nikon Corporation | Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method |
| US7355719B2 (en) * | 2005-08-16 | 2008-04-08 | Agilent Technologies, Inc. | Interferometer for measuring perpendicular translations |
| WO2007142351A1 (ja) * | 2006-06-09 | 2007-12-13 | Nikon Corporation | 移動体装置、露光装置及び露光方法、並びにデバイス製造方法 |
| TW200900878A (en) * | 2007-04-27 | 2009-01-01 | Nikon Corp | Optical member, interferometer system, stage apparatus, exposure apparatus and device manufacturing method |
| JP2010122183A (ja) * | 2008-11-21 | 2010-06-03 | Sanyo Electric Co Ltd | 物体検出装置および情報取得装置 |
| CN102109769B (zh) * | 2009-12-29 | 2012-10-03 | 上海微电子装备有限公司 | 工件台干涉仪和掩模台干涉仪的联调装置及联调方法 |
| DE102013224381A1 (de) * | 2012-12-20 | 2014-06-26 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
| CN103499287B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 基于双标准光轴气浴的线位移激光干涉仪校准方法与装置 |
| CN103499286B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 回位补偿式双光轴线位移激光干涉仪校准方法与装置 |
| CN103528505B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 四光轴补偿及气浴式线位移激光干涉仪校准方法与装置 |
| CN103528503B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 双光轴补偿及气浴式角位移激光干涉仪校准方法与装置 |
| CN103528509B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 基于双标准光轴气浴的角位移激光干涉仪校准方法与装置 |
| CN103499291B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 基于四标准光轴气浴的角位移激光干涉仪校准方法与装置 |
| CN103499285B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 双光轴补偿及气浴式线位移激光干涉仪校准方法与装置 |
| CN103499280B (zh) * | 2013-10-11 | 2015-04-22 | 哈尔滨工业大学 | 回位补偿式三光轴线位移激光干涉仪校准方法与装置 |
| CN103499277B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 基于四标准光轴的角位移激光干涉仪校准方法与装置 |
| CN103528499B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 形貌补偿式双光轴线位移激光干涉仪校准方法与装置 |
| CN103528504B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 回位补偿式四光轴线位移激光干涉仪校准方法与装置 |
| CN103528502B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 回位补偿式双光轴角位移激光干涉仪校准方法与装置 |
| CN103499289B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 形貌补偿式四光轴角位移激光干涉仪校准方法与装置 |
| CN103499288B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 基于三标准光轴气浴的线位移激光干涉仪校准方法与装置 |
| CN103528526B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 形貌补偿式三光轴线位移激光干涉仪校准方法与装置 |
| CN103528510B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 四光轴补偿及气浴式角位移激光干涉仪校准方法与装置 |
| CN103499281B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 四光轴回位及气浴式线位移激光干涉仪校准方法与装置 |
| CN103528500B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 基于四标准光轴的线位移激光干涉仪校准方法与装置 |
| CN103528501B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 基于四标准光轴气浴的线位移激光干涉仪校准方法与装置 |
| CN103528525B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 三光轴补偿及气浴式线位移激光干涉仪校准方法与装置 |
| CN103499292B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 基于双标准光轴的角位移激光干涉仪校准方法与装置 |
| CN103499282B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 三光轴回位及气浴式线位移激光干涉仪校准方法与装置 |
| CN103499290B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 双光轴回位及气浴式角位移激光干涉仪校准方法与装置 |
| CN103528508B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 形貌补偿式双光轴角位移激光干涉仪校准方法与装置 |
| CN103528507B (zh) * | 2013-10-11 | 2015-02-11 | 哈尔滨工业大学 | 回位补偿式四光轴角位移激光干涉仪校准方法与装置 |
| CN103499278B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 形貌补偿式四光轴线位移激光干涉仪校准方法与装置 |
| CN103499284B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 双光轴回位及气浴式线位移激光干涉仪校准方法与装置 |
| CN103528506B (zh) * | 2013-10-11 | 2015-03-11 | 哈尔滨工业大学 | 四光轴回位及气浴式角位移激光干涉仪校准方法与装置 |
