MX359927B - Fabricacion de capas criticas de elementos computacionales integrados. - Google Patents

Fabricacion de capas criticas de elementos computacionales integrados.

Info

Publication number
MX359927B
MX359927B MX2016006700A MX2016006700A MX359927B MX 359927 B MX359927 B MX 359927B MX 2016006700 A MX2016006700 A MX 2016006700A MX 2016006700 A MX2016006700 A MX 2016006700A MX 359927 B MX359927 B MX 359927B
Authority
MX
Mexico
Prior art keywords
ice
layers
layer
critical
critical layer
Prior art date
Application number
MX2016006700A
Other languages
English (en)
Other versions
MX2016006700A (es
Inventor
michael jones Christopher
Paul Freese Robert
Neal Gardner Richard
l perkins David
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016006700A publication Critical patent/MX2016006700A/es
Publication of MX359927B publication Critical patent/MX359927B/es

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters
    • G02B5/285Interference filters comprising deposited thin solid films
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10Glass or silica
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/16Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Geometry (AREA)
  • Evolutionary Computation (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Laminated Bodies (AREA)

Abstract

Un diseño de un elemento computacional integrado (ICE) incluye (1) especificación de un sustrato y múltiples capas, sus espesores e índices de refracción diana respectivos, donde los índices de refracción de las capas adyacentes son diferentes entre sí y donde un ICE hipotético fabricado según el diseño de ICE está relacionado con una característica de una muestra, y (2) identificación de una o más capas críticas de las capas del ICE, donde una capa del ICE es identificada como una capa crítica si variaciones potenciales de su espesor o índice de refracción debido a variaciones de fabricación esperadas provocan una degradación del rendimiento del ICE que supera una degradación umbral, de lo contrario la capa del ICE es identificada como una capa no crítica. Al menos una capa crítica del ICE se forma utilizando dos o más etapas de formación para formar dos o más subcapas respectivas de la capa crítica, y al menos una capa no crítica del ICE se forma utilizando una única etapa de formación.
MX2016006700A 2013-12-24 2013-12-24 Fabricacion de capas criticas de elementos computacionales integrados. MX359927B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2013/077685 WO2015099707A1 (en) 2013-12-24 2013-12-24 Fabrication of critical layers of integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016006700A MX2016006700A (es) 2016-11-29
MX359927B true MX359927B (es) 2018-10-16

Family

ID=53479373

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016006700A MX359927B (es) 2013-12-24 2013-12-24 Fabricacion de capas criticas de elementos computacionales integrados.

Country Status (4)

Country Link
US (1) US10496776B2 (es)
EP (1) EP2909762B1 (es)
MX (1) MX359927B (es)
WO (1) WO2015099707A1 (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015163875A1 (en) * 2014-04-24 2015-10-29 Halliburton Energy Services, Inc. Engineering the optical properties of an integrated computational element by ion implantation
US9852902B2 (en) * 2014-10-03 2017-12-26 Applied Materials, Inc. Material deposition for high aspect ratio structures
WO2022240385A1 (en) * 2021-05-10 2022-11-17 Carl Zeiss Vision International Gmbh A method for calibrating optical coating apparatuses

