NO20010965L - Fremgangsmåte for påföring av et belegg på et substrat - Google Patents
Fremgangsmåte for påföring av et belegg på et substratInfo
- Publication number
- NO20010965L NO20010965L NO20010965A NO20010965A NO20010965L NO 20010965 L NO20010965 L NO 20010965L NO 20010965 A NO20010965 A NO 20010965A NO 20010965 A NO20010965 A NO 20010965A NO 20010965 L NO20010965 L NO 20010965L
- Authority
- NO
- Norway
- Prior art keywords
- coating
- applying
- substrate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1009956A NL1009956C2 (nl) | 1998-08-27 | 1998-08-27 | Werkwijze voor het aanbrengen van een bekleding op een substraat. |
PCT/NL1999/000533 WO2000012778A1 (en) | 1998-08-27 | 1999-08-27 | Method for applying a coating to a substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
NO20010965D0 NO20010965D0 (no) | 2001-02-26 |
NO20010965L true NO20010965L (no) | 2001-04-25 |
Family
ID=19767717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20010965A NO20010965L (no) | 1998-08-27 | 2001-02-26 | Fremgangsmåte for påföring av et belegg på et substrat |
Country Status (8)
Country | Link |
---|---|
US (1) | US6649224B1 (no) |
EP (1) | EP1115901A1 (no) |
JP (1) | JP2002523235A (no) |
AU (1) | AU760293B2 (no) |
CA (1) | CA2341696A1 (no) |
NL (1) | NL1009956C2 (no) |
NO (1) | NO20010965L (no) |
WO (1) | WO2000012778A1 (no) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070049499A1 (en) * | 2005-08-24 | 2007-03-01 | Basf Corporation. | Pesticide composition |
JP4809022B2 (ja) * | 2005-09-05 | 2011-11-02 | Hoya株式会社 | コンタクトレンズ材料の製造方法およびソフトコンタクトレンズの製造方法 |
US9339770B2 (en) | 2013-11-19 | 2016-05-17 | Applied Membrane Technologies, Inc. | Organosiloxane films for gas separations |
KR20210094694A (ko) | 2020-01-21 | 2021-07-30 | 삼성전자주식회사 | 기판 처리 장치, 물질막 증착 장치, 및 상압 화학 기상 증착 장치 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5254688A (en) * | 1975-10-30 | 1977-05-04 | Sumitomo Chem Co Ltd | Method of producing semipermeable memebrane |
US5527629A (en) * | 1990-12-17 | 1996-06-18 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process of depositing a layer of silicon oxide bonded to a substrate of polymeric material using high pressure and electrical discharge |
FR2692598B1 (fr) * | 1992-06-17 | 1995-02-10 | Air Liquide | Procédé de dépôt d'un film contenant du silicium à la surface d'un substrat métallique et procédé de traitement anti-corrosion. |
DE19515069A1 (de) * | 1995-04-27 | 1996-10-31 | Suratech Gmbh | Verfahren zur Herstellung anorganischer Schichten auf Festkörperoberflächen mit Hilfe einer Coronaentladung |
-
1998
- 1998-08-27 NL NL1009956A patent/NL1009956C2/nl not_active IP Right Cessation
-
1999
- 1999-08-27 US US09/763,764 patent/US6649224B1/en not_active Expired - Fee Related
- 1999-08-27 CA CA002341696A patent/CA2341696A1/en not_active Abandoned
- 1999-08-27 EP EP99941871A patent/EP1115901A1/en not_active Withdrawn
- 1999-08-27 AU AU55346/99A patent/AU760293B2/en not_active Ceased
- 1999-08-27 JP JP2000567760A patent/JP2002523235A/ja active Pending
- 1999-08-27 WO PCT/NL1999/000533 patent/WO2000012778A1/en not_active Application Discontinuation
-
2001
- 2001-02-26 NO NO20010965A patent/NO20010965L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
NL1009956C2 (nl) | 2000-02-29 |
WO2000012778A1 (en) | 2000-03-09 |
EP1115901A1 (en) | 2001-07-18 |
JP2002523235A (ja) | 2002-07-30 |
AU760293B2 (en) | 2003-05-08 |
CA2341696A1 (en) | 2000-03-09 |
NO20010965D0 (no) | 2001-02-26 |
US6649224B1 (en) | 2003-11-18 |
AU5534699A (en) | 2000-03-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |