MY117695A - New unsaturated oxime derivatives and the use thereof as latent acids - Google Patents

New unsaturated oxime derivatives and the use thereof as latent acids

Info

Publication number
MY117695A
MY117695A MYPI99003079A MYPI9903079A MY117695A MY 117695 A MY117695 A MY 117695A MY PI99003079 A MYPI99003079 A MY PI99003079A MY PI9903079 A MYPI9903079 A MY PI9903079A MY 117695 A MY117695 A MY 117695A
Authority
MY
Malaysia
Prior art keywords
inter alia
phenyl
hydrogen
oxime derivatives
latent acids
Prior art date
Application number
MYPI99003079A
Other languages
English (en)
Inventor
Jean-Luc Dr Birbaum
Toshikage Dr Asakura
Hitoshi Dr Yamato
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of MY117695A publication Critical patent/MY117695A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
MYPI99003079A 1998-08-19 1999-07-21 New unsaturated oxime derivatives and the use thereof as latent acids MY117695A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP98810810 1998-08-19

Publications (1)

Publication Number Publication Date
MY117695A true MY117695A (en) 2004-07-31

Family

ID=8236266

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI99003079A MY117695A (en) 1998-08-19 1999-07-21 New unsaturated oxime derivatives and the use thereof as latent acids

Country Status (10)

Country Link
US (1) US6703182B1 (https=)
EP (1) EP1105373B1 (https=)
JP (1) JP4489954B2 (https=)
KR (1) KR100640092B1 (https=)
CN (1) CN100340547C (https=)
AU (1) AU5373999A (https=)
DE (1) DE69903453T2 (https=)
MY (1) MY117695A (https=)
TW (1) TW575792B (https=)
WO (1) WO2000010972A1 (https=)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6806024B1 (en) 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TWI272451B (en) * 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
JP4685265B2 (ja) * 2001-05-10 2011-05-18 コダック株式会社 感光性組成物、感光性平版印刷版および平版印刷版の作成方法
JP4951827B2 (ja) * 2001-08-17 2012-06-13 Ｊｓｒ株式会社 スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
KR20040089607A (ko) 2002-02-06 2004-10-21 시바 스페셜티 케미칼스 홀딩 인크. 설포네이트 유도체 및 잠산으로서의 이의 용도
CN100361815C (zh) * 2002-04-24 2008-01-16 东芝泰格有限公司 喷墨记录设备
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
US8026296B2 (en) * 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
JP4996870B2 (ja) * 2006-03-28 2012-08-08 富士フイルム株式会社 光重合開始剤、感光性組成物、感光性フィルム、感光性積層体、永久パターン形成方法、及びプリント基板
US8466096B2 (en) * 2007-04-26 2013-06-18 Afton Chemical Corporation 1,3,2-dioxaphosphorinane, 2-sulfide derivatives for use as anti-wear additives in lubricant compositions
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
EP2037323B1 (en) * 2007-07-17 2014-12-10 FUJIFILM Corporation Photosensitive compositions
JP5507054B2 (ja) * 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
DE102008038943A1 (de) 2008-08-11 2010-02-18 Borealis Agrolinz Melamine Gmbh Vernetzbare Acrylatharze
WO2010112408A1 (en) 2009-03-30 2010-10-07 Basf Se Uv-dose indicator films
US8569393B2 (en) 2009-12-07 2013-10-29 Agfa-Gevaert N.V. UV-LED curable compositions and inks
AU2010330044B2 (en) 2009-12-07 2014-08-28 Agfa Graphics N.V. Photoinitiators for UV-LED curable compositions and inks
KR101813298B1 (ko) * 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
ES2706881T3 (es) 2014-05-30 2019-04-01 Igm Resins Italia Srl Fotoiniciadores de óxido de acilfosfina multifuncionales
TWI742165B (zh) * 2017-09-27 2021-10-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置
KR102824944B1 (ko) 2018-09-07 2025-06-24 아이지엠 레진스 이탈리아 에스.알.엘. 다관능성 비스아실포스핀 옥사이드 광개시제
WO2020136522A1 (en) 2018-12-28 2020-07-02 Igm Resins Italia S.R.L. Photoinitiators
US11981650B2 (en) 2019-10-11 2024-05-14 Igm Resins Italia S.R.L. Coumarin glyoxylates for LED photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
WO2023161049A1 (en) 2022-02-24 2023-08-31 Igm Resins Italia S.R.L. Photoinitiators
JP2025514405A (ja) 2022-05-06 2025-05-02 アイジーエム グループ ビー．ヴィ． ホスフィンオキシド光開始剤、クマリン系増感剤及びアミン添加剤を含む光開始剤パッケージ
JP2025514446A (ja) 2022-05-06 2025-05-02 アイジーエム グループ ビー．ヴィ． ホスフィンオキシド光開始剤、オキサゾール系増感剤及びアミン添加剤を含む光開始剤パッケージ
EP4273200B1 (en) 2022-05-06 2026-03-25 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
JP2025533845A (ja) 2022-10-05 2025-10-09 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ ポリマー性（メタ）アクリレート光開始剤
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
CN121646581A (zh) 2023-08-03 2026-03-10 意大利艾坚蒙树脂有限公司 10,11-二氢-5h-二苯并[b,f]氮杂䓬衍生物作为光聚合中的光引发剂用于光固化组合物
EP4534614B1 (en) 2023-10-02 2026-04-15 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators, further acylphosphine oxide photoinitiators and optical brightener sensitizers
IT202300028218A1 (it) 2023-12-28 2025-06-28 Igm Resins Italia Srl Nuova forma solida di bis(2,4,6-trimetilbenzoil)-n-ottilfosfina ossido
EP4578918A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Photosensitizers for photopolymerization
EP4579344A1 (en) 2023-12-29 2025-07-02 IGM Group B.V. Thioalkylcoumarin photosensitizers for photopolymerization

