MY8600663A - Positive-type photoresist compositions - Google Patents

Positive-type photoresist compositions

Info

Publication number
MY8600663A
MY8600663A MY663/86A MY8600663A MY8600663A MY 8600663 A MY8600663 A MY 8600663A MY 663/86 A MY663/86 A MY 663/86A MY 8600663 A MY8600663 A MY 8600663A MY 8600663 A MY8600663 A MY 8600663A
Authority
MY
Malaysia
Prior art keywords
positive
type photoresist
photoresist compositions
compositions
type
Prior art date
Application number
MY663/86A
Other languages
English (en)
Inventor
Makato Hanabata
Akihiro Furuta
Seimei Yasui
Kunikiko Tanaka
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of MY8600663A publication Critical patent/MY8600663A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
MY663/86A 1982-05-25 1986-12-30 Positive-type photoresist compositions MY8600663A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57089482A JPS58205147A (ja) 1982-05-25 1982-05-25 ポジ型フオトレジスト組成物

Publications (1)

Publication Number Publication Date
MY8600663A true MY8600663A (en) 1986-12-31

Family

ID=13971950

Family Applications (1)

Application Number Title Priority Date Filing Date
MY663/86A MY8600663A (en) 1982-05-25 1986-12-30 Positive-type photoresist compositions

Country Status (10)

Country Link
US (1) US4696886A (ja)
EP (1) EP0095388B1 (ja)
JP (1) JPS58205147A (ja)
KR (1) KR910004846B1 (ja)
CA (1) CA1250776A (ja)
DE (1) DE3374610D1 (ja)
GB (1) GB2124400B (ja)
HK (1) HK8787A (ja)
MX (1) MX162307A (ja)
MY (1) MY8600663A (ja)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60162249A (ja) * 1984-02-01 1985-08-24 Japan Synthetic Rubber Co Ltd ポジ型レジスト組成物
DE3406927A1 (de) * 1984-02-25 1985-08-29 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch auf basis von saeurespaltbaren verbindungen
JPS60189739A (ja) * 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
JPS62191850A (ja) * 1986-02-17 1987-08-22 Nec Corp ポジレジスト材料
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
JP2697039B2 (ja) * 1988-12-06 1998-01-14 住友化学工業株式会社 ポジ型レジスト組成物の製造方法
JPH02291559A (ja) * 1989-05-01 1990-12-03 Toyo Gosei Kogyo Kk 遠紫外光用ホトレジスト組成物
JP2849623B2 (ja) * 1989-08-15 1999-01-20 コニカ株式会社 画像形成方法
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
US5130225A (en) * 1990-05-24 1992-07-14 Sumitomo Chemical Co. Ltd. Positive resist composition comprising a cyclic dimer of isopropenyl phenol, also known as a 1,1,3 trimethyl-3-hydroxyphenyl indane
JP2847321B2 (ja) * 1990-08-14 1999-01-20 日本石油株式会社 ポジ型フォトレジスト組成物
KR950004908B1 (ko) * 1992-09-09 1995-05-15 삼성전자주식회사 포토 레지스트 조성물 및 이를 이용한 패턴형성방법
JP3203995B2 (ja) * 1993-12-24 2001-09-04 ジェイエスアール株式会社 感放射線性樹脂組成物
US5561194A (en) * 1995-03-29 1996-10-01 International Business Machines Corporation Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene
WO1997034197A1 (en) * 1996-03-11 1997-09-18 Hoechst Celanese Corporation Resin compositions for photoresist applications
JP3633179B2 (ja) * 1997-01-27 2005-03-30 Ｊｓｒ株式会社 ポジ型フォトレジスト組成物
US6630285B2 (en) * 1998-10-15 2003-10-07 Mitsui Chemicals, Inc. Positive sensitive resin composition and a process for forming a resist pattern therewith
TWI417656B (zh) * 2010-04-08 2013-12-01 Founder Fine Chemical Industry Co Ltd 輻射敏感組成物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3551154A (en) * 1966-12-28 1970-12-29 Ferrania Spa Light sensitive article comprising a quinone diazide and polymeric binder
GB1375461A (ja) * 1972-05-05 1974-11-27
JPS5024641B2 (ja) * 1972-10-17 1975-08-18
JPS5236043B2 (ja) * 1974-02-21 1977-09-13
US4139384A (en) * 1974-02-21 1979-02-13 Fuji Photo Film Co., Ltd. Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
JPS51120712A (en) * 1975-04-15 1976-10-22 Toshiba Corp Positive type photo-resistant compound
JPS51120713A (en) * 1975-04-15 1976-10-22 Toshiba Corp Positive type photo-resistant compound
US4244181A (en) * 1977-12-22 1981-01-13 The Garrett Corporation Variable geometry gas turbine engine fuel and guide vane control
JPS5730829A (en) * 1980-08-01 1982-02-19 Hitachi Ltd Micropattern formation method
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol

Also Published As

Publication number Publication date
KR910004846B1 (ko) 1991-07-13
US4696886A (en) 1987-09-29
CA1250776A (en) 1989-03-07
EP0095388B1 (en) 1987-11-19
GB2124400A (en) 1984-02-15
GB2124400B (en) 1985-11-06
HK8787A (en) 1987-01-28
EP0095388A3 (en) 1984-05-30
KR840004589A (ko) 1984-10-22
EP0095388A2 (en) 1983-11-30
DE3374610D1 (en) 1987-12-23
JPS58205147A (ja) 1983-11-30
GB8314459D0 (en) 1983-06-29
MX162307A (es) 1991-04-23
JPH0340379B2 (ja) 1991-06-18

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