MY170590A - Sputtering target for magnetic recording medium - Google Patents

Sputtering target for magnetic recording medium

Info

Publication number
MY170590A
MY170590A MYPI2015702785A MYPI2015702785A MY170590A MY 170590 A MY170590 A MY 170590A MY PI2015702785 A MYPI2015702785 A MY PI2015702785A MY PI2015702785 A MYPI2015702785 A MY PI2015702785A MY 170590 A MY170590 A MY 170590A
Authority
MY
Malaysia
Prior art keywords
sputtering target
recording medium
magnetic recording
amount
nonmagnetic material
Prior art date
Application number
MYPI2015702785A
Other languages
English (en)
Inventor
Atsushi Sato
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY170590A publication Critical patent/MY170590A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0466—Alloys based on noble metals
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
MYPI2015702785A 2013-05-20 2014-05-14 Sputtering target for magnetic recording medium MY170590A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013106170 2013-05-20

Publications (1)

Publication Number Publication Date
MY170590A true MY170590A (en) 2019-08-19

Family

ID=51933477

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015702785A MY170590A (en) 2013-05-20 2014-05-14 Sputtering target for magnetic recording medium

Country Status (5)

Country Link
JP (1) JP5826945B2 (ja)
MY (1) MY170590A (ja)
SG (1) SG11201506142YA (ja)
TW (1) TWI593808B (ja)
WO (1) WO2014188916A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6692724B2 (ja) * 2016-09-02 2020-05-13 Ｊｘ金属株式会社 非磁性材料分散型Ｆｅ−Ｐｔ系スパッタリングターゲット
CN109985623B (zh) * 2019-04-28 2022-02-08 中国烟草总公司郑州烟草研究院 一种用于乙酰丙酸加氢制γ-戊内酯的催化剂及其制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04366441A (ja) * 1991-06-13 1992-12-18 Mitsui Petrochem Ind Ltd 光磁気記録媒体の製造方法
JP2006161082A (ja) * 2004-12-03 2006-06-22 Ishifuku Metal Ind Co Ltd スパッタリングターゲットの製造方法
JP4810360B2 (ja) * 2006-08-31 2011-11-09 石福金属興業株式会社 磁性薄膜
JP2008252037A (ja) * 2007-03-30 2008-10-16 Toshiba Corp 磁気抵抗素子及び磁気メモリ
JP4903277B2 (ja) * 2010-01-26 2012-03-28 株式会社日立製作所 磁気抵抗効果素子、それを用いた磁気メモリセル及びランダムアクセスメモリ
US9683284B2 (en) * 2011-03-30 2017-06-20 Jx Nippon Mining & Metals Corporation Sputtering target for magnetic recording film
JP5912559B2 (ja) * 2011-03-30 2016-04-27 田中貴金属工業株式会社 ＦｅＰｔ−Ｃ系スパッタリングターゲットの製造方法
US20140083847A1 (en) * 2011-09-26 2014-03-27 Jx Nippon Mining & Metals Corporation Fe-Pt-C Based Sputtering Target

Also Published As

Publication number Publication date
JPWO2014188916A1 (ja) 2017-02-23
TW201510238A (zh) 2015-03-16
WO2014188916A1 (ja) 2014-11-27
JP5826945B2 (ja) 2015-12-02
SG11201506142YA (en) 2015-09-29
TWI593808B (zh) 2017-08-01

Similar Documents

Publication Publication Date Title
MY186238A (en) Ferromagnetic material sputtering target
PH12016500102A1 (en) Magnetic or magnetisable pigment particles and optical effect layers
MY160775A (en) Ferromagnetic material sputtering target
MY172839A (en) Fept-c-based sputtering target and method for manufacturing same
MY156386A (en) Fe-pt-based ferromagnetic material sputtering target
MY181295A (en) Target for magnetron sputtering
MY164370A (en) Fe-pt-based sputtering target with dispersed c grains
MY168523A (en) Fe-pt-based sputtering target having non-magnetic substance dispersed therein
JP2015180767A5 (ja)
MY161774A (en) Fe-pt-c based sputtering target
MY169260A (en) Fe-pt-based magnetic materials sintered compact
MY166492A (en) Sputtering target for forming magnetic recording film and process for producing same
MY161157A (en) Ferromagnetic material sputtering target
MY161232A (en) Fe-pt-based ferromagnetic sputtering target and method for producing same
MY181595A (en) Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
MY170253A (en) Sintered body, and sputtering target for magnetic recording film formation use which comprises said sintered body
SG11201900555XA (en) NON-MAGNETIC MATERIAL-DISPERSED Fe-Pt SPUTTERING TARGET
MY178171A (en) Sputtering target containing co or fe
MY192178A (en) Fept-c-based sputtering target
MY167946A (en) Co-Cr-Pt-BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
MY170314A (en) Sputtering target
MY170590A (en) Sputtering target for magnetic recording medium
MY178224A (en) Target for magnetron sputtering
EP3031953A3 (en) Sliding member
MY179241A (en) Sputtering target