MX361644B - Monitorización en tiempo real de la fabricación de elementos computacionales integrados. - Google Patents

Monitorización en tiempo real de la fabricación de elementos computacionales integrados.

Info

Publication number
MX361644B
MX361644B MX2016005570A MX2016005570A MX361644B MX 361644 B MX361644 B MX 361644B MX 2016005570 A MX2016005570 A MX 2016005570A MX 2016005570 A MX2016005570 A MX 2016005570A MX 361644 B MX361644 B MX 361644B
Authority
MX
Mexico
Prior art keywords
layers
forming
ice
monitoring
ices
Prior art date
Application number
MX2016005570A
Other languages
English (en)
Other versions
MX2016005570A (es
Inventor
l perkins David
M Price James
B Nayak Aditya
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016005570A publication Critical patent/MX2016005570A/es
Publication of MX361644B publication Critical patent/MX361644B/es

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
    • G01V13/00—Manufacturing, calibrating, cleaning, or repairing instruments or devices covered by groups G01V1/00 – G01V11/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/548—Controlling the composition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01V—GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
    • G01V8/00—Prospecting or detecting by optical means
    • G01V8/10—Detecting, e.g. by using light barriers
    • G01V8/12—Detecting, e.g. by using light barriers using one transmitter and one receiver
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/068—Optics, miscellaneous
    • G01N2201/0683—Brewster plate; polarisation controlling elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/12—Circuits of general importance; Signal processing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geophysics (AREA)
  • Manufacturing & Machinery (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

Las técnicas incluyen recibir un diseño de un elemento computacional integrado (ICE) que incluye descripción de un sustrato y múltiples capas, sus espesores e índices de refracción complejos diana respectivos, los cuales índices de refracción complejos de capas adyacentes son diferentes entre sí, y donde un ICE hipotético fabricado de acuerdo con el diseño de ICE está relacionado con una característica de una muestra; formar al menos algunas de las capas de múltiples ICE de acuerdo con el diseño de ICE utilizando una fuente de deposición, donde las capas de los ICE que se forman están sostenidas en un soporte que se mueve periódicamente con respecto a la fuente de deposición durante la formación; monitorizar las características de las capas de los ICE durante la formación, la cual monitorización de las características se realiza utilizando un intervalo del movimiento periódico del soporte con respecto a la fuente de deposición; y ajustar la formación en función de los resultados de la monitorización.
MX2016005570A 2013-12-24 2013-12-24 Monitorización en tiempo real de la fabricación de elementos computacionales integrados. MX361644B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2013/077687 WO2015099709A1 (en) 2013-12-24 2013-12-24 Real-time monitoring of fabrication of integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016005570A MX2016005570A (es) 2016-12-09
MX361644B true MX361644B (es) 2018-12-13

Family

ID=53479375

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016005570A MX361644B (es) 2013-12-24 2013-12-24 Monitorización en tiempo real de la fabricación de elementos computacionales integrados.

Country Status (4)

Country Link
US (1) US10914863B2 (es)
EP (1) EP2901135B1 (es)
MX (1) MX361644B (es)
WO (1) WO2015099709A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10914863B2 (en) 2013-12-24 2021-02-09 Halliburton Energy Services, Inc. Real-time monitoring of fabrication of integrated computational elements
JP6763321B2 (ja) * 2017-03-01 2020-09-30 東京エレクトロン株式会社 自転検出用冶具、基板処理装置及び基板処理装置の運転方法
US11542596B2 (en) * 2019-07-01 2023-01-03 Viavi Solutions Inc. Optical monitor
US11939665B2 (en) * 2020-03-10 2024-03-26 Tokyo Electron Limted Film thickness measuring apparatus and film thickness measuring method, and film forming system and film forming method
EP4123271A4 (en) * 2020-03-18 2023-07-26 Panasonic Intellectual Property Management Co., Ltd. PHOTOGRAPHIC DEVICE
US11867629B2 (en) 2021-03-30 2024-01-09 Saudi Arabian Oil Company 4D chemical fingerprint well monitoring

