MY155242A - Antireflective coating compositions - Google Patents

Antireflective coating compositions

Info

Publication number
MY155242A
MY155242A MYPI2011000055A MYPI20110055A MY155242A MY 155242 A MY155242 A MY 155242A MY PI2011000055 A MYPI2011000055 A MY PI2011000055A MY PI20110055 A MYPI20110055 A MY PI20110055A MY 155242 A MY155242 A MY 155242A
Authority
MY
Malaysia
Prior art keywords
coating compositions
antireflective coating
antireflective
disclosed
related polymers
Prior art date
Application number
MYPI2011000055A
Other languages
English (en)
Inventor
Yao Huirong
Xiang Zhong
Shan Jianhui
Mullen Salem
Wu Hengpeng
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of MY155242A publication Critical patent/MY155242A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D167/00—Coating compositions based on polyesters obtained by reactions forming a carboxylic ester link in the main chain; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3236—Heterocylic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
    • C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
MYPI2011000055A 2008-07-08 2009-04-29 Antireflective coating compositions MY155242A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/133,562 US8221965B2 (en) 2008-07-08 2008-07-08 Antireflective coating compositions

Publications (1)

Publication Number Publication Date
MY155242A true MY155242A (en) 2015-09-30

Family

ID=40886504

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2011000055A MY155242A (en) 2008-07-08 2009-04-29 Antireflective coating compositions

Country Status (8)

Country Link
US (1) US8221965B2 (US20100009293A1-20100114-C00010.png)
EP (1) EP2300518B1 (US20100009293A1-20100114-C00010.png)
JP (1) JP5568791B2 (US20100009293A1-20100114-C00010.png)
KR (1) KR101429326B1 (US20100009293A1-20100114-C00010.png)
CN (1) CN102056969B (US20100009293A1-20100114-C00010.png)
MY (1) MY155242A (US20100009293A1-20100114-C00010.png)
TW (1) TWI512063B (US20100009293A1-20100114-C00010.png)
WO (1) WO2010004377A1 (US20100009293A1-20100114-C00010.png)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8329387B2 (en) * 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
US8912295B2 (en) * 2009-02-10 2014-12-16 Nissan Chemical Industries, Ltd. Long chain alkylene group-containing epoxy compound
US9244352B2 (en) * 2009-05-20 2016-01-26 Rohm And Haas Electronic Materials, Llc Coating compositions for use with an overcoated photoresist
US8501383B2 (en) * 2009-05-20 2013-08-06 Rohm And Haas Electronic Materials Llc Coating compositions for use with an overcoated photoresist
US8551686B2 (en) * 2009-10-30 2013-10-08 Az Electronic Materials Usa Corp. Antireflective composition for photoresists
US8507192B2 (en) * 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
CN103068822A (zh) * 2010-08-05 2013-04-24 日产化学工业株式会社 具有含氮环的环氧化合物
EP2788398B1 (en) * 2011-12-15 2018-07-25 Sun Chemical Corporation Sulfide extended epoxy resins and barrier coatings applications thereof
US9170494B2 (en) * 2012-06-19 2015-10-27 Az Electronic Materials (Luxembourg) S.A.R.L. Antireflective compositions and methods of using same
KR101993472B1 (ko) 2012-09-12 2019-09-30 주식회사 동진쎄미켐 레지스트 패턴의 하부막 형성용 화합물, 조성물 및 이를 이용한 하부막의 형성방법
JP5923472B2 (ja) * 2013-09-18 2016-05-24 四国化成工業株式会社 メルカプトアルキルグリコールウリル類とその利用
JP6207424B2 (ja) * 2014-02-27 2017-10-04 四国化成工業株式会社 メルカプトアルキルグリコールウリル類とその利用
JP6492509B2 (ja) * 2014-07-28 2019-04-03 Jsr株式会社 液晶配向剤、液晶配向膜、液晶表示素子及び液晶表示素子の製造方法
US10203602B2 (en) 2016-09-30 2019-02-12 Rohm And Haas Electronic Materials Korea Ltd. Coating compositions for use with an overcoated photoresist
KR102487404B1 (ko) * 2017-07-26 2023-01-12 에스케이이노베이션 주식회사 바닥반사 방지막 형성용 중합체 및 이를 포함하는 바닥반사 방지막 형성용 조성물
KR102414150B1 (ko) * 2017-10-17 2022-06-29 에스케이이노베이션 주식회사 바닥반사방지막 형성용 중합체, 이를 포함하는 바닥반사방지막 형성용 조성물 및 이를 이용한 바닥반사방지막의 형성방법
KR102264693B1 (ko) * 2018-06-11 2021-06-11 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴형성방법
WO2020004122A1 (ja) * 2018-06-26 2020-01-02 日産化学株式会社 グリシジルエステル化合物との反応生成物を含むレジスト下層膜形成組成物
WO2020026834A1 (ja) * 2018-07-31 2020-02-06 日産化学株式会社 レジスト下層膜形成組成物
KR102288386B1 (ko) * 2018-09-06 2021-08-10 삼성에스디아이 주식회사 레지스트 하층막용 조성물 및 이를 이용한 패턴 형성 방법
US20240004295A1 (en) * 2020-10-07 2024-01-04 Nissan Chemical Corporation Resist underlayer film-forming composition containing a reaction product of trifunctional compound
CN116082914B (zh) * 2022-11-24 2024-04-30 厦门恒坤新材料科技股份有限公司 一种有机抗反射涂层组合物及其制备方法和图案形成方法
CN117603529B (zh) * 2024-01-18 2024-03-22 汕头市嘉祥塑料制品厂有限公司 一种抑菌性奶粉盖及其制备方法

