JP2017517638A - 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴（ｅｃｒ）の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス - Google Patents

糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴（ｅｃｒ）の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス Download PDF

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JP2017517638A
JP2017517638A JP2017503078A JP2017503078A JP2017517638A JP 2017517638 A JP2017517638 A JP 2017517638A JP 2017503078 A JP2017503078 A JP 2017503078A JP 2017503078 A JP2017503078 A JP 2017503078A JP 2017517638 A JP2017517638 A JP 2017517638A
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plasma
component
microwave
generating
tube
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JP2017503078A
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Japanese (ja)
Inventor
オリヴィエ・ブランデネ
ティエリー・レオン・ラガルド
パトリック・ショケ
ダヴィッド・ドゥダイ
Original Assignee
アッシュ・ウー・エフ
ルクセンブルク・インスティテュート・オブ・サイエンス・アンド・テクノロジー・（エルアイエスティ）
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32403—Treating multiple sides of workpieces, e.g. 3D workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32513—Sealing means, e.g. sealing between different parts of the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating
    • H01J2237/3321—CVD [Chemical Vapor Deposition]

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
JP2017503078A 2014-04-04 2015-03-26 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴（ｅｃｒ）の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス Pending JP2017517638A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1453000 2014-04-04
FR1453000A FR3019708B1 (fr) 2014-04-04 2014-04-04 Procede et dispositif pour generer un plasma excite par une energie micro-onde dans le domaine de la resonnance cyclonique electronique (rce), pour realiser un traitement de surface ou revetement autour d'un element filiforme.
PCT/FR2015/050765 WO2015150665A1 (fr) 2014-04-04 2015-03-26 Procédé et dispositif pour générer un plasma excite par une énergie micro-onde dans le domaine de la résonnance cyclonique électronique (rce), pour réaliser un traitement de surface ou revêtement autour d'un élément filiforme.

Related Child Applications (1)

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JP2019074048A Division JP6771064B2 (ja) 2014-04-04 2019-04-09 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴（ｅｃｒ）の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス

Publications (1)

Publication Number Publication Date
JP2017517638A true JP2017517638A (ja) 2017-06-29

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JP2017503078A Pending JP2017517638A (ja) 2014-04-04 2015-03-26 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴（ｅｃｒ）の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス
JP2019074048A Active JP6771064B2 (ja) 2014-04-04 2019-04-09 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴（ｅｃｒ）の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス

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JP2019074048A Active JP6771064B2 (ja) 2014-04-04 2019-04-09 糸状コンポーネントの表面処理または被覆を実行するための電子サイクロトロン共鳴（ｅｃｒ）の場におけるマイクロ波エネルギーによってエネルギーを付与されたプラズマを発生するためのプロセス及びデバイス

Country Status (12)

Country Link
US (1) US10283322B2 (es)
EP (1) EP3127137B1 (es)
JP (2) JP2017517638A (es)
KR (1) KR102270445B1 (es)
CN (1) CN106416430B (es)
BR (1) BR112016023061B1 (es)
CA (1) CA2944274C (es)
FR (1) FR3019708B1 (es)
MX (1) MX360902B (es)
RU (1) RU2663211C2 (es)
TW (1) TWI646572B (es)
WO (1) WO2015150665A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11037764B2 (en) * 2017-05-06 2021-06-15 Applied Materials, Inc. Modular microwave source with local Lorentz force
US10504699B2 (en) 2018-04-20 2019-12-10 Applied Materials, Inc. Phased array modular high-frequency source
KR102164479B1 (ko) * 2019-02-14 2020-10-13 주식회사 쌤빛 2개의 독립적인 마이크로파 제너레이터를 이용한 선형 ecr 플라즈마 발생 장치
CN112063996B (zh) * 2020-09-18 2021-04-20 上海征世科技有限公司 一种微波等离子体反应室及其容置基座

Citations (5)

