MY186390A - Method for polishing glass substrate, polishing liquid, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, and method for manufacturing magnetic disk - Google Patents

Method for polishing glass substrate, polishing liquid, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, and method for manufacturing magnetic disk

Info

Publication number
MY186390A
MY186390A MYPI2017704080A MYPI2017704080A MY186390A MY 186390 A MY186390 A MY 186390A MY PI2017704080 A MYPI2017704080 A MY PI2017704080A MY PI2017704080 A MYPI2017704080 A MY PI2017704080A MY 186390 A MY186390 A MY 186390A
Authority
MY
Malaysia
Prior art keywords
glass substrate
polishing
manufacturing
disk
manufacturing magnetic
Prior art date
Application number
MYPI2017704080A
Inventor
Nakagawa Hiroki
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of MY186390A publication Critical patent/MY186390A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73921—Glass or ceramic substrates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Surface Treatment Of Glass (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

The present invention provides a method for polishing a glass substrate by which the polishing speed in polishing processing for polishing a surface of a glass substrate using cerium oxide as polishing abrasive particles can be increased. The method for polishing a glass substrate according to the present invention is a method in which a polishing liquid containing cerium oxide as polishing abrasive particles is supplied to a surface of the glass substrate that is to be polished, and the surface of the glass substrate is subjected to the polishing processing. Here, an alkaline polishing liquid that contains the above-described cerium oxide as polishing abrasive particles and further contains an inorganic reducing agent is used as the above-described polishing liquid. (Figure 3)
MYPI2017704080A 2015-05-20 2016-05-20 Method for polishing glass substrate, polishing liquid, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, and method for manufacturing magnetic disk MY186390A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015102786 2015-05-20
PCT/JP2016/065103 WO2016186214A1 (en) 2015-05-20 2016-05-20 Method for polishing glass substrate, polishing liquid, method for manufacturing glass substrate, method for manufacturing glass substrate for magnetic disc, and method for manufacturing magnetic disc

Publications (1)

Publication Number Publication Date
MY186390A true MY186390A (en) 2021-07-22

Family

ID=57320350

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2017704080A MY186390A (en) 2015-05-20 2016-05-20 Method for polishing glass substrate, polishing liquid, method for manufacturing glass substrate, method for manufacturing magnetic-disk glass substrate, and method for manufacturing magnetic disk

Country Status (5)

Country Link
JP (1) JP6429354B2 (en)
CN (1) CN107615380B (en)
MY (1) MY186390A (en)
SG (1) SG11201708814QA (en)
WO (1) WO2016186214A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102431416B1 (en) 2017-11-15 2022-08-12 생-고뱅 세라믹스 앤드 플라스틱스, 인코포레이티드 Compositions for performing material removal operations and methods for forming same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09137155A (en) * 1995-11-16 1997-05-27 Tokyo Ohka Kogyo Co Ltd Polishing composition and polishing method
JP4713064B2 (en) * 2002-06-05 2011-06-29 Ｈｏｙａ株式会社 Manufacturing method of glass substrate for information recording medium and glass substrate for information recording medium manufactured by the manufacturing method
US6641630B1 (en) * 2002-06-06 2003-11-04 Cabot Microelectronics Corp. CMP compositions containing iodine and an iodine vapor-trapping agent
JP2006100570A (en) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd Polishing composition and polishing method using the same
CN101081485A (en) * 2006-05-31 2007-12-05 住友电气工业株式会社 Surface treatment method, nitride crystal substrate, semiconductor device, and method of manufacturing and semiconductor device
CN101417861A (en) * 2007-10-26 2009-04-29 旭硝子株式会社 Glass for information recording media substrate, glass substrate for magnetic disk and magnetic disk
JP5459466B2 (en) * 2008-06-05 2014-04-02 Ｊｓｒ株式会社 Chemical mechanical polishing aqueous dispersion for use in circuit board production, circuit board production method, circuit board, and multilayer circuit board
WO2013118648A1 (en) * 2012-02-06 2013-08-15 旭硝子株式会社 Method for producing glass product and method for producing magnetic disk
JP2016055352A (en) * 2013-02-05 2016-04-21 コニカミノルタ株式会社 Abrasive slurry
JP2015008212A (en) * 2013-06-25 2015-01-15 日立化成株式会社 Polishing liquid and substrate polishing method using the same
JP2015066656A (en) * 2013-09-30 2015-04-13 Hoya株式会社 Regeneration method for used polishing agent and manufacturing method for glass substrate

Also Published As

Publication number Publication date
JP6429354B2 (en) 2018-11-28
WO2016186214A1 (en) 2016-11-24
JPWO2016186214A1 (en) 2018-04-12
CN107615380B (en) 2020-09-11
CN107615380A (en) 2018-01-19
SG11201708814QA (en) 2017-12-28

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