MX2016005565A - Monitorizacion in situ de la fabricacion de elementos computacionales integrados. - Google Patents

Monitorizacion in situ de la fabricacion de elementos computacionales integrados.

Info

Publication number
MX2016005565A
MX2016005565A MX2016005565A MX2016005565A MX2016005565A MX 2016005565 A MX2016005565 A MX 2016005565A MX 2016005565 A MX2016005565 A MX 2016005565A MX 2016005565 A MX2016005565 A MX 2016005565A MX 2016005565 A MX2016005565 A MX 2016005565A
Authority
MX
Mexico
Prior art keywords
ice
design
layers
integrated computational
fabrication
Prior art date
Application number
MX2016005565A
Other languages
English (en)
Other versions
MX359911B (es
Inventor
michael jones Christopher
l perkins David
Paul Freese Robert
Neal Gardner Richard
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016005565A publication Critical patent/MX2016005565A/es
Publication of MX359911B publication Critical patent/MX359911B/es

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM]
    • G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS], computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G01N2021/213—Spectrometric ellipsometry
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/32—Operator till task planning
    • G05B2219/32368—Quality control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Metallurgy (AREA)
  • Combustion & Propulsion (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Automation & Control Theory (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

Las técnicas incluyen recibir un diseño de un elemento computacional integrado (ICE), el cual diseño de ICE incluye descripción de un sustrato y múltiples capas, sus espesores e índices de refracción complejos diana respectivos, los cuales índices de refracción complejos de capas adyacentes son diferentes entre sí, y donde un ICE hipotético fabricado de acuerdo con el diseño de ICE está relacionado con una característica de una muestra; formar al menos algunas de las múltiples capas del ICE de acuerdo con el diseño de ICE; realizar al menos dos tipos diferentes de mediciones in situ; predecir, utilizando los resultados de los al menos dos tipos diferentes de mediciones in situ, el rendimiento del ICE con respecto al diseño de ICE; y ajustar la formación de las capas que aún no se han formado, al menos en parte, mediante la actualización del diseño de ICE en función del rendimiento previsto.
MX2016005565A 2013-12-24 2013-12-24 Monitorizacion in situ de la fabricacion de elementos computacionales integrados. MX359911B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2013/077690 WO2015099711A1 (en) 2013-12-24 2013-12-24 In-situ monitoring of fabrication of integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016005565A true MX2016005565A (es) 2016-12-09
MX359911B MX359911B (es) 2018-10-16

Family

ID=53479377

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016005565A MX359911B (es) 2013-12-24 2013-12-24 Monitorizacion in situ de la fabricacion de elementos computacionales integrados.

Country Status (5)

Country Link
US (1) US9395721B2 (es)
EP (1) EP2926116A4 (es)
BR (1) BR112016011057A8 (es)
MX (1) MX359911B (es)
WO (1) WO2015099711A1 (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9784671B2 (en) * 2013-12-20 2017-10-10 Halliburton Energy Services, Inc. Parallel optical thin film measurement system for analyzing multianalytes
WO2015163875A1 (en) * 2014-04-24 2015-10-29 Halliburton Energy Services, Inc. Engineering the optical properties of an integrated computational element by ion implantation
CA2961338C (en) * 2014-10-28 2019-11-05 Halliburton Energy Services, Inc. Identification of material type and condition in a dry bulk material storage bin
WO2017007535A1 (en) * 2015-07-07 2017-01-12 Quality Vision International, Inc. Method and apparatus for scanning object
US20200018162A1 (en) * 2016-09-29 2020-01-16 Halliburton Energy Services, Inc. Device and method for optical analysis using multiple integrated computational elements
US20210063314A1 (en) * 2018-05-17 2021-03-04 Halliburton Energy Services, Inc. Use of a backside roughened sample for multiple optical measurements to improve thin film fabrications
US11717910B2 (en) 2020-11-03 2023-08-08 General Electric Company Monitoring operation of electron beam additive manufacturing with piezoelectric crystals