Family Cites Families (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
US5075550A (en) 1990-07-12 1991-12-24 Amoco Corporation Infrared detector for hydrogen fluoride gas
US5313044A (en) * 1992-04-28 1994-05-17 Duke University Method and apparatus for real-time wafer temperature and thin film growth measurement and control in a lamp-heated rapid thermal processor
JPH06214169A (ja) 1992-06-08 1994-08-05 Texas Instr Inc <Ti> 制御可能な光学的周期的表面フィルタ
US5399229A (en) 1993-05-13 1995-03-21 Texas Instruments Incorporated System and method for monitoring and evaluating semiconductor wafer fabrication
US5453716A (en) 1993-11-22 1995-09-26 Chrysler Corporation Adjustable clip detection system
US5537479A (en) 1994-04-29 1996-07-16 Miller And Kreisel Sound Corp. Dual-driver bass speaker with acoustic reduction of out-of-phase and electronic reduction of in-phase distortion harmonics
DE19640132B4 (de) 1996-09-28 2015-06-03 Volkswagen Ag Verfahren zur automatischen Begrenzung von Verzerrungen an Audio-Geräten und Schaltungsanordnung zur Durchführung des Verfahrens
US6217720B1 (en) 1997-06-03 2001-04-17 National Research Council Of Canada Multi-layer reactive sputtering method with reduced stabilization time
US6198531B1 (en) 1997-07-11 2001-03-06 University Of South Carolina Optical computational system
US6905578B1 (en) 1998-04-27 2005-06-14 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
US6213250B1 (en) 1998-09-25 2001-04-10 Dresser Industries, Inc. Transducer for acoustic logging
US6529276B1 (en) 1999-04-06 2003-03-04 University Of South Carolina Optical computational system
US6163259A (en) 1999-06-04 2000-12-19 Research Electronics International Pulse transmitting non-linear junction detector
US6078389A (en) 1999-08-18 2000-06-20 Zetter; Mark S. Multivariate spectroscopy with optical computation
US6777684B1 (en) 1999-08-23 2004-08-17 Rose Research L.L.C. Systems and methods for millimeter and sub-millimeter wave imaging
US20020090650A1 (en) 2000-04-06 2002-07-11 Quantum Dot Corporation Two-dimensional spectral imaging system
US7138156B1 (en) 2000-09-26 2006-11-21 Myrick Michael L Filter design algorithm for multi-variate optical computing
AU2002216615A1 (en) 2000-10-05 2002-04-15 Opnetics Corporation In-situ thickness and refractive index monitoring and control system for thin film deposition
CN1575350A (zh) * 2001-08-24 2005-02-02 纳米纳克斯公司 用于在溅射薄膜中产生均匀、各向同性应力的方法和装置
US6804060B1 (en) 2001-09-28 2004-10-12 Fibera, Inc. Interference filter fabrication
US7163901B2 (en) 2002-03-13 2007-01-16 Varian Semiconductor Equipment Associates, Inc. Methods for forming thin film layers by simultaneous doping and sintering
TWI276802B (en) 2002-08-13 2007-03-21 Lam Res Corp Process endpoint detection method using broadband reflectometry
US6965431B2 (en) 2003-02-28 2005-11-15 Ut-Battelle, Llc Integrated tunable optical sensor (ITOS) system
JP3811150B2 (ja) * 2003-09-05 2006-08-16 株式会社東芝 膜厚測定方法、膜厚測定システム、半導体装置の製造方法及び膜厚測定システム制御プログラム
EP1515158B1 (en) 2003-09-09 2013-07-17 Esaote S.p.A. Ultrasound imaging method combined with the presence of contrast media in the body under examination
US7753847B2 (en) 2003-10-03 2010-07-13 Mayo Foundation For Medical Education And Research Ultrasound vibrometry
US7176474B2 (en) * 2003-10-31 2007-02-13 Tangidyne Corporation Method and apparatus for measuring and monitoring coatings
US7679563B2 (en) 2004-01-14 2010-03-16 The Penn State Research Foundation Reconfigurable frequency selective surfaces for remote sensing of chemical and biological agents
US7259850B2 (en) * 2004-01-14 2007-08-21 Taiwan Semiconductor Manufacturing Company Approach to improve ellipsometer modeling accuracy for solving material optical constants N & K
WO2005079385A2 (en) 2004-02-13 2005-09-01 Coronado Technology Group, L.L.C. Fabrication of narrow-band thin-film optical filters
EP1789752A4 (en) 2004-09-13 2009-11-04 Univ South Carolina THIN-FILTER INTERFERENTIAL FILTER AND BOOTSTRAP METHOD OF CONTROLLING THE THIN FILM INTERFERENTIAL FILTER DEPOSITION PROCESS
US7697141B2 (en) 2004-12-09 2010-04-13 Halliburton Energy Services, Inc. In situ optical computation fluid analysis system and method
US7828929B2 (en) * 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
US7224540B2 (en) 2005-01-31 2007-05-29 Datalogic Scanning, Inc. Extended depth of field imaging system using chromatic aberration
WO2007015115A1 (en) 2005-08-01 2007-02-08 Stergios Logothetidis In-situ and real-time determination of the thickness, optical properties and quality of transparent coatings
US7911605B2 (en) 2005-11-28 2011-03-22 Halliburton Energy Services, Inc. Multivariate optical elements for optical analysis system
US7920258B2 (en) 2005-11-28 2011-04-05 Halliburton Energy Services, Inc. Optical analysis system and elements to isolate spectral region
US8164061B2 (en) 2006-09-13 2012-04-24 Delphi Technologies, Inc. Method and apparatus for a universal infrared analyzer
US7777870B2 (en) 2006-12-12 2010-08-17 Evident Technologies, Inc. Method and system for the recognition of an optical signal
US8106850B1 (en) 2006-12-21 2012-01-31 Hrl Laboratories, Llc Adaptive spectral surface
US8352205B2 (en) * 2007-02-28 2013-01-08 Halliburton Energy Services, Inc. Multivariate optical elements for nonlinear calibration
FR2913210B1 (fr) 2007-03-02 2009-05-29 Sidel Participations Perfectionnements a la chauffe des matieres plastiques par rayonnement infrarouge
US8699027B2 (en) 2007-07-27 2014-04-15 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
US7792644B2 (en) 2007-11-13 2010-09-07 Battelle Energy Alliance, Llc Methods, computer readable media, and graphical user interfaces for analysis of frequency selective surfaces
US20090182693A1 (en) 2008-01-14 2009-07-16 Halliburton Energy Services, Inc. Determining stimulation design parameters using artificial neural networks optimized with a genetic algorithm
US7835005B2 (en) 2008-02-21 2010-11-16 Thermo Fisher Scientific Inc. Gas analyzer system
US20100004773A1 (en) 2008-07-01 2010-01-07 Phystech, Inc Apparatus for characterization of thin film properties and method of using the same
US8216161B2 (en) 2008-08-06 2012-07-10 Mirabilis Medica Inc. Optimization and feedback control of HIFU power deposition through the frequency analysis of backscattered HIFU signals
US8252112B2 (en) 2008-09-12 2012-08-28 Ovshinsky Innovation, Llc High speed thin film deposition via pre-selected intermediate
US8125641B2 (en) 2009-03-27 2012-02-28 N&K Technology, Inc. Method and apparatus for phase-compensated sensitivity-enhanced spectroscopy (PCSES)
US8054212B1 (en) 2009-03-27 2011-11-08 The Boeing Company Multi-band receiver using harmonic synchronous detection
CA2789737A1 (en) 2010-02-16 2011-08-25 Sky Holdings Company, Llc Systems, methods and apparatuses for remote device detection
US20120150451A1 (en) 2010-12-13 2012-06-14 Halliburton Energy Services, Inc. Optical Computation Fluid Analysis System and Method
SG192120A1 (en) 2011-02-11 2013-08-30 Halliburton Energy Serv Inc Method for fabrication of a multivariate optical element
US20130032338A1 (en) 2011-08-05 2013-02-07 Halliburton Energy Services, Inc. Methods for Fluid Monitoring in a Subterranean Formation Using One or More Integrated Computational Elements
US9441149B2 (en) 2011-08-05 2016-09-13 Halliburton Energy Services, Inc. Methods for monitoring the formation and transport of a treatment fluid using opticoanalytical devices
US20130035262A1 (en) 2011-08-05 2013-02-07 Freese Robert P Integrated Computational Element Analytical Methods for Microorganisms Treated with a Pulsed Light Source
WO2013049001A2 (en) 2011-09-27 2013-04-04 Kla-Tencor Corporation High throughput thin film characterization and defect detection
US9019501B2 (en) 2012-04-26 2015-04-28 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8941046B2 (en) 2012-04-26 2015-01-27 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9658149B2 (en) 2012-04-26 2017-05-23 Halliburton Energy Services, Inc. Devices having one or more integrated computational elements and methods for determining a characteristic of a sample by computationally combining signals produced therewith
US9080943B2 (en) 2012-04-26 2015-07-14 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8823939B2 (en) 2012-04-26 2014-09-02 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8879053B2 (en) 2012-04-26 2014-11-04 Halliburton Energy Services, Inc. Devices having an integrated computational element and a proximal interferent monitor and methods for determining a characteristic of a sample therewith
US9013702B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US9702811B2 (en) 2012-04-26 2017-07-11 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance using integrated computational elements
US8780352B2 (en) 2012-04-26 2014-07-15 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9013698B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US8912477B2 (en) 2012-04-26 2014-12-16 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9383307B2 (en) 2012-04-26 2016-07-05 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US10914863B2 (en) 2013-12-24 2021-02-09 Halliburton Energy Services, Inc. Real-time monitoring of fabrication of integrated computational elements

