MX359718B - Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados. - Google Patents

Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.

Info

Publication number
MX359718B
MX359718B MX2016006627A MX2016006627A MX359718B MX 359718 B MX359718 B MX 359718B MX 2016006627 A MX2016006627 A MX 2016006627A MX 2016006627 A MX2016006627 A MX 2016006627A MX 359718 B MX359718 B MX 359718B
Authority
MX
Mexico
Prior art keywords
optical spectrum
systems
methods
integrated computational
fidelity
Prior art date
Application number
MX2016006627A
Other languages
English (en)
Other versions
MX2016006627A (es
Inventor
B Nayak Aditya
M Price James
l perkins David
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016006627A publication Critical patent/MX2016006627A/es
Publication of MX359718B publication Critical patent/MX359718B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • E—FIXED CONSTRUCTIONS
    • E21—EARTH OR ROCK DRILLING; MINING
    • E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
    • E21B49/00—Testing the nature of borehole walls; Formation testing; Methods or apparatus for obtaining samples of soil or well fluids, specially adapted to earth drilling or wells
    • E21B49/08—Obtaining fluid samples or testing fluids, in boreholes or wells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/26—Oils; Viscous liquids; Paints; Inks
    • G01N33/28—Oils, i.e. hydrocarbon liquids
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N2021/4126—Index of thin films

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Mining & Mineral Resources (AREA)
  • Geology (AREA)
  • Medicinal Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Fluid Mechanics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Lasers (AREA)

Abstract

Se describen sistemas y métodos para mejorar la fidelidad del espectro óptico de un elemento informático integrado fabricado en un sustrato. El elemento informático integrado está configurado para, al finalizar, procesar un espectro óptico que representa un constituyente químico de un fluido de producción de un pozo. Los sistemas y métodos miden in situ un grosor, un índice complejo de refracción, o ambos de una película formada durante la fabricación para generar un espectro óptico previsto. El espectro óptico previsto se compara con un espectro óptico objetivo. Las revisiones a un diseño del elemento informático integrado se llevan a cabo in situ para mejorar la fidelidad del espectro óptico respecto al espectro óptico objetivo. Se presentan otros sistemas y métodos.
MX2016006627A 2013-12-23 2013-12-23 Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados. MX359718B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2013/077569 WO2015099671A1 (en) 2013-12-23 2013-12-23 Systems and methods to improve optical spectrum fidelity in integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016006627A MX2016006627A (es) 2016-11-29
MX359718B true MX359718B (es) 2018-10-08

Family

ID=53479346

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016006627A MX359718B (es) 2013-12-23 2013-12-23 Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.

Country Status (4)

Country Link
US (1) US10774418B2 (es)
EP (1) EP3055645A4 (es)
MX (1) MX359718B (es)
WO (1) WO2015099671A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015099706A1 (en) 2013-12-24 2015-07-02 Halliburton Energy Services, Inc. Adjusting fabrication of integrated computational elements
US10496776B2 (en) 2013-12-24 2019-12-03 Halliburton Energy Services, Inc. Fabrication of critical layers of integrated computational elements
WO2015163875A1 (en) * 2014-04-24 2015-10-29 Halliburton Energy Services, Inc. Engineering the optical properties of an integrated computational element by ion implantation
US10317337B2 (en) 2016-05-27 2019-06-11 Halliburton Energy Services, Inc. Reverse design technique for optical processing elements
CN109477211B (zh) * 2016-07-13 2022-01-14 瑞士艾发科技 宽带光学监控
DE102019205217A1 (de) * 2019-04-11 2020-10-15 Robert Bosch Gmbh Verfahren zum Aufbringen einer Filterschicht auf einen Kristallkörper