Family Cites Families (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5075550A (en) 1990-07-12 1991-12-24 Amoco Corporation Infrared detector for hydrogen fluoride gas
JPH06214169A (ja) 1992-06-08 1994-08-05 Texas Instr Inc <Ti> 制御可能な光学的周期的表面フィルタ
US5399229A (en) 1993-05-13 1995-03-21 Texas Instruments Incorporated System and method for monitoring and evaluating semiconductor wafer fabrication
US5453716A (en) 1993-11-22 1995-09-26 Chrysler Corporation Adjustable clip detection system
US5537479A (en) 1994-04-29 1996-07-16 Miller And Kreisel Sound Corp. Dual-driver bass speaker with acoustic reduction of out-of-phase and electronic reduction of in-phase distortion harmonics
DE19640132B4 (de) 1996-09-28 2015-06-03 Volkswagen Ag Verfahren zur automatischen Begrenzung von Verzerrungen an Audio-Geräten und Schaltungsanordnung zur Durchführung des Verfahrens
US6217720B1 (en) * 1997-06-03 2001-04-17 National Research Council Of Canada Multi-layer reactive sputtering method with reduced stabilization time
US6198531B1 (en) 1997-07-11 2001-03-06 University Of South Carolina Optical computational system
US6905578B1 (en) 1998-04-27 2005-06-14 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
US6213250B1 (en) 1998-09-25 2001-04-10 Dresser Industries, Inc. Transducer for acoustic logging
US6529276B1 (en) 1999-04-06 2003-03-04 University Of South Carolina Optical computational system
US6163259A (en) 1999-06-04 2000-12-19 Research Electronics International Pulse transmitting non-linear junction detector
US6078389A (en) 1999-08-18 2000-06-20 Zetter; Mark S. Multivariate spectroscopy with optical computation
US7138156B1 (en) * 2000-09-26 2006-11-21 Myrick Michael L Filter design algorithm for multi-variate optical computing
US6646753B2 (en) 2000-10-05 2003-11-11 Unaxis, Usa, Inc. In-situ thickness and refractive index monitoring and control system for thin film deposition
US6804060B1 (en) 2001-09-28 2004-10-12 Fibera, Inc. Interference filter fabrication
US7163901B2 (en) 2002-03-13 2007-01-16 Varian Semiconductor Equipment Associates, Inc. Methods for forming thin film layers by simultaneous doping and sintering
TWI303090B (en) 2002-08-13 2008-11-11 Lam Res Corp Method for in-situ monitoring of patterned substrate processing using reflectometry
US6965431B2 (en) 2003-02-28 2005-11-15 Ut-Battelle, Llc Integrated tunable optical sensor (ITOS) system
EP1515158B1 (en) 2003-09-09 2013-07-17 Esaote S.p.A. Ultrasound imaging method combined with the presence of contrast media in the body under examination
US7753847B2 (en) 2003-10-03 2010-07-13 Mayo Foundation For Medical Education And Research Ultrasound vibrometry
WO2005045891A2 (en) * 2003-10-31 2005-05-19 Tangidyne Corporation Method and apparatus for measuring and monitoring coatings
WO2005093904A1 (en) 2004-01-14 2005-10-06 The Penn State Research Foundation Reconfigurable frequency selective surfaces for remote sensing of chemical and biological agents
WO2005079385A2 (en) 2004-02-13 2005-09-01 Coronado Technology Group, L.L.C. Fabrication of narrow-band thin-film optical filters
CA2518691C (en) 2004-09-10 2013-11-12 Pavel Cheben Wavelength dispersive fourier transform spectrometer
WO2006031733A2 (en) 2004-09-13 2006-03-23 The University Of South Carolina Thin film interference filter and bootstrap method for interference filter thin film deposition process control
US7697141B2 (en) 2004-12-09 2010-04-13 Halliburton Energy Services, Inc. In situ optical computation fluid analysis system and method
US7828929B2 (en) 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
WO2007015115A1 (en) 2005-08-01 2007-02-08 Stergios Logothetidis In-situ and real-time determination of the thickness, optical properties and quality of transparent coatings
US7277819B2 (en) 2005-10-31 2007-10-02 Eastman Kodak Company Measuring layer thickness or composition changes
WO2007064579A1 (en) 2005-11-28 2007-06-07 University Of South Carolina Optical analysis system and elements to isolate spectral region
US7911605B2 (en) 2005-11-28 2011-03-22 Halliburton Energy Services, Inc. Multivariate optical elements for optical analysis system
US20080055584A1 (en) * 2006-09-01 2008-03-06 Atul Pradhan Optical transmission filter with extended out-of-band blocking
US8164061B2 (en) 2006-09-13 2012-04-24 Delphi Technologies, Inc. Method and apparatus for a universal infrared analyzer
US7777870B2 (en) 2006-12-12 2010-08-17 Evident Technologies, Inc. Method and system for the recognition of an optical signal
US8106850B1 (en) 2006-12-21 2012-01-31 Hrl Laboratories, Llc Adaptive spectral surface
WO2008106391A1 (en) 2007-02-28 2008-09-04 University Of South Carolina Design of multivariate optical elements for nonlinear calibration
US7550749B2 (en) 2007-03-30 2009-06-23 Tel Epion Inc. Methods and processing systems for using a gas cluster ion beam to offset systematic non-uniformities in workpieces processed in a process tool
US8699027B2 (en) 2007-07-27 2014-04-15 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
US7792644B2 (en) 2007-11-13 2010-09-07 Battelle Energy Alliance, Llc Methods, computer readable media, and graphical user interfaces for analysis of frequency selective surfaces
US20090182693A1 (en) 2008-01-14 2009-07-16 Halliburton Energy Services, Inc. Determining stimulation design parameters using artificial neural networks optimized with a genetic algorithm
US8216161B2 (en) 2008-08-06 2012-07-10 Mirabilis Medica Inc. Optimization and feedback control of HIFU power deposition through the frequency analysis of backscattered HIFU signals
US8252112B2 (en) 2008-09-12 2012-08-28 Ovshinsky Innovation, Llc High speed thin film deposition via pre-selected intermediate
US8054212B1 (en) 2009-03-27 2011-11-08 The Boeing Company Multi-band receiver using harmonic synchronous detection
WO2011103066A2 (en) 2010-02-16 2011-08-25 Sky Holdings Company, Llc Systems, methods and apparatuses for remote device detection
SG192120A1 (en) 2011-02-11 2013-08-30 Halliburton Energy Serv Inc Method for fabrication of a multivariate optical element
US9441149B2 (en) 2011-08-05 2016-09-13 Halliburton Energy Services, Inc. Methods for monitoring the formation and transport of a treatment fluid using opticoanalytical devices
US8780352B2 (en) 2012-04-26 2014-07-15 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8912477B2 (en) 2012-04-26 2014-12-16 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9702811B2 (en) 2012-04-26 2017-07-11 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance using integrated computational elements
US9013698B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US8941046B2 (en) 2012-04-26 2015-01-27 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9658149B2 (en) 2012-04-26 2017-05-23 Halliburton Energy Services, Inc. Devices having one or more integrated computational elements and methods for determining a characteristic of a sample by computationally combining signals produced therewith
US8823939B2 (en) 2012-04-26 2014-09-02 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9013702B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US9080943B2 (en) 2012-04-26 2015-07-14 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8879053B2 (en) 2012-04-26 2014-11-04 Halliburton Energy Services, Inc. Devices having an integrated computational element and a proximal interferent monitor and methods for determining a characteristic of a sample therewith
US9383307B2 (en) 2012-04-26 2016-07-05 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9019501B2 (en) 2012-04-26 2015-04-28 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
WO2015099671A1 (en) * 2013-12-23 2015-07-02 Halliburton Energy Services, Inc. Systems and methods to improve optical spectrum fidelity in integrated computational elements

