MX360902B - Proceso y dispositivo para generar un plasma energizado mediante una energia de microondas en el campo de una resonancia ciclotronica electronica (rce) para ejecutar un tratamiento de superficie o aplicar un recubrimiento alrededor de un componente filiforme. - Google Patents

Proceso y dispositivo para generar un plasma energizado mediante una energia de microondas en el campo de una resonancia ciclotronica electronica (rce) para ejecutar un tratamiento de superficie o aplicar un recubrimiento alrededor de un componente filiforme.

Info

Publication number
MX360902B
MX360902B MX2016012991A MX2016012991A MX360902B MX 360902 B MX360902 B MX 360902B MX 2016012991 A MX2016012991 A MX 2016012991A MX 2016012991 A MX2016012991 A MX 2016012991A MX 360902 B MX360902 B MX 360902B
Authority
MX
Mexico
Prior art keywords
microwave energy
ecr
domain
generating
produce
Prior art date
Application number
MX2016012991A
Other languages
English (en)
Other versions
MX2016012991A (es
Inventor
Blandenet Olivier
Léon Lagarde Thierry
Choquet Patrick
Duday David
Original Assignee
Hydromecanique & Frottement
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hydromecanique & Frottement filed Critical Hydromecanique & Frottement
Publication of MX2016012991A publication Critical patent/MX2016012991A/es
Publication of MX360902B publication Critical patent/MX360902B/es

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32403—Treating multiple sides of workpieces, e.g. 3D workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)

Abstract

Proceso y dispositivo para generar un plasma energizado mediante una energía de microondas en el campo de una resonancia ciclotrónica electrónica (RCE) para ejecutar un tratamiento de superficie o aplicar un recubrimiento alrededor de un componente filiforme (F). De acuerdo con el proceso: - el componente filiforme se mueve continuamente de forma lineal a través de dipolos magnéticos dispuestos de forma opuesta entre sí y alrededor de un tubo que constituye una cámara de tratamiento, - la energía de microondas se introduce entre por lo menos dos dipolos magnéticos.
MX2016012991A 2014-04-04 2015-03-26 Proceso y dispositivo para generar un plasma energizado mediante una energia de microondas en el campo de una resonancia ciclotronica electronica (rce) para ejecutar un tratamiento de superficie o aplicar un recubrimiento alrededor de un componente filiforme. MX360902B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1453000A FR3019708B1 (fr) 2014-04-04 2014-04-04 Procede et dispositif pour generer un plasma excite par une energie micro-onde dans le domaine de la resonnance cyclonique electronique (rce), pour realiser un traitement de surface ou revetement autour d'un element filiforme.
PCT/FR2015/050765 WO2015150665A1 (fr) 2014-04-04 2015-03-26 Procédé et dispositif pour générer un plasma excite par une énergie micro-onde dans le domaine de la résonnance cyclonique électronique (rce), pour réaliser un traitement de surface ou revêtement autour d'un élément filiforme.

Publications (2)

Publication Number Publication Date
MX2016012991A MX2016012991A (es) 2017-05-01
MX360902B true MX360902B (es) 2018-11-21

Family

ID=51014483

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016012991A MX360902B (es) 2014-04-04 2015-03-26 Proceso y dispositivo para generar un plasma energizado mediante una energia de microondas en el campo de una resonancia ciclotronica electronica (rce) para ejecutar un tratamiento de superficie o aplicar un recubrimiento alrededor de un componente filiforme.