Family Cites Families (83)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3215758A (en) * 1961-05-10 1965-11-02 Gulf Oil Corp Condensation polymers
US3279940A (en) * 1963-05-13 1966-10-18 Gulf Oil Corp Polyethylene and polypropylene containers coated with a polyester resin
US3448084A (en) * 1964-06-10 1969-06-03 Gulf Oil Corp Polyesters from tris(2-hydroxyethyl) isocyanurate
US3477996A (en) * 1965-03-29 1969-11-11 Allied Chem Polyesters prepared from tris - (2-hydroxyalkyl) isocyanurates and ethylenically unsaturated dicarboxylic acid anhydrides
US3474054A (en) * 1966-09-13 1969-10-21 Permalac Corp The Surface coating compositions containing pyridine salts or aromatic sulfonic acids
US3476718A (en) * 1967-07-17 1969-11-04 Hercules Inc Polymers of epoxy cyclic sulfones
US3711391A (en) * 1971-05-18 1973-01-16 American Can Co Photopolymerizable epoxy systems containing sulfoxide gelation inhibitors
US4058537A (en) * 1976-01-05 1977-11-15 Ciba-Geigy Corporation Esters of anhydride aromatic polycarboxylic acids with perfluoroalkyl alcohols
US4064191A (en) * 1976-03-10 1977-12-20 American Cyanamid Company Coating composition containing an alkylated glycoluril, a polymeric non-self-crosslinking compound and an acid catalyst
US4118437A (en) * 1976-04-08 1978-10-03 American Cyanamid Company Cross linkable powder coating compositions
US4200729A (en) * 1978-05-22 1980-04-29 King Industries, Inc Curing amino resins with aromatic sulfonic acid oxa-azacyclopentane adducts
US4251665A (en) * 1978-05-22 1981-02-17 King Industries, Inc. Aromatic sulfonic acid oxa-azacyclopentane adducts
US4255558A (en) * 1979-06-18 1981-03-10 Scm Corporation Self-curing thermosetting powder paints
US4309529A (en) * 1980-05-12 1982-01-05 Minnesota Mining And Manufacturing Company Water-dispersible energy curable heterocyclic group-containing polyesters
EP0058638B1 (de) 1981-02-13 1985-08-28 Ciba-Geigy Ag Härtbare Zusammensetzung auf Basis eines säurehärtbaren Harzes und Verfahren zu dessen Härtung
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPH01293339A (ja) 1988-05-23 1989-11-27 Tosoh Corp フォトレジスト組成物
EP0440374B1 (en) * 1990-01-30 1997-04-16 Wako Pure Chemical Industries Ltd Chemical amplified resist material
US5187019A (en) * 1991-09-06 1993-02-16 King Industries, Inc. Latent catalysts
US5380804A (en) * 1993-01-27 1995-01-10 Cytec Technology Corp. 1,3,5-tris-(2-carboxyethyl) isocyanurate crosslinking agent for polyepoxide coatings
US5693691A (en) * 1995-08-21 1997-12-02 Brewer Science, Inc. Thermosetting anti-reflective coatings compositions
CN1130601C (zh) * 1996-03-07 2003-12-10 克拉里安特国际有限公司 通过反常色散改变折射率的底面抗反射涂层
US5843624A (en) * 1996-03-08 1998-12-01 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
US5998099A (en) * 1996-03-08 1999-12-07 Lucent Technologies Inc. Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
EP0851300B1 (en) * 1996-12-24 2001-10-24 Fuji Photo Film Co., Ltd. Bottom anti-reflective coating material composition and method of forming resist pattern using the same
KR100265597B1 (ko) * 1996-12-30 2000-09-15 김영환 Arf 감광막 수지 및 그 제조방법