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JPS6283469A (ja) * 1985-10-08 1987-04-16 Sumitomo Heavy Ind Ltd ストリツプ用連続プラズマ照射装置
JP2000515296A (ja) * 1996-01-05 2000-11-14 シュピッツル、ラルフ マイクロ波を利用したプラズマ発生装置
US20020172780A1 (en) * 2001-05-04 2002-11-21 Halverson Ward Dean Method and apparatus for treating surfaces with a plasma generated by electron cyclotron resonance
WO2009123243A1 (ja) * 2008-03-31 2009-10-08 国立大学法人琉球大学 プラズマ生成装置及び方法
US20100174245A1 (en) * 2009-01-08 2010-07-08 Ward Dean Halverson System for pretreating the lumen of a catheter

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US5053244A (en) * 1987-02-21 1991-10-01 Leybold Aktiengesellschaft Process for depositing silicon oxide on a substrate
DE3843098A1 (de) * 1988-12-21 1990-06-28 Technics Plasma Gmbh Verfahren und vorrichtung zur kunststoffbeschichtung von strangprofilen
DE4003904A1 (de) * 1990-02-09 1991-08-14 Bosch Gmbh Robert Vorrichtung zum behandeln von substraten in einem durch mikrowellen erzeugten, gasgestuetzten plasma
FR2667616B1 (fr) 1990-10-05 1993-01-15 Aerospatiale Procede et installation de metallisation en continu d'une meche de fibres etalee.
JP2714247B2 (ja) * 1990-10-29 1998-02-16 キヤノン株式会社 マイクロ波プラズマｃｖｄ法による大面積の機能性堆積膜を連続的に形成する方法及び装置
RU2078847C1 (ru) * 1993-07-22 1997-05-10 Николай Васильевич Плешивцев Способ ионной обработки деталей машин и инструментов и устройство для его осуществления
US5595793A (en) * 1995-04-24 1997-01-21 Ceram Optec Industries, Inc. Surface-plasma-wave coating technique for dielectric filaments
JP2000064047A (ja) 1998-06-26 2000-02-29 James A Mclaughlin ダイヤモンド様炭素（ｄｌｃ）又は他の真空蒸着被膜を基体に被覆する装置及び方法
FR2797372B1 (fr) 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
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Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283469A (ja) * 1985-10-08 1987-04-16 Sumitomo Heavy Ind Ltd ストリツプ用連続プラズマ照射装置
JP2000515296A (ja) * 1996-01-05 2000-11-14 シュピッツル、ラルフ マイクロ波を利用したプラズマ発生装置
US20020172780A1 (en) * 2001-05-04 2002-11-21 Halverson Ward Dean Method and apparatus for treating surfaces with a plasma generated by electron cyclotron resonance
WO2009123243A1 (ja) * 2008-03-31 2009-10-08 国立大学法人琉球大学 プラズマ生成装置及び方法
US20100174245A1 (en) * 2009-01-08 2010-07-08 Ward Dean Halverson System for pretreating the lumen of a catheter

Also Published As

Publication number Publication date
MX2016012991A (es) 2017-05-01
JP2019135327A (ja) 2019-08-15
RU2663211C2 (ru) 2018-08-02
CN106416430B (zh) 2020-03-06
FR3019708A1 (fr) 2015-10-09
EP3127137A1 (fr) 2017-02-08
MX360902B (es) 2018-11-21
KR20160147798A (ko) 2016-12-23
WO2015150665A1 (fr) 2015-10-08
BR112016023061B1 (pt) 2022-08-16
TW201601189A (zh) 2016-01-01
KR102270445B1 (ko) 2021-06-29
FR3019708B1 (fr) 2016-05-06
RU2016138745A (ru) 2018-04-02
EP3127137B1 (fr) 2020-08-12
JP6771064B2 (ja) 2020-10-21
CA2944274A1 (fr) 2015-10-08
BR112016023061A2 (pt) 2021-08-24
CN106416430A (zh) 2017-02-15
CA2944274C (fr) 2022-10-18
US10283322B2 (en) 2019-05-07
US20170032939A1 (en) 2017-02-02
TWI646572B (zh) 2019-01-01
RU2016138745A3 (es) 2018-06-25

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