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5075550A (en) 1990-07-12 1991-12-24 Amoco Corporation Infrared detector for hydrogen fluoride gas
JPH06214169A (ja) 1992-06-08 1994-08-05 Texas Instr Inc <Ti> 制御可能な光学的周期的表面フィルタ
US5399229A (en) 1993-05-13 1995-03-21 Texas Instruments Incorporated System and method for monitoring and evaluating semiconductor wafer fabrication
US5453716A (en) 1993-11-22 1995-09-26 Chrysler Corporation Adjustable clip detection system
US5537479A (en) 1994-04-29 1996-07-16 Miller And Kreisel Sound Corp. Dual-driver bass speaker with acoustic reduction of out-of-phase and electronic reduction of in-phase distortion harmonics
DE19640132B4 (de) 1996-09-28 2015-06-03 Volkswagen Ag Verfahren zur automatischen Begrenzung von Verzerrungen an Audio-Geräten und Schaltungsanordnung zur Durchführung des Verfahrens
US6217720B1 (en) * 1997-06-03 2001-04-17 National Research Council Of Canada Multi-layer reactive sputtering method with reduced stabilization time
US6198531B1 (en) 1997-07-11 2001-03-06 University Of South Carolina Optical computational system
US6905578B1 (en) 1998-04-27 2005-06-14 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
US6213250B1 (en) 1998-09-25 2001-04-10 Dresser Industries, Inc. Transducer for acoustic logging
US6529276B1 (en) 1999-04-06 2003-03-04 University Of South Carolina Optical computational system
US6163259A (en) 1999-06-04 2000-12-19 Research Electronics International Pulse transmitting non-linear junction detector
US6078389A (en) 1999-08-18 2000-06-20 Zetter; Mark S. Multivariate spectroscopy with optical computation
US6777684B1 (en) 1999-08-23 2004-08-17 Rose Research L.L.C. Systems and methods for millimeter and sub-millimeter wave imaging
US20020090650A1 (en) 2000-04-06 2002-07-11 Quantum Dot Corporation Two-dimensional spectral imaging system
US7138156B1 (en) * 2000-09-26 2006-11-21 Myrick Michael L Filter design algorithm for multi-variate optical computing
AU2002216615A1 (en) 2000-10-05 2002-04-15 Opnetics Corporation In-situ thickness and refractive index monitoring and control system for thin film deposition
US6804060B1 (en) 2001-09-28 2004-10-12 Fibera, Inc. Interference filter fabrication
US7163901B2 (en) 2002-03-13 2007-01-16 Varian Semiconductor Equipment Associates, Inc. Methods for forming thin film layers by simultaneous doping and sintering
TWI314762B (en) 2002-08-13 2009-09-11 Lam Res Corp Method for controlling a recess etch process
US6965431B2 (en) 2003-02-28 2005-11-15 Ut-Battelle, Llc Integrated tunable optical sensor (ITOS) system
EP1515158B1 (en) 2003-09-09 2013-07-17 Esaote S.p.A. Ultrasound imaging method combined with the presence of contrast media in the body under examination
US7753847B2 (en) 2003-10-03 2010-07-13 Mayo Foundation For Medical Education And Research Ultrasound vibrometry
WO2005093904A1 (en) 2004-01-14 2005-10-06 The Penn State Research Foundation Reconfigurable frequency selective surfaces for remote sensing of chemical and biological agents
WO2005079385A2 (en) 2004-02-13 2005-09-01 Coronado Technology Group, L.L.C. Fabrication of narrow-band thin-film optical filters
JP2008512730A (ja) 2004-09-13 2008-04-24 ユニヴァーシティー オブ サウスカロライナ 薄膜干渉フィルタ及び干渉フィルタの堆積工程制御のためのブートストラップ法
US7697141B2 (en) 2004-12-09 2010-04-13 Halliburton Energy Services, Inc. In situ optical computation fluid analysis system and method
US7828929B2 (en) 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
US7224540B2 (en) 2005-01-31 2007-05-29 Datalogic Scanning, Inc. Extended depth of field imaging system using chromatic aberration
WO2007015115A1 (en) 2005-08-01 2007-02-08 Stergios Logothetidis In-situ and real-time determination of the thickness, optical properties and quality of transparent coatings
WO2007062202A1 (en) 2005-11-28 2007-05-31 University Of South Carolina Novel multivariate optical elements for optical analysis system
WO2007064579A1 (en) 2005-11-28 2007-06-07 University Of South Carolina Optical analysis system and elements to isolate spectral region
US8164061B2 (en) 2006-09-13 2012-04-24 Delphi Technologies, Inc. Method and apparatus for a universal infrared analyzer