US6808859B1 (en) * 1996-12-31 2004-10-26 Hyundai Electronics Industries Co., Ltd. ArF photoresist copolymers
US6274295B1 (en) * 1997-03-06 2001-08-14 Clariant Finance (Bvi) Limited Light-absorbing antireflective layers with improved performance due to refractive index optimization
US5935760A (en) * 1997-10-20 1999-08-10 Brewer Science Inc. Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
US6849377B2 (en) * 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
US6790587B1 (en) * 1999-05-04 2004-09-14 E. I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography
EP1164158A4 (en) * 1999-10-27 2004-04-07 Kaneka Corp EXTRUDED POLYSTYRENE FOAM AND PRODUCTION METHOD THEREFOR
US6686124B1 (en) * 2000-03-14 2004-02-03 International Business Machines Corporation Multifunctional polymeric materials and use thereof
US6323310B1 (en) * 2000-04-19 2001-11-27 Brewer Science, Inc. Anti-reflective coating compositions comprising polymerized aminoplasts
WO2001098834A1 (fr) * 2000-06-21 2001-12-27 Asahi Glass Company, Limited Composition de reserve
US6447980B1 (en) * 2000-07-19 2002-09-10 Clariant Finance (Bvi) Limited Photoresist composition for deep UV and process thereof
KR100734249B1 (ko) * 2000-09-07 2007-07-02 삼성전자주식회사 축합환의 방향족 환을 포함하는 보호기를 가지는 감광성폴리머 및 이를 포함하는 레지스트 조성물
US6509417B1 (en) * 2000-10-31 2003-01-21 Lilly Industries, Inc. Coating of fatty acid-modified glycidyl copolymer, OH polymer and optional anhydride polymer
KR100776551B1 (ko) * 2001-02-09 2007-11-16 아사히 가라스 가부시키가이샤 레지스트 조성물
KR100872674B1 (ko) * 2001-04-10 2008-12-10 닛산 가가쿠 고교 가부시키 가이샤 리소그래피용 반사방지막 형성 조성물
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
US6723488B2 (en) * 2001-11-07 2004-04-20 Clariant Finance (Bvi) Ltd Photoresist composition for deep UV radiation containing an additive
EP1315043A1 (en) 2001-11-27 2003-05-28 Fujitsu Limited Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
US6806026B2 (en) * 2002-05-31 2004-10-19 International Business Machines Corporation Photoresist composition
JP2004014474A (ja) 2002-06-11 2004-01-15 Sumitomo Wiring Syst Ltd ワイヤハーネスの成形方法および成形ワイヤハーネス
US7425399B2 (en) * 2002-10-09 2008-09-16 Nissan Chemical Industries, Ltd. Composition for forming anti-reflective coating for use in lithography
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
US7264913B2 (en) * 2002-11-21 2007-09-04 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
EP2343597B1 (en) * 2003-04-02 2015-08-05 Nissan Chemical Industries, Ltd. Use of an underlayer coating forming composition for lithography
US7186789B2 (en) * 2003-06-11 2007-03-06 Advanced Cardiovascular Systems, Inc. Bioabsorbable, biobeneficial polyester polymers for use in drug eluting stent coatings
TWI363251B (en) * 2003-07-30 2012-05-01 Nissan Chemical Ind Ltd Sublayer coating-forming composition for lithography containing compound having protected carboxy group
TWI358612B (en) * 2003-08-28 2012-02-21 Nissan Chemical Ind Ltd Polyamic acid-containing composition for forming a
TW200533692A (en) * 2003-11-06 2005-10-16 Showa Denko Kk Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof
WO2005097883A2 (en) 2004-03-26 2005-10-20 King Industries, Inc. Method of producing a crosslinked coating in the manufacture of integrated circuits
US7081511B2 (en) * 2004-04-05 2006-07-25 Az Electronic Materials Usa Corp. Process for making polyesters
KR100853004B1 (ko) * 2004-04-09 2008-08-19 닛산 가가쿠 고교 가부시키 가이샤 축합계 폴리머를 갖는 반도체용 반사 방지막
EP1598702A1 (en) 2004-05-18 2005-11-23 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
US7691556B2 (en) * 2004-09-15 2010-04-06 Az Electronic Materials Usa Corp. Antireflective compositions for photoresists
US7326523B2 (en) * 2004-12-16 2008-02-05 International Business Machines Corporation Low refractive index polymers as underlayers for silicon-containing photoresists
EP1691238A3 (en) * 2005-02-05 2009-01-21 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
TWI340296B (en) 2005-03-20 2011-04-11 Rohm & Haas Elect Mat Coating compositions for use with an overcoated photoresist
EP1742108B1 (en) * 2005-07-05 2015-10-28 Rohm and Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
US7470500B2 (en) * 2005-07-19 2008-12-30 Az Electronic Materials Usa Corp. Organic bottom antireflective polymer compositions
KR101226050B1 (ko) 2005-09-27 2013-01-24 닛산 가가쿠 고교 가부시키 가이샤 이소시아눌산 화합물과 안식향산 화합물의 반응 생성물을 포함하는 반사방지막 형성 조성물
US7553905B2 (en) * 2005-10-31 2009-06-30 Az Electronic Materials Usa Corp. Anti-reflective coatings
JP4666166B2 (ja) * 2005-11-28 2011-04-06 信越化学工業株式会社 レジスト下層膜材料及びパターン形成方法
CN101473270B (zh) * 2006-06-19 2014-08-06 日产化学工业株式会社 含有具有羟基的缩合系树脂的形成抗蚀剂下层膜的组合物
US7638262B2 (en) * 2006-08-10 2009-12-29 Az Electronic Materials Usa Corp. Antireflective composition for photoresists
CN101506736B (zh) * 2006-08-28 2013-07-10 日产化学工业株式会社 含有液体添加剂的形成抗蚀剂下层膜的组合物及下层膜形成方法、半导体装置制造方法
US7416834B2 (en) * 2006-09-27 2008-08-26 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20080175882A1 (en) * 2007-01-23 2008-07-24 Trollsas Mikael O Polymers of aliphatic thioester
US20090035704A1 (en) * 2007-08-03 2009-02-05 Hong Zhuang Underlayer Coating Composition Based on a Crosslinkable Polymer
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
US8435721B2 (en) * 2008-02-21 2013-05-07 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and forming method of resist pattern using the same
US7989144B2 (en) * 2008-04-01 2011-08-02 Az Electronic Materials Usa Corp Antireflective coating composition
US20090274974A1 (en) * 2008-04-30 2009-11-05 David Abdallah Spin-on graded k silicon antireflective coating
US7932018B2 (en) * 2008-05-06 2011-04-26 Az Electronic Materials Usa Corp. Antireflective coating composition
US8329387B2 (en) * 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
ES2610627T3 (es) * 2008-10-27 2017-04-28 Unilever N.V. Composiciones antitranspirantes o desodorantes
KR101342776B1 (ko) * 2009-04-03 2013-12-19 씨씨피 컴포지츠 유에스 엘엘씨 이소시아누레이트 고리를 함유하는 열경화성 조성물
US8551686B2 (en) * 2009-10-30 2013-10-08 Az Electronic Materials Usa Corp. Antireflective composition for photoresists
US8507192B2 (en) * 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same

