NL1010311C2 - Werkwijze en inrichting voor het corrigeren van nabijheidseffecten. - Google Patents

Werkwijze en inrichting voor het corrigeren van nabijheidseffecten. Download PDF

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Publication number
NL1010311C2
NL1010311C2 NL1010311A NL1010311A NL1010311C2 NL 1010311 C2 NL1010311 C2 NL 1010311C2 NL 1010311 A NL1010311 A NL 1010311A NL 1010311 A NL1010311 A NL 1010311A NL 1010311 C2 NL1010311 C2 NL 1010311C2
Authority
NL
Netherlands
Prior art keywords
pattern
vector
function
determining
neural network
Prior art date
Application number
NL1010311A
Other languages
English (en)
Dutch (nl)
Inventor
Dirk Ernest Maria Van Dyck
Piotr Tomasz Jedrasik
Original Assignee
Dirk Ernest Maria Van Dyck
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dirk Ernest Maria Van Dyck filed Critical Dirk Ernest Maria Van Dyck
Priority to NL1010311A priority Critical patent/NL1010311C2/nl
Priority to PCT/BE1999/000076 priority patent/WO1999066530A1/en
Priority to DE69907452T priority patent/DE69907452T2/de
Priority to US09/719,757 priority patent/US6920368B1/en
Priority to JP2000555273A priority patent/JP2002518840A/ja
Priority to ES99926194T priority patent/ES2199576T3/es
Priority to EP99926194A priority patent/EP1088328B1/en
Priority to AU43541/99A priority patent/AU4354199A/en
Application granted granted Critical
Publication of NL1010311C2 publication Critical patent/NL1010311C2/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control
    • H01J37/3023—Program control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31769—Proximity effect correction
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
NL1010311A 1998-06-16 1998-10-13 Werkwijze en inrichting voor het corrigeren van nabijheidseffecten. NL1010311C2 (nl)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL1010311A NL1010311C2 (nl) 1998-06-16 1998-10-13 Werkwijze en inrichting voor het corrigeren van nabijheidseffecten.
PCT/BE1999/000076 WO1999066530A1 (en) 1998-06-16 1999-06-14 Method and device for correcting proximity effects
DE69907452T DE69907452T2 (de) 1998-06-16 1999-06-14 Verfahren und vorrichtung zur korrektur von angrenzungseffekten
US09/719,757 US6920368B1 (en) 1998-06-16 1999-06-14 Method and device for correcting proximity effects
JP2000555273A JP2002518840A (ja) 1998-06-16 1999-06-14 近接効果を補正する方法および装置
ES99926194T ES2199576T3 (es) 1998-06-16 1999-06-14 Metodo y dispositivo para corregir efectos de proximidad.
EP99926194A EP1088328B1 (en) 1998-06-16 1999-06-14 Method and device for correcting proximity effects
AU43541/99A AU4354199A (en) 1998-06-16 1999-06-14 Method and device for correcting proximity effects

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
NL1009422 1998-06-16
NL1009422 1998-06-16
NL1010311 1998-10-13
NL1010311A NL1010311C2 (nl) 1998-06-16 1998-10-13 Werkwijze en inrichting voor het corrigeren van nabijheidseffecten.

Publications (1)

Publication Number Publication Date
NL1010311C2 true NL1010311C2 (nl) 1999-12-20

Family

ID=26642826

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1010311A NL1010311C2 (nl) 1998-06-16 1998-10-13 Werkwijze en inrichting voor het corrigeren van nabijheidseffecten.

Country Status (8)

Country Link
US (1) US6920368B1 (https=)
EP (1) EP1088328B1 (https=)
JP (1) JP2002518840A (https=)
AU (1) AU4354199A (https=)
DE (1) DE69907452T2 (https=)
ES (1) ES2199576T3 (https=)
NL (1) NL1010311C2 (https=)
WO (1) WO1999066530A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7148496B2 (en) * 2004-04-13 2006-12-12 Massachusetts Institute Of Technology System and method for proximity effect correction in imaging systems
EP1612834A1 (en) * 2004-06-29 2006-01-04 Leica Microsystems Lithography GmbH A process for controlling the proximity effect correction
US20080077907A1 (en) * 2006-09-21 2008-03-27 Kulkami Anand P Neural network-based system and methods for performing optical proximity correction
JP2008122929A (ja) * 2006-10-20 2008-05-29 Toshiba Corp シミュレーションモデルの作成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0443249A2 (en) * 1990-02-22 1991-08-28 AT&T Corp. Manufacturing adjustment during article fabrication

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5736281A (en) * 1996-06-07 1998-04-07 Lucent Technologies Inc. Dose modification proximity effect compensation (PEC) technique for electron beam lithography
US6035113A (en) * 1998-01-05 2000-03-07 International Business Machines Corporation Electron beam proximity correction method for hierarchical design data

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0443249A2 (en) * 1990-02-22 1991-08-28 AT&T Corp. Manufacturing adjustment during article fabrication

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
FRYE R C: "ADAPTIVE NEURAL NETWORK ALGORITHMS FOR COMPUTING PROXIMITY EFFECT CORRECTIONS", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, vol. 9, no. 6, 1 November 1991 (1991-11-01), pages 3054 - 3058, XP000268519 *
JEDRASIK P ET AL: "Optimal filtering versus regularization methods in the Fourier precompensation based proximity neurocorrection in electron beam lithography", MICRO- AND NANO- ENGINEERING 97. MNE INTERNATIONAL CONFERENCE ON MICRO- AND NANOFABRICATION, ATHENS, GREECE, 15-18 SEPT. 1997, vol. 41-42, ISSN 0167-9317, Microelectronic Engineering, March 1998, Elsevier, Netherlands, pages 195 - 198, XP004111700 *
JEDRASIK P: "Neural networks application for fast, direct correction kernel generation for proximity effects correction in electron beam lithography", MICRO- AND NANOENGINEERING 94. INTERNATIONAL CONFERENCE ON MICRO- AND NANOFABRICATION, DAVOS, SWITZERLAND, 26-29 SEPT. 1994, vol. 27, no. 1-4, ISSN 0167-9317, Microelectronic Engineering, Feb. 1995, Netherlands, pages 191 - 194, XP004025063 *

Also Published As

Publication number Publication date
JP2002518840A (ja) 2002-06-25
WO1999066530A1 (en) 1999-12-23
US6920368B1 (en) 2005-07-19
EP1088328A1 (en) 2001-04-04
ES2199576T3 (es) 2004-02-16
DE69907452D1 (de) 2003-06-05
DE69907452T2 (de) 2004-03-18
AU4354199A (en) 2000-01-05
EP1088328B1 (en) 2003-05-02

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