US7777870B2 (en) 2006-12-12 2010-08-17 Evident Technologies, Inc. Method and system for the recognition of an optical signal
US8106850B1 (en) 2006-12-21 2012-01-31 Hrl Laboratories, Llc Adaptive spectral surface
US8352205B2 (en) 2007-02-28 2013-01-08 Halliburton Energy Services, Inc. Multivariate optical elements for nonlinear calibration
FR2913210B1 (fr) 2007-03-02 2009-05-29 Sidel Participations Perfectionnements a la chauffe des matieres plastiques par rayonnement infrarouge
US8699027B2 (en) 2007-07-27 2014-04-15 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
US7792644B2 (en) 2007-11-13 2010-09-07 Battelle Energy Alliance, Llc Methods, computer readable media, and graphical user interfaces for analysis of frequency selective surfaces
US20090182693A1 (en) 2008-01-14 2009-07-16 Halliburton Energy Services, Inc. Determining stimulation design parameters using artificial neural networks optimized with a genetic algorithm
US7835005B2 (en) * 2008-02-21 2010-11-16 Thermo Fisher Scientific Inc. Gas analyzer system
US20100004773A1 (en) * 2008-07-01 2010-01-07 Phystech, Inc Apparatus for characterization of thin film properties and method of using the same
US8216161B2 (en) 2008-08-06 2012-07-10 Mirabilis Medica Inc. Optimization and feedback control of HIFU power deposition through the frequency analysis of backscattered HIFU signals
US8252112B2 (en) 2008-09-12 2012-08-28 Ovshinsky Innovation, Llc High speed thin film deposition via pre-selected intermediate
US8125641B2 (en) * 2009-03-27 2012-02-28 N&K Technology, Inc. Method and apparatus for phase-compensated sensitivity-enhanced spectroscopy (PCSES)
US8054212B1 (en) 2009-03-27 2011-11-08 The Boeing Company Multi-band receiver using harmonic synchronous detection
GB2491307A (en) 2010-02-16 2012-11-28 Sky Holdings Company Llc Systems, methods and apparatuses for remote device detection
US20120150451A1 (en) * 2010-12-13 2012-06-14 Halliburton Energy Services, Inc. Optical Computation Fluid Analysis System and Method
GB2501641B (en) 2011-02-11 2018-02-21 Halliburton Energy Services Inc Method for fabrication of a multivariate optical element
US20130035262A1 (en) 2011-08-05 2013-02-07 Freese Robert P Integrated Computational Element Analytical Methods for Microorganisms Treated with a Pulsed Light Source
US9441149B2 (en) 2011-08-05 2016-09-13 Halliburton Energy Services, Inc. Methods for monitoring the formation and transport of a treatment fluid using opticoanalytical devices
US20130032338A1 (en) 2011-08-05 2013-02-07 Halliburton Energy Services, Inc. Methods for Fluid Monitoring in a Subterranean Formation Using One or More Integrated Computational Elements
EP2761272A4 (en) * 2011-09-27 2015-07-29 Kla Tencor Corp THIN-LAYER IDENTIFICATION AND ERROR DETECTION WITH HIGH THROUGHPUT
US9013698B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US9702811B2 (en) 2012-04-26 2017-07-11 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance using integrated computational elements
US8879053B2 (en) 2012-04-26 2014-11-04 Halliburton Energy Services, Inc. Devices having an integrated computational element and a proximal interferent monitor and methods for determining a characteristic of a sample therewith
US8780352B2 (en) * 2012-04-26 2014-07-15 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8912477B2 (en) 2012-04-26 2014-12-16 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9383307B2 (en) 2012-04-26 2016-07-05 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9658149B2 (en) 2012-04-26 2017-05-23 Halliburton Energy Services, Inc. Devices having one or more integrated computational elements and methods for determining a characteristic of a sample by computationally combining signals produced therewith
US9019501B2 (en) 2012-04-26 2015-04-28 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9013702B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US8823939B2 (en) 2012-04-26 2014-09-02 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9080943B2 (en) 2012-04-26 2015-07-14 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8941046B2 (en) 2012-04-26 2015-01-27 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance

Also Published As

Publication number Publication date
MX359911B (es) 2018-10-16
WO2015099711A1 (en) 2015-07-02
EP2926116A4 (en) 2016-11-30
US9395721B2 (en) 2016-07-19
US20160018818A1 (en) 2016-01-21
BR112016011057A8 (pt) 2020-04-22
EP2926116A1 (en) 2015-10-07

Similar Documents

Publication Publication Date Title
MX359911B (es) Monitorizacion in situ de la fabricacion de elementos computacionales integrados.
WO2013019663A3 (en) Process mapping of melt pool geometry
WO2012148520A3 (en) Tolerance evaluation with reduced measured points
WO2013096817A3 (en) A testing cartridge comprising electrochemical sensors and an optical microarray
WO2014127290A3 (en) Methods for predicting risk of interstitial pneumonia
WO2014130026A8 (en) Optical design techniques for providing favorable fabrication characteristics
WO2013083781A3 (en) Biomarkers and test panels useful in systemic inflammatory conditions
MX371169B (es) Predicción de múltiples en datos de levantamiento.
JP2016127643A5 (es)
MX361644B (es) Monitorización en tiempo real de la fabricación de elementos computacionales integrados.
SA516371599B1 (ar) طريقة لتصميم قلب عنصر حاسوبي مدمج
DK3157951T3 (da) Humaniserede anti-ige-antistoffer, der tværbinder cd23 på b-lymfocytter, men ikke sensibiliserer mastceller
MX360943B (es) Fabricación de elementos informáticos integrados mediante el uso de un soporte de sustrato con forma que coincida con el perfil de la pluma de deposición.
EP2939055A4 (en) FLUID ANALYSIS SYSTEM USING ATOMIC LAYER DISTINCTION SHAPED INTEGRATED CALCULATING ELEMENT
MX2015014124A (es) Optimizacion de sensor optico e implementacion de sistema con estructura de capa simplificada.
MX2016006627A (es) Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.
MX362272B (es) Ajuste de la fabricacion de elementos computacionales integrados.
FR2977944B1 (fr) Dispositif electronique et son procede de fabrication
MX2015005717A (es) Evaluacion del rendimiento y la optimizacion del diseño de elementos computacionales integrados.
MX2016006823A (es) Monitorizacion optica in situ de la fabricacion de elementos computacionales integrados.
SA516380575B1 (ar) طريقة لتصميم تقنيات عنصر حسابي مدمج
MX2016006700A (es) Fabricacion de capas criticas de elementos computacionales integrados.
MX359196B (es) Espectroscopía in situ para el monitoreo de la fabricación de elementos computacionales integrados.
MX346481B (es) Técnicas de diseño óptico para dispositivos informáticos ópticos resistentes al entorno.
FR3012218B1 (fr) Procede d’evaluation de l’endommagement d’un materiau composite recouvert d’une peinture, mesurant sur le spectrogramme deux criteres distincts

Legal Events

Date Code Title Description
FG Grant or registration