Also Published As

Publication number Publication date
KR101429326B1 (ko) 2014-08-12
JP5568791B2 (ja) 2014-08-13
US20100009293A1 (en) 2010-01-14
TW201002793A (en) 2010-01-16
WO2010004377A8 (en) 2011-03-31
EP2300518A1 (en) 2011-03-30
CN102056969B (zh) 2014-09-24
US8221965B2 (en) 2012-07-17
EP2300518B1 (en) 2012-08-15
CN102056969A (zh) 2011-05-11
JP2011527460A (ja) 2011-10-27
KR20110042262A (ko) 2011-04-26
TWI512063B (zh) 2015-12-11
WO2010004377A1 (en) 2010-01-14

Similar Documents

Publication Publication Date Title
MY155242A (en) Antireflective coating compositions
HK1149950A1 (en) Novel compositions and related methods, coatings, and articles
MY148382A (en) Bottom antireflective coating compositions
TW200736181A (en) Anti-reflective coatings
GB2460579A (en) Silylethynylated heteroacenes and electronic devices made therewith
IN2012DN00548A (US20100009293A1-20100114-C00010.png)
IN2012DN00746A (US20100009293A1-20100114-C00010.png)
IL212836A0 (en) Azaquinolinone derivatives, compositions comprising the same and uses thereof
GEP20156230B (en) Forms of rifaximin and usage thereof
WO2010077740A3 (en) Novel antiviral compounds, compositions, and methods of use
IL208220A0 (en) Substituted imidazoquinolines, compositions comprising the same and uses thereof
EP2227491A4 (en) POLYMER COMPOSITIONS ON ETHYLENE BASE, PROCESS FOR THEIR PRODUCTION AND ARTICLES THEREOF
EP2328731A4 (en) Enhanced surfaces, coatings, and related methods
IL212278A0 (en) Morpholinopurine derivatives, compositions comprising the same and uses thereof
IL200846A0 (en) Oligomer-protease inhibitor conjugates, compositions comprising the same and uses thereof
MY178678A (en) Dendritic polyurethane coating
IL207372A0 (en) Phenylpyrrole derivatives, compositions comprising the same and uses thereof
PL2265679T3 (pl) Kompozycje powlekające w oparciu o polimer flurowęglowy
IL200847A0 (en) Oligomer-antihistamine inhibitor conjugates, compositions comprising the same and uses thereof
GB0706077D0 (en) Methods, Compositions and uses thereof
IL213748A0 (en) Cell adhesion inhibiting peptides, compositions comprising the same and uses thereof
GB2456407B (en) Polymer compositions
MX2013007230A (es) Sistemas de polimero.
IL207639A0 (en) Pyrrolopyrimidinecarboxamide compounds, compositions comprising the same and uses thereof
IL208262A0 (en) Hydroxyquinoxalinecar boxamide derivatives, compositions comprising the same and uses thereof