MY182430A - Method and device for producing a photovoltaic element with stabilized efficiency - Google Patents

Method and device for producing a photovoltaic element with stabilized efficiency

Info

Publication number
MY182430A
MY182430A MYPI2015704636A MYPI2015704636A MY182430A MY 182430 A MY182430 A MY 182430A MY PI2015704636 A MYPI2015704636 A MY PI2015704636A MY PI2015704636 A MYPI2015704636 A MY PI2015704636A MY 182430 A MY182430 A MY 182430A
Authority
MY
Malaysia
Prior art keywords
silicon substrate
zone
photovoltaic element
hydrogen
purposively
Prior art date
Application number
MYPI2015704636A
Other languages
English (en)
Inventor
Axel Herguth
Svenja Wilking
Original Assignee
Univ Konstanz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=49274634&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=MY182430(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Univ Konstanz filed Critical Univ Konstanz
Publication of MY182430A publication Critical patent/MY182430A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/128—Annealing
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/06—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated
    • F27B9/062—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated
    • F27B9/066—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity heated without contact between combustion gases and charge; electrically heated electrically heated heated by lamps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
    • F27B9/30—Details, accessories or equipment specially adapted for furnaces of these types
    • F27B9/40—Arrangements of controlling or monitoring devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00—Individual photovoltaic cells, e.g. solar cells
    • H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/121—The active layers comprising only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/129—Passivating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0434—Apparatus for thermal treatment mainly by convection
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0602—Temperature monitoring
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/33—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations into and out of processing chamber
    • H10P72/3314—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Photovoltaic Devices (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Sustainable Development (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
MYPI2015704636A 2013-06-26 2013-09-26 Method and device for producing a photovoltaic element with stabilized efficiency MY182430A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013010575 2013-06-26
PCT/EP2013/070104 WO2014206504A1 (de) 2013-06-26 2013-09-26 Verfahren und vorrichtung zum herstellen eines photovoltaikelements mit stabilisiertem wirkungsgrad

Publications (1)

Publication Number Publication Date
MY182430A true MY182430A (en) 2021-01-25

Family

ID=49274634

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015704636A MY182430A (en) 2013-06-26 2013-09-26 Method and device for producing a photovoltaic element with stabilized efficiency

Country Status (10)

Country Link
US (2) US10892376B2 (https=)
EP (1) EP3014663B1 (https=)
JP (1) JP6266768B2 (https=)
KR (1) KR101807381B1 (https=)
CN (1) CN105340085B (https=)
DE (2) DE202013012849U1 (https=)
ES (1) ES2830766T3 (https=)
MY (1) MY182430A (https=)
SG (1) SG11201510423YA (https=)
WO (1) WO2014206504A1 (https=)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013113123B4 (de) 2013-11-27 2021-11-18 Hanwha Q Cells Gmbh Solarzellenherstellungsverfahren
DE102013113108B4 (de) 2013-11-27 2024-08-29 Hanwha Q Cells Gmbh Solarzellenherstellungsverfahren
US20160005915A1 (en) * 2014-07-03 2016-01-07 Sino-American Silicon Products Inc. Method and apparatus for inhibiting light-induced degradation of photovoltaic device
EP3214658A4 (en) * 2014-10-27 2017-10-25 Panasonic Intellectual Property Management Co., Ltd. Method for manufacturing solar cell module and apparatus for manufacturing solar cell module
CN107408497B (zh) * 2015-03-13 2021-05-18 新南创新私人有限公司 加速掺杂硅中缺陷形成、稳定电池性能、制造电池的方法和电池
US10443941B2 (en) * 2015-05-20 2019-10-15 Illinois Tool Works Inc. Light annealing in a cooling chamber of a firing furnace
DE102015114240B4 (de) * 2015-08-27 2026-02-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zur Bearbeitung eines Halbleitersubstrats mittels Laserstrahlung
DE102015114298A1 (de) * 2015-08-27 2017-03-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Stabilisieren einer photovoltaischen Silizium-Solarzelle
DE102015219087A1 (de) * 2015-10-02 2017-04-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Stabilisierung der Konversionseffizienz von Siliziumsolarzellen
KR20180099844A (ko) * 2016-02-22 2018-09-05 어플라이드 머티어리얼스 이탈리아 에스.알.엘. 태양 전지 기판의 프로세싱을 위한 장치, 태양 전지 기판의 프로세싱을 위한 시스템 및 태양 전지 기판의 프로세싱을 위한 방법
FR3051074B1 (fr) * 2016-05-03 2018-05-18 Commissariat A L'energie Atomique Et Aux Energies Alternatives Procede de fabrication d'une cellule photovoltaique a heterojonction
AU2017276802A1 (en) * 2016-06-06 2018-11-29 Newsouth Innovations Pty Limited A method for processing silicon material
TW201806174A (zh) 2016-07-12 2018-02-16 阿波朗索拉爾公司 用於製造光伏打裝置之方法
JP6655791B2 (ja) * 2016-08-25 2020-02-26 パナソニックＩｐマネジメント株式会社 太陽電池セル及びその製造方法
TWI585988B (zh) * 2016-10-21 2017-06-01 茂迪股份有限公司 太陽能電池
AU2017363826A1 (en) * 2016-11-22 2019-05-16 Newsouth Innovations Pty Limited Advanced hydrogen passivation that mitigates hydrogen-induced recombination (HIR) and surface passivation deterioration in PV devices
KR101912772B1 (ko) * 2016-12-26 2019-01-14 주식회사 한화 광기전력 소자 제조 장치 및 제조 방법
US20220262973A1 (en) * 2018-07-30 2022-08-18 mPower Technology, Inc. In-situ rapid annealing and operation of solar cells for extreme environment applications
DE102019102227A1 (de) 2019-01-29 2019-11-14 Universität Konstanz Vorrichtung zum Messen einer Strahlungsintensität insbesondere in einem Durchlaufofen
CN112768372A (zh) * 2019-11-05 2021-05-07 伊利诺斯工具制品有限公司 烧结设备
DE102020002335B4 (de) 2020-04-17 2022-02-24 Ce Cell Engineering Gmbh Verfahren zur Verbesserung des ohmschen Kontaktverhaltens zwischen einem Kontaktgitter und einer Emitterschicht einer Silizumsolarzelle
CN112599609B (zh) * 2020-12-15 2022-07-08 山东力诺阳光电力科技有限公司 一种高效晶体硅太阳能电池及其制备方法
GB202216076D0 (en) * 2022-10-31 2022-12-14 Extraterrestrial Power Pty Ltd Solar cell

