MY176743A - Polishing composition - Google Patents

Polishing composition

Info

Publication number
MY176743A
MY176743A MYPI2015703424A MYPI2015703424A MY176743A MY 176743 A MY176743 A MY 176743A MY PI2015703424 A MYPI2015703424 A MY PI2015703424A MY PI2015703424 A MYPI2015703424 A MY PI2015703424A MY 176743 A MY176743 A MY 176743A
Authority
MY
Malaysia
Prior art keywords
polishing composition
abrasives
polishing
silica abrasives
silica
Prior art date
Application number
MYPI2015703424A
Inventor
Matsunami Yasushi
OOTSU Taira
Makino Yusuke
Yokomichi Noritaka
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=55864089&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=MY176743(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Fujimi Inc filed Critical Fujimi Inc
Publication of MY176743A publication Critical patent/MY176743A/en

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

To provide a polishing composition capable of achieving an excellent polishing rate by using silica abrasives. The polishing composition disclosed here includes abrasives, an acid, and water. The abrasives include silica abrasives A. The silica abrasives A are those that have been subjected to at least one of calcination and cracking. The polishing composition containing such silica abrasives A can achieve a higher polishing rate in polishing of an object to be polished.
MYPI2015703424A 2014-09-30 2015-09-28 Polishing composition MY176743A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014201432A JP6480139B2 (en) 2014-09-30 2014-09-30 Polishing composition

Publications (1)

Publication Number Publication Date
MY176743A true MY176743A (en) 2020-08-20

Family

ID=55864089

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015703424A MY176743A (en) 2014-09-30 2015-09-28 Polishing composition

Country Status (2)

Country Link
JP (1) JP6480139B2 (en)
MY (1) MY176743A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210024781A1 (en) * 2018-03-28 2021-01-28 Fujimi Incorporated Gallium compound-based semiconductor substrate polishing composition

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3877827B2 (en) * 1997-02-12 2007-02-07 東亞合成株式会社 Method for producing ultra high purity spherical silica fine particles
JP4257687B2 (en) * 1999-01-11 2009-04-22 株式会社トクヤマ Abrasive and polishing method
JP2004127327A (en) * 1999-12-27 2004-04-22 Showa Denko Kk Composition for polishing magnetic disk substrate
JP3877924B2 (en) * 2000-01-24 2007-02-07 昭和電工株式会社 Magnetic disk substrate polishing composition
JP4620851B2 (en) * 2000-09-25 2011-01-26 宇部日東化成株式会社 Method for producing hemispherical silica fine particles and hemispherical silica fine particles
JP2005327782A (en) * 2004-05-12 2005-11-24 Ministry Of National Defense Chung Shan Inst Of Science & Technology Chemical mechanical polishing slurry for semiconductor copper metal layer
JP2007073548A (en) * 2005-09-02 2007-03-22 Fujimi Inc Polishing method
US8273142B2 (en) * 2010-09-02 2012-09-25 Cabot Microelectronics Corporation Silicon polishing compositions with high rate and low defectivity
JP2012116734A (en) * 2010-12-03 2012-06-21 Jgc Catalysts & Chemicals Ltd Crystalline silica sol and method for producing the same
JP2012155785A (en) * 2011-01-25 2012-08-16 Showa Denko Kk Method for manufacturing substrate for magnetic recording medium
JP6259182B2 (en) * 2012-12-12 2018-01-10 株式会社フジミインコーポレーテッド Polishing liquid for primary polishing of magnetic disk substrate with nickel phosphorus plating
JP2014117754A (en) * 2012-12-13 2014-06-30 Osaka Univ Polishing abrasive grain and polishing method
KR101995879B1 (en) * 2012-12-28 2019-07-03 호야 가부시키가이샤 Substrate for mask blank, substrate with multilayer reflective film, reflective type mask blank, reflective type mask, and manufacturing method of semiconductor device
JP6092623B2 (en) * 2012-12-28 2017-03-08 花王株式会社 Manufacturing method of magnetic disk substrate

Also Published As

Publication number Publication date
JP2016069553A (en) 2016-05-09
JP6480139B2 (en) 2019-03-06

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