MY196433A - Abrasive dispersion - Google Patents

Abrasive dispersion

Info

Publication number
MY196433A
MY196433A MYUI2019001639A MYUI2019001639A MY196433A MY 196433 A MY196433 A MY 196433A MY UI2019001639 A MYUI2019001639 A MY UI2019001639A MY UI2019001639 A MYUI2019001639 A MY UI2019001639A MY 196433 A MY196433 A MY 196433A
Authority
MY
Malaysia
Prior art keywords
abrasive
dispersion
abrasive dispersion
filtration
micro
Prior art date
Application number
MYUI2019001639A
Other languages
English (en)
Inventor
Kamiya Tomohide
OYAMA Takaharu
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY196433A publication Critical patent/MY196433A/en

Links

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
MYUI2019001639A 2018-03-29 2019-03-25 Abrasive dispersion MY196433A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018063612A JP7066480B2 (ja) 2018-03-29 2018-03-29 砥粒分散液、研磨用組成物キットおよび磁気ディスク基板の研磨方法

Publications (1)

Publication Number Publication Date
MY196433A true MY196433A (en) 2023-04-11

Family

ID=68169469

Family Applications (1)

Application Number Title Priority Date Filing Date
MYUI2019001639A MY196433A (en) 2018-03-29 2019-03-25 Abrasive dispersion

Country Status (2)

Country Link
JP (1) JP7066480B2 (ja)
MY (1) MY196433A (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021080441A (ja) * 2019-11-20 2021-05-27 株式会社フジミインコーポレーテッド 研磨組成物、研磨方法および基板の製造方法
TWI823321B (zh) * 2021-04-02 2023-11-21 南韓商Ｓｋｃ索密思有限公司 半導體製程用拋光組合物以及使用拋光組合物的半導體裝置的製造方法
KR20240125006A (ko) * 2021-12-23 2024-08-19 후소카가쿠코교 가부시키가이샤 콜로이달 실리카 및 그 제조 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002338951A (ja) 2001-05-18 2002-11-27 Nippon Chem Ind Co Ltd 研磨剤用水熱処理コロイダルシリカ
JP4643085B2 (ja) 2001-09-19 2011-03-02 日本化学工業株式会社 研磨剤用高純度コロイダルシリカの製造方法
JP4781693B2 (ja) 2004-06-14 2011-09-28 花王株式会社 磁気ディスク基板のナノスクラッチの低減方法
CN103748037B (zh) 2011-09-16 2016-09-28 日产化学工业株式会社 被纯化了的活性硅酸液和硅溶胶的制造方法
WO2015060410A1 (ja) 2013-10-24 2015-04-30 花王株式会社 研磨液組成物の製造方法
JP6688129B2 (ja) 2016-03-30 2020-04-28 株式会社フジミインコーポレーテッド 研磨用組成物、磁気ディスク基板の製造方法および磁気ディスク基板の研磨方法

Also Published As

Publication number Publication date
JP2019172853A (ja) 2019-10-10
JP7066480B2 (ja) 2022-05-13

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