MY153444A - Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale - Google Patents

Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

Info

Publication number
MY153444A
MY153444A MYPI2011000500A MYPI20110500A MY153444A MY 153444 A MY153444 A MY 153444A MY PI2011000500 A MYPI2011000500 A MY PI2011000500A MY PI20110500 A MYPI20110500 A MY PI20110500A MY 153444 A MY153444 A MY 153444A
Authority
MY
Malaysia
Prior art keywords
template
lithography
aspect ratio
nanoscale
perforating
Prior art date
Application number
MYPI2011000500A
Other languages
English (en)
Inventor
Muhammad Amin Saleem
Brud David
Berg Jonas
Kabir Mohammad Shafiqul
Desmaris Vincent
Original Assignee
Smoltek Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Smoltek Ab filed Critical Smoltek Ab
Publication of MY153444A publication Critical patent/MY153444A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Catalysts (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
MYPI2011000500A 2008-08-05 2009-07-23 Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale MY153444A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0801770 2008-08-05

Publications (1)

Publication Number Publication Date
MY153444A true MY153444A (en) 2015-02-13

Family

ID=41226229

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2011000500A MY153444A (en) 2008-08-05 2009-07-23 Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale

Country Status (7)

Country Link
US (1) US9028242B2 (cg-RX-API-DMAC7.html)
EP (1) EP2307928A2 (cg-RX-API-DMAC7.html)
JP (1) JP5405574B2 (cg-RX-API-DMAC7.html)
KR (1) KR20110055586A (cg-RX-API-DMAC7.html)
CN (1) CN102119363B (cg-RX-API-DMAC7.html)
MY (1) MY153444A (cg-RX-API-DMAC7.html)
WO (1) WO2010015333A2 (cg-RX-API-DMAC7.html)

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KR102130688B1 (ko) * 2015-11-03 2020-07-07 삼성디스플레이 주식회사 레이저 결정화 방법
CN107175939B (zh) * 2016-03-09 2020-02-28 华邦电子股份有限公司 用于印刷线路制程的印章及其制造方法以及印刷线路制程
US9955584B2 (en) 2016-04-25 2018-04-24 Winbond Electronics Corp. Stamp for printed circuit process and method of fabricating the same and printed circuit process
US11261085B2 (en) 2017-05-03 2022-03-01 Nanotech Security Corp. Methods for micro and nano fabrication by selective template removal
US10679110B2 (en) 2018-04-01 2020-06-09 Ramot At Tel-Aviv University Ltd. Nanotags for authentication
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US11543584B2 (en) * 2020-07-14 2023-01-03 Meta Platforms Technologies, Llc Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon
CN112960641B (zh) * 2020-10-12 2024-01-23 重庆康佳光电科技有限公司 转移构件、其制备方法及具有其的转移头

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Also Published As

Publication number Publication date
JP5405574B2 (ja) 2014-02-05
CN102119363A (zh) 2011-07-06
US20110195141A1 (en) 2011-08-11
WO2010015333A2 (en) 2010-02-11
WO2010015333A3 (en) 2010-05-27
CN102119363B (zh) 2015-10-21
US9028242B2 (en) 2015-05-12
JP2011530803A (ja) 2011-12-22
KR20110055586A (ko) 2011-05-25
EP2307928A2 (en) 2011-04-13

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