KR100640092B1 - 신규한 불포화 옥심 유도체, 및 이를 포함하는 광중합성 조성물 및 감광성 내식막 - Google Patents

신규한 불포화 옥심 유도체, 및 이를 포함하는 광중합성 조성물 및 감광성 내식막 Download PDF

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Publication number
KR100640092B1
KR100640092B1 KR1020017002132A KR20017002132A KR100640092B1 KR 100640092 B1 KR100640092 B1 KR 100640092B1 KR 1020017002132 A KR1020017002132 A KR 1020017002132A KR 20017002132 A KR20017002132 A KR 20017002132A KR 100640092 B1 KR100640092 B1 KR 100640092B1
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South Korea
Prior art keywords
phenyl
alkyl
substituted
formula
unsubstituted
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Expired - Fee Related
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KR1020017002132A
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English (en)
Korean (ko)
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KR20010085415A (ko
Inventor
비르바움장-룩
아사쿠라도시카게
야마토히토시
Original Assignee
시바 스페셜티 케미칼스 홀딩 인크.
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Polymerisation Methods In General (AREA)
KR1020017002132A 1998-08-19 1999-08-06 신규한 불포화 옥심 유도체, 및 이를 포함하는 광중합성 조성물 및 감광성 내식막 Expired - Fee Related KR100640092B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98810810.6 1998-08-19
EP98810810 1998-08-19

Publications (2)

Publication Number Publication Date
KR20010085415A KR20010085415A (ko) 2001-09-07
KR100640092B1 true KR100640092B1 (ko) 2006-10-31

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017002132A Expired - Fee Related KR100640092B1 (ko) 1998-08-19 1999-08-06 신규한 불포화 옥심 유도체, 및 이를 포함하는 광중합성 조성물 및 감광성 내식막

Country Status (10)

Country Link
US (1) US6703182B1 (https=)
EP (1) EP1105373B1 (https=)
JP (1) JP4489954B2 (https=)
KR (1) KR100640092B1 (https=)
CN (1) CN100340547C (https=)
AU (1) AU5373999A (https=)
DE (1) DE69903453T2 (https=)
MY (1) MY117695A (https=)
TW (1) TW575792B (https=)
WO (1) WO2000010972A1 (https=)

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CN102639501B (zh) * 2009-12-07 2015-04-29 爱克发印艺公司 用于uv-led可固化组合物和墨水的光引发剂
KR101813298B1 (ko) * 2010-02-24 2017-12-28 바스프 에스이 잠재성 산 및 그의 용도
JP6599446B2 (ja) 2014-05-30 2019-10-30 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 多官能性アシルホスフィンオキシド光重合開始剤
TWI742165B (zh) * 2017-09-27 2021-10-11 奇美實業股份有限公司 化學增幅型正型感光性樹脂組成物、光阻圖案及其形成方法以及電子裝置
EP3847179A1 (en) 2018-09-07 2021-07-14 IGM Resins Italia S.r.l. Multifunctional bisacylphosphine oxide photoinitiators
JP7472429B2 (ja) 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
EP4041719A1 (en) 2019-10-11 2022-08-17 IGM Resins Italia S.r.l. Coumarin glyoxylates for led photocuring
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
EP4482881A1 (en) 2022-02-24 2025-01-01 IGM Resins Italia S.r.l. Photoinitiators
US20250297109A1 (en) 2022-05-06 2025-09-25 Igm Group B. V. Photoinitiator package comprising phosphine oxide photoinitiators, oxazole-based sensitizers and amine additives
EP4273200B1 (en) 2022-05-06 2026-03-25 IGM Group B.V. Photoinitiator package comprising specialised bisacylphosphine oxide photoinitiators and optical brightener sensitizers
CN119137224A (zh) 2022-05-06 2024-12-13 Igm集团公司 包含氧化膦光引发剂、基于香豆素的敏化剂和胺添加剂的光引发剂包
KR20250088509A (ko) 2022-10-05 2025-06-17 아이지엠 레진스 이탈리아 에스.알.엘. 폴리머 (메트)아크릴레이트 광개시제
IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
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Also Published As

Publication number Publication date
CN100340547C (zh) 2007-10-03
EP1105373B1 (en) 2002-10-09
KR20010085415A (ko) 2001-09-07
JP4489954B2 (ja) 2010-06-23
DE69903453T2 (de) 2003-07-03
US6703182B1 (en) 2004-03-09
EP1105373A1 (en) 2001-06-13
WO2000010972A1 (en) 2000-03-02
DE69903453D1 (de) 2002-11-14
AU5373999A (en) 2000-03-14
CN1313850A (zh) 2001-09-19
TW575792B (en) 2004-02-11
MY117695A (en) 2004-07-31
JP2002523398A (ja) 2002-07-30

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