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2949607A (en) * 1958-09-05 1960-08-16 Carl W Lamb Multiple-band gamma matched antenna
DE3536299A1 (de) 1985-10-11 1987-04-16 Nukem Gmbh Solarzelle aus silizium
JP4405161B2 (ja) * 2003-02-04 2010-01-27 シャープ株式会社 多結晶シリコン基板の処理方法、その方法により処理された多結晶シリコン基板および太陽電池
JP2006073715A (ja) * 2004-09-01 2006-03-16 Sharp Corp 太陽電池
DE102006012920B3 (de) 2006-03-21 2008-01-24 Universität Konstanz Verfahren zum Herstellen eines Photovoltaikelements mit stabilisiertem Wirkungsgrad
CN101478882B (zh) 2006-06-26 2013-07-10 Tp太阳能公司 具有高强度加热区段的快速热烧结红外线传送带式热处理炉
US7805064B2 (en) * 2006-06-26 2010-09-28 TP Solar, Inc. (Corporation of CA, USA) Rapid thermal firing IR conveyor furnace having high intensity heating section
US7993700B2 (en) * 2007-03-01 2011-08-09 Applied Materials, Inc. Silicon nitride passivation for a solar cell
JP5127273B2 (ja) * 2007-03-27 2013-01-23 京セラ株式会社 太陽電池素子の製造方法
WO2009052141A1 (en) 2007-10-18 2009-04-23 E. I. Du Pont De Nemours And Company Conductive compositions and processes for use in the manufacture of semiconductor devices
FR2929755B1 (fr) 2008-04-03 2011-04-22 Commissariat Energie Atomique Procede de traitement d'un substrat semi-conducteur par activation thermique d'elements legers
JP5058184B2 (ja) 2009-01-23 2012-10-24 三菱電機株式会社 光起電力装置の製造方法
US8828776B2 (en) * 2009-04-16 2014-09-09 Tp Solar, Inc. Diffusion furnaces employing ultra low mass transport systems and methods of wafer rapid diffusion processing
CN102356458B (zh) * 2009-04-16 2014-10-15 Tp太阳能公司 利用极低质量运送系统的扩散炉及晶圆快速扩散加工处理的方法
FR2949607B1 (fr) 2009-09-03 2011-10-21 Commissariat Energie Atomique Procede de traitement de cellules photovoltaiques contre la diminution du rendement lors de l'eclairement
US8772068B2 (en) * 2009-10-26 2014-07-08 Newsouth Innovations Pty Limited Metallization method for silicon solar cells
FR2966980B1 (fr) * 2010-11-02 2013-07-12 Commissariat Energie Atomique Procédé de fabrication de cellules solaires, atténuant les phénomènes de lid
US20120060758A1 (en) * 2011-03-24 2012-03-15 Primestar Solar, Inc. Dynamic system for variable heating or cooling of linearly conveyed substrates
JP6113152B2 (ja) * 2011-06-03 2017-04-12 エムイーエムシー・シンガポール・プライベイト・リミテッドＭｅｍｃ Ｓｉｎｇａｐｏｒｅ Ｐｔｅ． Ｌｔｄ． シリコンウェハにおいて少数キャリア寿命劣化を抑制する方法
FR2977079B1 (fr) * 2011-06-27 2013-07-26 Commissariat Energie Atomique Procede de traitement de cellules photovoltaiques a heterojonction pour ameliorer et stabiliser leur rendement
KR102102873B1 (ko) 2012-05-21 2020-04-22 뉴사우스 이노베이션즈 피티와이 리미티드 실리콘 태양 전지의 개선된 수소화 공정
US9780252B2 (en) * 2014-10-17 2017-10-03 Tp Solar, Inc. Method and apparatus for reduction of solar cell LID
US11538956B2 (en) * 2018-04-27 2022-12-27 Illinois Tool Works Inc. Methods and apparatus to control zone temperatures of a solar cell production system

Also Published As

Publication number Publication date
JP6266768B2 (ja) 2018-01-24
WO2014206504A1 (de) 2014-12-31
US10892376B2 (en) 2021-01-12
DE112013005591B4 (de) 2016-08-04
EP3014663A1 (de) 2016-05-04
CN105340085A (zh) 2016-02-17
DE112013005591C5 (de) 2018-10-04
DE112013005591A5 (de) 2015-10-22
KR101807381B1 (ko) 2018-01-10
DE202013012849U1 (de) 2020-07-03
KR20160023687A (ko) 2016-03-03
SG11201510423YA (en) 2016-01-28
CN105340085B (zh) 2018-07-06
EP3014663B1 (de) 2020-09-02
US20160141445A1 (en) 2016-05-19
US11784279B2 (en) 2023-10-10
ES2830766T3 (es) 2021-06-04
US20210057600A1 (en) 2021-02-25
JP2016525276A (ja) 2016-08-22

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