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5144498A (en) * 1990-02-14 1992-09-01 Hewlett-Packard Company Variable wavelength light filter and sensor system
US6503578B1 (en) * 2000-05-05 2003-01-07 National Science Council Method for preparing ZnSe thin films by ion-assisted continuous wave CO2 laser deposition
US7138156B1 (en) * 2000-09-26 2006-11-21 Myrick Michael L Filter design algorithm for multi-variate optical computing
US6587264B2 (en) * 2001-01-18 2003-07-01 Thermo Corion Corporation Selectively tuned ultraviolet optical filters and methods of use thereof
US6798499B2 (en) 2001-07-18 2004-09-28 Alps Electric Co., Ltd. Method of forming optical thin films on substrate at high accuracy and apparatus therefor
JP2004537750A (ja) * 2001-08-02 2004-12-16 アイギス セミコンダクター インコーポレイテッド 同調可能な光学機器
WO2003034106A1 (fr) * 2001-10-18 2003-04-24 Bridgestone Corporation Element optique et procede de production de cet element, filtre passe bande, filtre de coupure des ondes proche infrarouge et film anti-reflexion
US7794798B2 (en) * 2007-09-29 2010-09-14 Tel Epion Inc. Method for depositing films using gas cluster ion beam processing
US7835005B2 (en) * 2008-02-21 2010-11-16 Thermo Fisher Scientific Inc. Gas analyzer system
US8918198B2 (en) 2009-01-21 2014-12-23 George Atanasoff Methods and systems for control of a surface modification process
SG192120A1 (en) 2011-02-11 2013-08-30 Halliburton Energy Serv Inc Method for fabrication of a multivariate optical element
US8879053B2 (en) 2012-04-26 2014-11-04 Halliburton Energy Services, Inc. Devices having an integrated computational element and a proximal interferent monitor and methods for determining a characteristic of a sample therewith
US8780352B2 (en) * 2012-04-26 2014-07-15 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8575541B1 (en) * 2012-12-13 2013-11-05 Halliburton Energy Services, Inc. Systems and methods for real time monitoring and management of wellbore servicing fluids

Also Published As

Publication number Publication date
EP3055645A1 (en) 2016-08-17
MX2016006627A (es) 2016-11-29
US20160289821A1 (en) 2016-10-06
US10774418B2 (en) 2020-09-15
WO2015099671A1 (en) 2015-07-02
EP3055645A4 (en) 2016-10-05

Similar Documents

Publication Publication Date Title
MX359718B (es) Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.
IL248982A0 (en) A method for designing metrological targets, substrates with metrological targets, a method for measuring coverage and a method for preparing a standard
BR112015016656A2 (pt) método de produção de um revestimento de crômio em um substrato metálico
IN2014MU00285A (es)
AU2013378824A8 (en) Optical design techniques for providing favorable fabrication characteristics
UY34801A (es) Método mejorado para la aplicación de un recubrimiento en frío integrado en el proceso de fabricación de recipientes de vidrio
SA516371599B1 (ar) طريقة لتصميم قلب عنصر حاسوبي مدمج
MY183935A (en) Solar cell production method and solar cell treatment method
GB201802102D0 (en) Manufacturing method for IPS TFT-LCD array substrate, and IPS TFT-LCD array substrate
MA39974A (fr) Beton photovoltaïque, son procede de fabrication et element de construction comprenant un tel beton
EP3805694A4 (en) LIQUID FILM THICKNESS MEASURING METHOD, MEASURING DEVICE, FILM PRODUCTION METHOD
DK3416936T3 (da) Fremgangsmåde til fremstilling af methanol
GB2525821A (en) Lens-foil based security device
TW201432370A (en) Phase shift mask and method for manufacturing the same
TW201614530A (en) Method for modeling a photoresist profile
ITMI20130954A1 (it) Elementro strutturale con contatto passante e procedimento per la relativa produzione
MX2016004903A (es) Sistemas y metodos para reducir la delaminacion en elementos informaticos integrados usados en el fondo del pozo.
EP3040129A4 (en) Method for producing transparent thin film having high refractive index, and thin film produced by said method
MX2014009071A (es) Pelicula delgada de ito y aparato terminal.
WO2016057990A3 (en) Method for detecting and analyzing surface films
PT3237894T (pt) Método para a produção de um módulo optoeletrónico incluindo um suporte compreendendo um substrato metálico, um revestimento dielétrico e uma camada condutora
MX2016013755A (es) Método y dispositivo para derterminar un efecto de barrera de un recubrimiento sobre un sustrato.
GB201600114D0 (en) Thin Film transistor substrate manufacturing method, and thin film transistor substrate manufactured via same
WO2016068546A3 (ko) 중성화된 전도성 고분자 투명전극을 포함하는 고분자 분산형 액정 소자 및 이의 제조방법
DK3058167T3 (da) Anlæg til fremstilling af carbonhydrider, fremgangsmåde til fremstilling og fremgangsmåde til opgradering

Legal Events

Date Code Title Description
FG Grant or registration