NL1009956C2 - Werkwijze voor het aanbrengen van een bekleding op een substraat. - Google Patents

Werkwijze voor het aanbrengen van een bekleding op een substraat. Download PDF

Info

Publication number
NL1009956C2
NL1009956C2 NL1009956A NL1009956A NL1009956C2 NL 1009956 C2 NL1009956 C2 NL 1009956C2 NL 1009956 A NL1009956 A NL 1009956A NL 1009956 A NL1009956 A NL 1009956A NL 1009956 C2 NL1009956 C2 NL 1009956C2
Authority
NL
Netherlands
Prior art keywords
coating
substrate
permeability
reactive
applying
Prior art date
Application number
NL1009956A
Other languages
English (en)
Dutch (nl)
Inventor
Marius Pieter De Goeje
Peter Hillebrand De Haan
Gerardus Titus Van Heck
Original Assignee
Tno
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tno filed Critical Tno
Priority to NL1009956A priority Critical patent/NL1009956C2/nl
Priority to EP99941871A priority patent/EP1115901A1/en
Priority to AU55346/99A priority patent/AU760293B2/en
Priority to JP2000567760A priority patent/JP2002523235A/ja
Priority to CA002341696A priority patent/CA2341696A1/en
Priority to PCT/NL1999/000533 priority patent/WO2000012778A1/en
Priority to US09/763,764 priority patent/US6649224B1/en
Application granted granted Critical
Publication of NL1009956C2 publication Critical patent/NL1009956C2/nl
Priority to NO20010965A priority patent/NO20010965L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
NL1009956A 1998-08-27 1998-08-27 Werkwijze voor het aanbrengen van een bekleding op een substraat. NL1009956C2 (nl)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL1009956A NL1009956C2 (nl) 1998-08-27 1998-08-27 Werkwijze voor het aanbrengen van een bekleding op een substraat.
EP99941871A EP1115901A1 (en) 1998-08-27 1999-08-27 Method for applying a coating to a substrate
AU55346/99A AU760293B2 (en) 1998-08-27 1999-08-27 Method for applying a coating to a substrate
JP2000567760A JP2002523235A (ja) 1998-08-27 1999-08-27 基板へのコーティングの塗布方法
CA002341696A CA2341696A1 (en) 1998-08-27 1999-08-27 Method for applying a coating to a substrate
PCT/NL1999/000533 WO2000012778A1 (en) 1998-08-27 1999-08-27 Method for applying a coating to a substrate
US09/763,764 US6649224B1 (en) 1998-08-27 1999-08-27 Method for applying a coating to a substrate
NO20010965A NO20010965L (no) 1998-08-27 2001-02-26 Fremgangsmåte for påföring av et belegg på et substrat

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1009956 1998-08-27
NL1009956A NL1009956C2 (nl) 1998-08-27 1998-08-27 Werkwijze voor het aanbrengen van een bekleding op een substraat.

Publications (1)

Publication Number Publication Date
NL1009956C2 true NL1009956C2 (nl) 2000-02-29

Family

ID=19767717

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1009956A NL1009956C2 (nl) 1998-08-27 1998-08-27 Werkwijze voor het aanbrengen van een bekleding op een substraat.

Country Status (8)

Country Link
US (1) US6649224B1 (no)
EP (1) EP1115901A1 (no)
JP (1) JP2002523235A (no)
AU (1) AU760293B2 (no)
CA (1) CA2341696A1 (no)
NL (1) NL1009956C2 (no)
NO (1) NO20010965L (no)
WO (1) WO2000012778A1 (no)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070049499A1 (en) * 2005-08-24 2007-03-01 Basf Corporation. Pesticide composition
JP4809022B2 (ja) * 2005-09-05 2011-11-02 Ｈｏｙａ株式会社 コンタクトレンズ材料の製造方法およびソフトコンタクトレンズの製造方法
US9339770B2 (en) 2013-11-19 2016-05-17 Applied Membrane Technologies, Inc. Organosiloxane films for gas separations
KR20210094694A (ko) 2020-01-21 2021-07-30 삼성전자주식회사 기판 처리 장치, 물질막 증착 장치, 및 상압 화학 기상 증착 장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0577447A1 (fr) * 1992-06-17 1994-01-05 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procédé pour former un dépôt contenant du silicium à la surface d'un substrat métallique, procédé de traitement anti-corrosion
US5527629A (en) * 1990-12-17 1996-06-18 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process of depositing a layer of silicon oxide bonded to a substrate of polymeric material using high pressure and electrical discharge

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5254688A (en) * 1975-10-30 1977-05-04 Sumitomo Chem Co Ltd Method of producing semipermeable memebrane
DE19515069A1 (de) * 1995-04-27 1996-10-31 Suratech Gmbh Verfahren zur Herstellung anorganischer Schichten auf Festkörperoberflächen mit Hilfe einer Coronaentladung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5527629A (en) * 1990-12-17 1996-06-18 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process of depositing a layer of silicon oxide bonded to a substrate of polymeric material using high pressure and electrical discharge
EP0577447A1 (fr) * 1992-06-17 1994-01-05 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Procédé pour former un dépôt contenant du silicium à la surface d'un substrat métallique, procédé de traitement anti-corrosion

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
THYEN R ET AL: "Plasma-enhanced chemical-vapour-deposition of thin films by corona discharge at atmospheric pressure", FIFTH INTERNATIONAL CONFERENCE ON PLASMA SURFACE ENGINEERING, GARMISCH-PARTENKIRCHEN, GERMANY, 9-13 SEPT. 1996, vol. 97, no. 1-3, ISSN 0257-8972, Surface and Coatings Technology, Dec. 1997, Elsevier, Switzerland, pages 426 - 434, XP002101532 *

Also Published As

Publication number Publication date
CA2341696A1 (en) 2000-03-09
NO20010965D0 (no) 2001-02-26
AU5534699A (en) 2000-03-21
EP1115901A1 (en) 2001-07-18
US6649224B1 (en) 2003-11-18
WO2000012778A1 (en) 2000-03-09
JP2002523235A (ja) 2002-07-30
NO20010965L (no) 2001-04-25
AU760293B2 (en) 2003-05-08

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PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20060301