MY170548A - Cr alloy and sputtering target material for magnetic recording, and perpendicular magnetic recording medium using the same - Google Patents

Cr alloy and sputtering target material for magnetic recording, and perpendicular magnetic recording medium using the same

Info

Publication number
MY170548A
MY170548A MYPI2015702571A MYPI2015702571A MY170548A MY 170548 A MY170548 A MY 170548A MY PI2015702571 A MYPI2015702571 A MY PI2015702571A MY PI2015702571 A MYPI2015702571 A MY PI2015702571A MY 170548 A MY170548 A MY 170548A
Authority
MY
Malaysia
Prior art keywords
magnetic recording
alloy
same
target material
sputtering target
Prior art date
Application number
MYPI2015702571A
Inventor
Matsubara Noriaki
Hayashi Ryoji
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY170548A publication Critical patent/MY170548A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • C22C27/025—Alloys based on vanadium, niobium, or tantalum alloys based on vanadium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/04—Alloys based on tungsten or molybdenum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7373—Non-magnetic single underlayer comprising chromium
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

There is provided a Cr alloy for magnetic recording, comprising in at.%: one or more elements selected from the group consisting of Al, Ti, Mo, W, V, and Ru in a total amount in which a value of a in Formula (1) is 0.2919 nm or more and 0.3037 nm or less: a=I(m0An) /pN (1) wherein a represents a lattice constant, N represents the Avogadro's number, p represents a calculated density (g/cm3), m represents the number of elements existing in a unit lattice, and A represents an atomic weight]; 0.1 to 3% in total of one or more elements selected from the group consisting of B, C, P, Si, and Sn; and the balance Cr and unavoidable impurities.
MYPI2015702571A 2013-02-25 2014-02-17 Cr alloy and sputtering target material for magnetic recording, and perpendicular magnetic recording medium using the same MY170548A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013034228A JP6180755B2 (en) 2013-02-25 2013-02-25 Cr alloy for magnetic recording, target material for sputtering, and perpendicular magnetic recording medium using them
PCT/JP2014/053652 WO2014129423A1 (en) 2013-02-25 2014-02-17 MAGNETIC RECORDING-USE Cr-ALLOY, SPUTTERING-USE TARGET MATERIAL, AND VERTICAL MAGNETIC RECORDING MEDIUM USING SAME

Publications (1)

Publication Number Publication Date
MY170548A true MY170548A (en) 2019-08-16

Family

ID=51391215

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015702571A MY170548A (en) 2013-02-25 2014-02-17 Cr alloy and sputtering target material for magnetic recording, and perpendicular magnetic recording medium using the same

Country Status (6)

Country Link
JP (1) JP6180755B2 (en)
CN (1) CN105027203B (en)
MY (1) MY170548A (en)
SG (2) SG11201505973XA (en)
TW (1) TWI615836B (en)
WO (1) WO2014129423A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6814758B2 (en) * 2018-02-19 2021-01-20 山陽特殊製鋼株式会社 Sputtering target
RU201611U1 (en) * 2019-12-06 2020-12-23 Федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В.И. Ульянова (Ленина) Sputtered magnetron unit for deposition of solid composite films

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100601938B1 (en) * 2004-01-09 2006-07-14 삼성전자주식회사 Co-based perpendicular magnetic recording media
JP2005235358A (en) * 2004-02-23 2005-09-02 Tdk Corp Magnetic recording medium
JP4510796B2 (en) * 2006-11-22 2010-07-28 株式会社アルバック Method for manufacturing magnetic storage medium
JP4782047B2 (en) * 2007-03-09 2011-09-28 昭和電工株式会社 Perpendicular magnetic recording medium and magnetic recording / reproducing apparatus
JP2009032356A (en) * 2007-07-30 2009-02-12 Showa Denko Kk Perpendicular magnetic recording medium, its manufacturing method, and magnetic recording and reproducing device
JP5412216B2 (en) * 2009-09-07 2014-02-12 昭和電工株式会社 Thermally assisted magnetic recording medium and magnetic storage device
JP5617112B2 (en) * 2010-01-14 2014-11-05 独立行政法人物質・材料研究機構 Perpendicular magnetic recording medium and manufacturing method thereof
JP5506604B2 (en) * 2010-08-30 2014-05-28 昭和電工株式会社 Thermally assisted magnetic recording medium and magnetic storage device
JP5730047B2 (en) * 2011-02-02 2015-06-03 昭和電工株式会社 Thermally assisted magnetic recording medium and magnetic storage device

Also Published As

Publication number Publication date
CN105027203A (en) 2015-11-04
SG11201505973XA (en) 2015-08-28
SG10201705531QA (en) 2017-08-30
JP6180755B2 (en) 2017-08-16
TW201503120A (en) 2015-01-16
JP2014164780A (en) 2014-09-08
TWI615836B (en) 2018-02-21
CN105027203B (en) 2018-04-06
WO2014129423A1 (en) 2014-08-28

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