MX359718B - Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados. - Google Patents

Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.

Info

Publication number
MX359718B
MX359718B MX2016006627A MX2016006627A MX359718B MX 359718 B MX359718 B MX 359718B MX 2016006627 A MX2016006627 A MX 2016006627A MX 2016006627 A MX2016006627 A MX 2016006627A MX 359718 B MX359718 B MX 359718B
Authority
MX
Mexico
Prior art keywords
optical spectrum
systems
methods
integrated computational
fidelity
Prior art date
Application number
MX2016006627A
Other languages
English (en)
Other versions
MX2016006627A (es
Inventor
B Nayak Aditya
M Price James
l perkins David
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016006627A publication Critical patent/MX2016006627A/es
Publication of MX359718B publication Critical patent/MX359718B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • E—FIXED CONSTRUCTIONS
    • E21—EARTH OR ROCK DRILLING; MINING
    • E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
    • E21B49/00—Testing the nature of borehole walls; Formation testing; Methods or apparatus for obtaining samples of soil or well fluids, specially adapted to earth drilling or wells
    • E21B49/08—Obtaining fluid samples or testing fluids, in boreholes or wells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/26—Oils; Viscous liquids; Paints; Inks
    • G01N33/28—Oils, i.e. hydrocarbon liquids
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/281—Interference filters designed for the infrared light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N2021/4126—Index of thin films

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Mining & Mineral Resources (AREA)
  • Geology (AREA)
  • Medicinal Chemistry (AREA)
  • Food Science & Technology (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Fluid Mechanics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Lasers (AREA)

Abstract

Se describen sistemas y métodos para mejorar la fidelidad del espectro óptico de un elemento informático integrado fabricado en un sustrato. El elemento informático integrado está configurado para, al finalizar, procesar un espectro óptico que representa un constituyente químico de un fluido de producción de un pozo. Los sistemas y métodos miden in situ un grosor, un índice complejo de refracción, o ambos de una película formada durante la fabricación para generar un espectro óptico previsto. El espectro óptico previsto se compara con un espectro óptico objetivo. Las revisiones a un diseño del elemento informático integrado se llevan a cabo in situ para mejorar la fidelidad del espectro óptico respecto al espectro óptico objetivo. Se presentan otros sistemas y métodos.
MX2016006627A 2013-12-23 2013-12-23 Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados. MX359718B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2013/077569 WO2015099671A1 (en) 2013-12-23 2013-12-23 Systems and methods to improve optical spectrum fidelity in integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016006627A MX2016006627A (es) 2016-11-29
MX359718B true MX359718B (es) 2018-10-08

Family

ID=53479346

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016006627A MX359718B (es) 2013-12-23 2013-12-23 Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.

Country Status (4)

Country Link
US (1) US10774418B2 (es)
EP (1) EP3055645A4 (es)
MX (1) MX359718B (es)
WO (1) WO2015099671A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9495505B2 (en) 2013-12-24 2016-11-15 Halliburton Energy Services, Inc. Adjusting fabrication of integrated computational elements
MX359927B (es) * 2013-12-24 2018-10-16 Halliburton Energy Services Inc Fabricacion de capas criticas de elementos computacionales integrados.
MX360069B (es) * 2014-04-24 2018-10-22 Halliburton Energy Services Inc Modificacion de las propiedades opticas de un elemento informatico integrado mediante implantacion de iones.
US10317337B2 (en) 2016-05-27 2019-06-11 Halliburton Energy Services, Inc. Reverse design technique for optical processing elements
JP7002476B2 (ja) * 2016-07-13 2022-01-20 エヴァテック・アーゲー 広帯域光学監視
DE102019205217A1 (de) * 2019-04-11 2020-10-15 Robert Bosch Gmbh Verfahren zum Aufbringen einer Filterschicht auf einen Kristallkörper

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US5144498A (en) * 1990-02-14 1992-09-01 Hewlett-Packard Company Variable wavelength light filter and sensor system
US6503578B1 (en) * 2000-05-05 2003-01-07 National Science Council Method for preparing ZnSe thin films by ion-assisted continuous wave CO2 laser deposition
US7138156B1 (en) * 2000-09-26 2006-11-21 Myrick Michael L Filter design algorithm for multi-variate optical computing
US6587264B2 (en) * 2001-01-18 2003-07-01 Thermo Corion Corporation Selectively tuned ultraviolet optical filters and methods of use thereof
US6798499B2 (en) 2001-07-18 2004-09-28 Alps Electric Co., Ltd. Method of forming optical thin films on substrate at high accuracy and apparatus therefor
CN100354699C (zh) * 2001-08-02 2007-12-12 伊吉斯半导体公司 可调谐光学仪器
WO2003034106A1 (fr) * 2001-10-18 2003-04-24 Bridgestone Corporation Element optique et procede de production de cet element, filtre passe bande, filtre de coupure des ondes proche infrarouge et film anti-reflexion
US7794798B2 (en) * 2007-09-29 2010-09-14 Tel Epion Inc. Method for depositing films using gas cluster ion beam processing
US20090213381A1 (en) * 2008-02-21 2009-08-27 Dirk Appel Analyzer system and optical filtering
US8918198B2 (en) * 2009-01-21 2014-12-23 George Atanasoff Methods and systems for control of a surface modification process
CN103354915B (zh) * 2011-02-11 2016-08-10 哈利伯顿能源服务公司 多元光学元件的制造方法
US8780352B2 (en) * 2012-04-26 2014-07-15 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8879053B2 (en) 2012-04-26 2014-11-04 Halliburton Energy Services, Inc. Devices having an integrated computational element and a proximal interferent monitor and methods for determining a characteristic of a sample therewith
US8575541B1 (en) * 2012-12-13 2013-11-05 Halliburton Energy Services, Inc. Systems and methods for real time monitoring and management of wellbore servicing fluids

Also Published As

Publication number Publication date
MX2016006627A (es) 2016-11-29
WO2015099671A1 (en) 2015-07-02
EP3055645A1 (en) 2016-08-17
US10774418B2 (en) 2020-09-15
US20160289821A1 (en) 2016-10-06
EP3055645A4 (en) 2016-10-05

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