Also Published As

Publication number Publication date
EP2901135A1 (en) 2015-08-05
US20160223712A1 (en) 2016-08-04
MX2016005570A (es) 2016-12-09
WO2015099709A1 (en) 2015-07-02
EP2901135A4 (en) 2015-08-05
US10914863B2 (en) 2021-02-09
EP2901135B1 (en) 2016-08-24

Similar Documents

Publication Publication Date Title
MX361644B (es) Monitorización en tiempo real de la fabricación de elementos computacionales integrados.
MX359911B (es) Monitorizacion in situ de la fabricacion de elementos computacionales integrados.
DE112012002318A5 (de) Substratelement für die Beschichtung mit einer Easy-to-clean Beschichtung
DE112012002331A5 (de) Substratelement für die Beschichtung mit einer Easy-to-clean Beschichtung
KR20180084762A (ko) 비정질 투명 도전성 필름, 그리고, 결정질 투명 도전성 필름 및 그 제조 방법
WO2015095617A3 (en) Structures having selectively metallized regions and methods of manufacturing the same
MX2016006614A (es) Fabricacion de elementos informaticos integrados mediante el uso de un soporte de sustrato con forma que coincida con el perfil de la pluma de deposicion.
WO2014130026A8 (en) Optical design techniques for providing favorable fabrication characteristics
SG10201808864SA (en) Geometries and patterns for surface texturing to increase deposition retention
FR3002239B1 (fr) Procede de fabrication d&#39;une piece d&#39;aeronef comportant un substrat et une couche de revetement du substrat
EA201690509A1 (ru) Соединительный элемент для трубчатого компонента, покрытый осажденным слоем композиционного материала на основе металла, и способ получения такого элемента
WO2014040834A3 (en) Method for improving the adhesion of plated metal layers to silicon
SA516371599B1 (ar) طريقة لتصميم قلب عنصر حاسوبي مدمج
EA201490841A1 (ru) СОЛНЦЕЗАЩИТНАЯ СТЕКЛЯННАЯ ПАНЕЛЬ, СОДЕРЖАЩАЯ СЛОЙ ИЗ СПЛАВА NiCu
WO2014130033A3 (en) Shape memory alloy apparatus and methods of formation and operation thereof
MX2015014124A (es) Optimizacion de sensor optico e implementacion de sistema con estructura de capa simplificada.
FR2977944B1 (fr) Dispositif electronique et son procede de fabrication
MX2016006823A (es) Monitorizacion optica in situ de la fabricacion de elementos computacionales integrados.
MX362272B (es) Ajuste de la fabricacion de elementos computacionales integrados.
EP2592632A4 (en) SUPERCONDUCTING THIN LAYER SUBSTRATE, SUPERCONDUCTING THIN LAYER, AND METHOD FOR MANUFACTURING SUPERCONDUCTING THIN LAYER SUBSTRATE
MX359927B (es) Fabricacion de capas criticas de elementos computacionales integrados.
FR3008718B1 (fr) Procede de fabrication d&#39;une sous-couche metallique a base de platine sur un substrat metallique
FR3011539B1 (fr) Substrat microstructure.
MX364436B (es) Fabricación de elementos informáticos integrados que depende de la temperatura.
FR3005654B1 (fr) Procede de depot de revetements sur un substrat

Legal Events

Date Code Title Description
FG Grant or registration