| WO2016190921A1 (en) | 2015-02-05 | 2016-12-01 | Associated Universities, Inc. | Fiber optic based laser range finder |
| US10126411B2 (en) | 2015-03-13 | 2018-11-13 | Continental Advanced Lidar Solutions Us, Llc. | Beam steering LADAR sensor |
| CN106886143B (zh) * | 2017-04-28 | 2019-08-09 | 电子科技大学 | 基于相位全息相关性的全息扫描空间距离提取方法 |
| JP7200234B2 (ja) * | 2017-10-04 | 2023-01-06 | エーエスエムエル ネザーランズ ビー．ブイ． | 干渉計ステージ位置決めデバイス |
| US10697893B2 (en) * | 2018-03-09 | 2020-06-30 | The Boeing Company | Specular variable angle absolute reflectance method and reflectometer |
| JP7265020B2 (ja) | 2019-02-28 | 2023-04-25 | エーエスエムエル ネザーランズ ビー．ブイ． | ステージシステム及びリソグラフィ装置 |
| US11327013B2 (en) | 2020-05-15 | 2022-05-10 | The Boeing Company | Specular variable angle absolute reflectance method and reflectometer |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4891526A (en) * | 1986-12-29 | 1990-01-02 | Hughes Aircraft Company | X-Y-θ-Z positioning stage |
| JPH0599612A (ja) * | 1991-10-04 | 1993-04-23 | Nikon Corp | レーザ干渉計 |
| JP3164960B2 (ja) * | 1994-02-18 | 2001-05-14 | キヤノン株式会社 | ステージ装置 |
| DE69722688T2 (de) * | 1996-02-29 | 2004-01-15 | Boeing Co | Fiberoptisch-gekoppelter interferometrischer Sensor |
| KR100525521B1 (ko) * | 1996-10-21 | 2006-01-27 | 가부시키가이샤 니콘 | 노광장치및노광방법 |
| US6020964A (en) * | 1997-12-02 | 2000-02-01 | Asm Lithography B.V. | Interferometer system and lithograph apparatus including an interferometer system |
| US6208407B1 (en) * | 1997-12-22 | 2001-03-27 | Asm Lithography B.V. | Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement |
| JP3413122B2 (ja) * | 1998-05-21 | 2003-06-03 | キヤノン株式会社 | 位置決め装置及びこれを用いた露光装置並びにデバイス製造方法 |
| TW490596B (en) * | 1999-03-08 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus |
| US6603562B1 (en) * | 1999-10-29 | 2003-08-05 | Yokogawa Electric Corporation | Two-dimensional positioning apparatus and method for measuring laser light from the apparatus |
| JP2004510129A (ja) * | 2000-05-17 | 2004-04-02 | ザイゴ コーポレイション | 干渉装置および干渉方法 |
| JP2003015509A (ja) * | 2001-06-27 | 2003-01-17 | Sony Corp | 画像露光記録装置及び画像露光記録方法 |
| US7193726B2 (en) * | 2001-08-23 | 2007-03-20 | Zygo Corporation | Optical interferometry |
| CN2508215Y (zh) * | 2001-11-09 | 2002-08-28 | 天津大学 | 偏振分束错位式干涉仪 |
-
2004
- 2004-02-20 US US10/783,199 patent/US7130056B2/en not_active Expired - Fee Related
- 2004-12-09 DE DE102004059400A patent/DE102004059400A1/de not_active Withdrawn
- 2004-12-31 CN CNB2004100115232A patent/CN1306241C/zh not_active Expired - Fee Related
-
2005
- 2005-02-18 NL NL1028349A patent/NL1028349C2/nl not_active IP Right Cessation
- 2005-02-21 JP JP2005044034A patent/JP4880232B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20050185193A1 (en) | 2005-08-25 |
| CN1657865A (zh) | 2005-08-24 |
| DE102004059400A1 (de) | 2005-09-15 |
| JP4880232B2 (ja) | 2012-02-22 |
| NL1028349A1 (nl) | 2005-08-23 |
| JP2005233966A (ja) | 2005-09-02 |
| CN1306241C (zh) | 2007-03-21 |
| US7130056B2 (en) | 2006-10-31 |
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| AD1A | A request for search or an international type search has been filed | ||
| RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Effective date: 20060918 |
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| PD2B | A search report has been drawn up | ||
| V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20130901 |