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123255A (en) * 1977-01-03 1978-10-31 Chevron Research Company O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes
US4347372A (en) * 1978-09-01 1982-08-31 Ciba-Geigy Corporation Benzoxazolyl-glyoxylonitrile-2-oxime ether derivatives
US4346094A (en) * 1980-09-22 1982-08-24 Eli Lilly And Company 3-Aryl-5-isothiazolecarboxylic acids and related compounds used to lower uric acid levels
US4510294A (en) * 1982-07-02 1985-04-09 Polaroid Corporation Polymerization of monomeric hydrogen-blocked oxime derivatives
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
EP0361907A3 (en) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photoresist compositions for deep uv image reversal
DE59309494D1 (de) 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤
JP3456808B2 (ja) * 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
MY117352A (en) * 1995-10-31 2004-06-30 Ciba Sc Holding Ag Oximesulfonic acid esters and the use thereof as latent sulfonic acids.
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
JP3875271B2 (ja) 1996-09-02 2007-01-31 チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド 高感度の高解像度ｉ線ホトレジスト用のアルキルスルホニルオキシム類
SG97168A1 (en) * 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition

Also Published As

Publication number Publication date
US6703182B1 (en) 2004-03-09
EP1105373A1 (en) 2001-06-13
EP1105373B1 (en) 2002-10-09
JP4489954B2 (ja) 2010-06-23
AU5373999A (en) 2000-03-14
WO2000010972A1 (en) 2000-03-02
CN100340547C (zh) 2007-10-03
KR20010085415A (ko) 2001-09-07
CN1313850A (zh) 2001-09-19
DE69903453T2 (de) 2003-07-03
TW575792B (en) 2004-02-11
DE69903453D1 (de) 2002-11-14
JP2002523398A (ja) 2002-07-30
KR100640092B1 (ko) 2006-10-31

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