MY116855A - Argon recovery from silicon crystal furnace - Google Patents
Argon recovery from silicon crystal furnaceInfo
- Publication number
- MY116855A MY116855A MYPI97000701A MYPI9700701A MY116855A MY 116855 A MY116855 A MY 116855A MY PI97000701 A MYPI97000701 A MY PI97000701A MY PI9700701 A MYPI9700701 A MY PI9700701A MY 116855 A MY116855 A MY 116855A
- Authority
- MY
- Malaysia
- Prior art keywords
- silicon crystal
- crystal furnace
- argon recovery
- adsorption
- embodiment uses
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/08—Separating gaseous impurities from gases or gaseous mixtures or from liquefied gases or liquefied gaseous mixtures
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
- C01B23/0094—Combined chemical and physical processing
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0001—Separation or purification processing
- C01B2210/0003—Chemical processing
- C01B2210/0004—Chemical processing by oxidation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0001—Separation or purification processing
- C01B2210/0003—Chemical processing
- C01B2210/0006—Chemical processing by reduction
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0001—Separation or purification processing
- C01B2210/0009—Physical processing
- C01B2210/0014—Physical processing by adsorption in solids
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/0045—Oxygen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/005—Carbon monoxide
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/04—Processes or apparatus using separation by rectification in a dual pressure main column system
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2200/00—Processes or apparatus using separation by rectification
- F25J2200/72—Refluxing the column with at least a part of the totally condensed overhead gas
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2215/00—Processes characterised by the type or other details of the product stream
- F25J2215/58—Argon
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J2270/00—Refrigeration techniques used
- F25J2270/02—Internal refrigeration with liquid vaporising loop
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Separation By Low-Temperature Treatments (AREA)
- Separation Of Gases By Adsorption (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Gas Separation By Absorption (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US1243996P | 1996-02-28 | 1996-02-28 | |
US08/785,515 US5706674A (en) | 1997-01-17 | 1997-01-17 | Argon recovery from silicon crystal furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
MY116855A true MY116855A (en) | 2004-04-30 |
Family
ID=26683562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI97000701A MY116855A (en) | 1996-02-28 | 1997-02-24 | Argon recovery from silicon crystal furnace |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP3092101B2 (ja) |
KR (1) | KR100199883B1 (ja) |
DE (1) | DE19708025A1 (ja) |
IT (1) | IT1289983B1 (ja) |
MY (1) | MY116855A (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4519954B2 (ja) * | 1998-07-07 | 2010-08-04 | 大陽日酸株式会社 | 高清浄乾燥空気と乾燥空気の製造方法及び装置 |
JP2000024444A (ja) * | 1998-07-07 | 2000-01-25 | Nippon Sanso Kk | 高清浄乾燥空気の製造方法及び装置 |
EP1027913A4 (en) * | 1998-07-07 | 2001-11-07 | Nippon Oxygen Co Ltd | METHOD AND DEVICE FOR PRODUCING VERY PURE DRY AIR |
JP3572548B2 (ja) | 2002-05-24 | 2004-10-06 | 日本酸素株式会社 | ガス精製方法及び装置 |
KR20020096026A (ko) * | 2002-10-16 | 2002-12-28 | 장성진 | 고순도의 염기성/불활성 가스 제조를 위한 정제방법 및장치 |
US7862645B2 (en) | 2008-02-01 | 2011-01-04 | Air Products And Chemicals, Inc. | Removal of gaseous contaminants from argon |
DE102009003350C5 (de) | 2009-01-14 | 2017-02-09 | Reicat Gmbh | Verfahren und Vorrichtung zur Abtrennung von Argon aus einem Gasgemisch |
JP5321401B2 (ja) | 2009-08-06 | 2013-10-23 | 信越半導体株式会社 | シリコン酸化物除去装置及びシリコン単結晶製造装置の不活性ガス回収設備 |
KR101151272B1 (ko) * | 2009-09-09 | 2012-06-14 | 박현진 | 고순도 다결정 실리콘 제조장치 |
DE102009044249B3 (de) * | 2009-10-14 | 2011-06-30 | ReiCat GmbH, 63571 | Verfahren und Vorrichtung zur Abtrennung von Argon aus einem Gasgemisch |
GB2477322B (en) * | 2010-02-01 | 2015-10-21 | Gas Recovery & Recycle Ltd | Inert gas recovery system |
TWI476038B (zh) * | 2010-02-10 | 2015-03-11 | Sumitomo Seika Chemicals | 氬氣之純化方法及純化裝置 |
TWI478761B (zh) * | 2010-02-25 | 2015-04-01 | Sumitomo Seika Chemicals | 氬氣之純化方法及純化裝置 |
JP5403685B2 (ja) * | 2010-02-25 | 2014-01-29 | 住友精化株式会社 | アルゴンガスの精製方法および精製装置 |
DE102011050247B4 (de) * | 2011-05-10 | 2019-02-21 | Reicat Gmbh | Verfahren und Vorrichtung zur Abtrennung von Argon aus einem Gasgemisch |
US20140165648A1 (en) * | 2012-12-18 | 2014-06-19 | Air Liquide Process & Construction, Inc. | Purification of inert gases to remove trace impurities |
WO2015094175A1 (en) * | 2013-12-17 | 2015-06-25 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Purification of inert gases to remove trace impurities |
CN105139897B (zh) * | 2015-07-23 | 2017-08-11 | 清华大学 | 一种大规模连续制备包覆颗粒的系统 |
CN106288653A (zh) * | 2016-10-21 | 2017-01-04 | 上海跃绅能源科技有限公司 | 一种单塔低温精馏回收氩气的装置及纯化回收氩气的方法 |
DE102018122312A1 (de) * | 2018-09-12 | 2020-03-12 | Air Liquide Deutschland Gmbh | Anordnung und Verfahren zum Bereitstellen eines Gases wie eines Zerstäubergases zum Erzeugen eines Pulvers an einem Verwendungsort |
CN110608367A (zh) * | 2019-09-30 | 2019-12-24 | 苏州苏净保护气氛有限公司 | 一种氩气循环利用系统及方法 |
CN111634896B (zh) * | 2020-05-19 | 2023-03-21 | 北京北大先锋科技有限公司 | 一种氩气净化与回收方法及系统 |
-
1997
- 1997-02-24 MY MYPI97000701A patent/MY116855A/en unknown
- 1997-02-25 KR KR1019970005796A patent/KR100199883B1/ko not_active IP Right Cessation
- 1997-02-26 IT IT97MI000422A patent/IT1289983B1/it active IP Right Grant
- 1997-02-27 DE DE19708025A patent/DE19708025A1/de not_active Ceased
- 1997-02-27 JP JP09043882A patent/JP3092101B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP3092101B2 (ja) | 2000-09-25 |
DE19708025A1 (de) | 1997-09-04 |
IT1289983B1 (it) | 1998-10-19 |
ITMI970422A1 (it) | 1998-08-26 |
KR100199883B1 (ko) | 1999-06-15 |
JPH107410A (ja) | 1998-01-13 |
KR19980068982A (ko) | 1998-10-26 |
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