Country Status (12)

Country Link
US (1) US10283322B2 (es)
EP (1) EP3127137B1 (es)
JP (2) JP2017517638A (es)
KR (1) KR102270445B1 (es)
CN (1) CN106416430B (es)
BR (1) BR112016023061B1 (es)
CA (1) CA2944274C (es)
FR (1) FR3019708B1 (es)
MX (1) MX360902B (es)
RU (1) RU2663211C2 (es)
TW (1) TWI646572B (es)
WO (1) WO2015150665A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11037764B2 (en) * 2017-05-06 2021-06-15 Applied Materials, Inc. Modular microwave source with local Lorentz force
US10504699B2 (en) 2018-04-20 2019-12-10 Applied Materials, Inc. Phased array modular high-frequency source
KR102164479B1 (ko) * 2019-02-14 2020-10-13 주식회사 쌤빛 2개의 독립적인 마이크로파 제너레이터를 이용한 선형 ecr 플라즈마 발생 장치
CN112063996B (zh) * 2020-09-18 2021-04-20 上海征世科技有限公司 一种微波等离子体反应室及其容置基座

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US5053244A (en) * 1987-02-21 1991-10-01 Leybold Aktiengesellschaft Process for depositing silicon oxide on a substrate
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FR2667616B1 (fr) 1990-10-05 1993-01-15 Aerospatiale Procede et installation de metallisation en continu d'une meche de fibres etalee.
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DE19929184A1 (de) * 1998-06-26 1999-12-30 Mclaughlin James A Vorrichtung und Verfahren für das Aufbringen von diamantartigem Kohlenstoff (DLC) oder anderen im Vakuum abscheidbaren Materialien auf ein Substrat
FR2797372B1 (fr) 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
US20030000619A1 (en) 2000-04-28 2003-01-02 Masaaki Nakamura Rubber-reinforcing fiber, process for producing the same, and rubber product and pneumatic tire each made with the same
JP4822378B2 (ja) 2001-02-06 2011-11-24 株式会社ブリヂストン 成膜装置および成膜方法
KR100399019B1 (ko) * 2001-04-23 2003-09-19 한국과학기술연구원 상온 화학 증착 시스템 및 이를 이용한 복합 금속막 제조 방법
US20020172780A1 (en) * 2001-05-04 2002-11-21 Halverson Ward Dean Method and apparatus for treating surfaces with a plasma generated by electron cyclotron resonance
US20070202248A1 (en) 2004-03-31 2007-08-30 Federico Pavan Process for producing a metal wire coated by means of a plasma deposition technique
CN1977067B (zh) 2004-06-30 2012-04-18 倍耐力轮胎股份公司 生产涂覆有黄铜层的金属线的方法
FR2904178B1 (fr) * 2006-07-21 2008-11-07 Centre Nat Rech Scient Dispositif et procede de production et/ou de confinement d'un plasma
EP1923483A1 (en) * 2006-11-02 2008-05-21 Dow Corning Corporation Deposition of amorphous silicon films by electron cyclotron resonance
JP4214213B1 (ja) * 2007-08-03 2009-01-28 国立大学法人佐賀大学 プラズマ滅菌装置及び方法
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Also Published As

Publication number Publication date
EP3127137B1 (fr) 2020-08-12
FR3019708A1 (fr) 2015-10-09
RU2016138745A (ru) 2018-04-02
CA2944274C (fr) 2022-10-18
JP2019135327A (ja) 2019-08-15
CN106416430B (zh) 2020-03-06
JP2017517638A (ja) 2017-06-29
MX2016012991A (es) 2017-05-01
JP6771064B2 (ja) 2020-10-21
TWI646572B (zh) 2019-01-01
WO2015150665A1 (fr) 2015-10-08
EP3127137A1 (fr) 2017-02-08
FR3019708B1 (fr) 2016-05-06
US20170032939A1 (en) 2017-02-02
RU2663211C2 (ru) 2018-08-02
KR20160147798A (ko) 2016-12-23
CN106416430A (zh) 2017-02-15
KR102270445B1 (ko) 2021-06-29
BR112016023061A2 (pt) 2021-08-24
US10283322B2 (en) 2019-05-07
RU2016138745A3 (es) 2018-06-25
BR112016023061B1 (pt) 2022-08-16
TW201601189A (zh) 2016-01-01
CA2944274A1 (fr) 2015-10-08

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