Also Published As

Publication number Publication date
EP2909762B1 (en) 2016-12-21
US10496776B2 (en) 2019-12-03
US20160292338A1 (en) 2016-10-06
MX2016006700A (es) 2016-11-29
EP2909762A1 (en) 2015-08-26
WO2015099707A1 (en) 2015-07-02
EP2909762A4 (en) 2015-12-30

Similar Documents

Publication Publication Date Title
MX2015015046A (es) Sustrato proporcionado con un apilamiento que tiene propiedades termicas.
TW201613072A (en) Resistive memory architecture and devices
MX370002B (es) Sustrato revestido con una multicapa de baja emisividad.
MX2016005565A (es) Monitorizacion in situ de la fabricacion de elementos computacionales integrados.
MX2017011550A (es) Elemento optico que tiene un revestimiento para visibilidad mejorada de una marca, y metodo para hacer el elemento optico.
SA516371599B1 (ar) طريقة لتصميم قلب عنصر حاسوبي مدمج
MX2018005812A (es) Elemento de seguridad, metodo para producir el mismo y portador de datos equipado con el elemento de seguridad.
TW201612003A (en) Infrared-reflecting film
WO2014130026A8 (en) Optical design techniques for providing favorable fabrication characteristics
WO2012001478A3 (zh) 具有精密涂布之波长转换层之晶圆式发光装置
MY200383A (en) Substrate having a stack with thermal properties
MX359927B (es) Fabricacion de capas criticas de elementos computacionales integrados.
MX2016005757A (es) Ajuste de la fabricacion de elementos computacionales integrados.
WO2014178016A3 (en) Non-volatile opto-electronic device
JP2014116283A5 (es)
MX361644B (es) Monitorización en tiempo real de la fabricación de elementos computacionales integrados.
MX359718B (es) Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.
JP2016119454A5 (es)
JP2013254939A5 (es)
MX2016006823A (es) Monitorizacion optica in situ de la fabricacion de elementos computacionales integrados.
WO2016117841A3 (ko) 터치 윈도우
MX2016009200A (es) Diseños mejorados para elementos informaticos integrados.
MX2015008955A (es) Tecnicas de diseño optico para dispositivos informaticos opticos resistentes al entorno.
MX364436B (es) Fabricación de elementos informáticos integrados que depende de la temperatura.
MX361204B (es) Determinación de la dependencia de temperatura de índices de refracción complejos de los materiales de capa durante la fabricación de elementos informáticos integrados.

Legal Events

Date Code Title Description
FG Grant or registration