MY196433A - Abrasive dispersion - Google Patents
Abrasive dispersionInfo
- Publication number
- MY196433A MY196433A MYUI2019001639A MYUI2019001639A MY196433A MY 196433 A MY196433 A MY 196433A MY UI2019001639 A MYUI2019001639 A MY UI2019001639A MY UI2019001639 A MYUI2019001639 A MY UI2019001639A MY 196433 A MY196433 A MY 196433A
- Authority
- MY
- Malaysia
- Prior art keywords
- abrasive
- dispersion
- abrasive dispersion
- filtration
- micro
- Prior art date
Links
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Provided is an abrasive dispersion that allows the number of micro-scratches present on a polished surface to be effectively reduced. The abrasive dispersion provided herein contains both an abrasive and a dispersion medium. The abrasive contains colloidal silica derived from an alkali silicate-containing solution. An average primary particle diameter of the abrasive measured in accordance with the BET method is 1 nm to 50 nm. The pH of the abrasive dispersion lies within the range of 10 to 12. The abrasive dispersion exhibits a difference (Y-X) in filtration flow-through amount, calculated on the basis of filtration tests, of 25 g or less.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018063612A JP7066480B2 (en) | 2018-03-29 | 2018-03-29 | Abrasive grain dispersion liquid, polishing composition kit, and polishing method for magnetic disk substrates |
Publications (1)
Publication Number | Publication Date |
---|---|
MY196433A true MY196433A (en) | 2023-04-11 |
Family
ID=68169469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYUI2019001639A MY196433A (en) | 2018-03-29 | 2019-03-25 | Abrasive dispersion |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7066480B2 (en) |
MY (1) | MY196433A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021080441A (en) * | 2019-11-20 | 2021-05-27 | 株式会社フジミインコーポレーテッド | Polishing composition, polishing method, and method for manufacturing substrate |
JP7296504B2 (en) * | 2021-04-02 | 2023-06-22 | エスケー エンパルス カンパニー リミテッド | Polishing composition for semiconductor process and method for manufacturing semiconductor device using polishing composition |
JP7129576B1 (en) * | 2021-12-23 | 2022-09-01 | 扶桑化学工業株式会社 | Colloidal silica and method for producing the same |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002338951A (en) | 2001-05-18 | 2002-11-27 | Nippon Chem Ind Co Ltd | Hydrothermally treated colloidal silica for polishing agent |
JP4643085B2 (en) | 2001-09-19 | 2011-03-02 | 日本化学工業株式会社 | Method for producing high-purity colloidal silica for abrasives |
JP4781693B2 (en) | 2004-06-14 | 2011-09-28 | 花王株式会社 | Method for reducing nano scratch on magnetic disk substrate |
TWI576146B (en) | 2011-09-16 | 2017-04-01 | 日產化學工業股份有限公司 | Purified active silicic acid solution and production method of silica sol |
GB2535070A (en) | 2013-10-24 | 2016-08-10 | Kao Corp | Method for producing polishing liquid composition |
JP6688129B2 (en) | 2016-03-30 | 2020-04-28 | 株式会社フジミインコーポレーテッド | Polishing composition, method for producing magnetic disk substrate, and method for polishing magnetic disk substrate |
-
2018
- 2018-03-29 JP JP2018063612A patent/JP7066480B2/en active Active
-
2019
- 2019-03-25 MY MYUI2019001639A patent/MY196433A/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP2019172853A (en) | 2019-10-10 |
JP7066480B2 (en) | 2022-05-13 |
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