MX359911B - Monitorizacion in situ de la fabricacion de elementos computacionales integrados. - Google Patents
Monitorizacion in situ de la fabricacion de elementos computacionales integrados.Info
- Publication number
- MX359911B MX359911B MX2016005565A MX2016005565A MX359911B MX 359911 B MX359911 B MX 359911B MX 2016005565 A MX2016005565 A MX 2016005565A MX 2016005565 A MX2016005565 A MX 2016005565A MX 359911 B MX359911 B MX 359911B
- Authority
- MX
- Mexico
- Prior art keywords
- ice
- design
- layers
- integrated computational
- fabrication
- Prior art date
Links
- 238000011065 in-situ storage Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000012544 monitoring process Methods 0.000 title 1
- 238000012625 in-situ measurement Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/8422—Investigating thin films, e.g. matrix isolation method
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
- G01N2021/213—Spectrometric ellipsometry
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/32—Operator till task planning
- G05B2219/32368—Quality control
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Combustion & Propulsion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Mathematical Physics (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Quality & Reliability (AREA)
- Automation & Control Theory (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Toxicology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Las técnicas incluyen recibir un diseño de un elemento computacional integrado (ICE), el cual diseño de ICE incluye descripción de un sustrato y múltiples capas, sus espesores e índices de refracción complejos diana respectivos, los cuales índices de refracción complejos de capas adyacentes son diferentes entre sí, y donde un ICE hipotético fabricado de acuerdo con el diseño de ICE está relacionado con una característica de una muestra; formar al menos algunas de las múltiples capas del ICE de acuerdo con el diseño de ICE; realizar al menos dos tipos diferentes de mediciones in situ; predecir, utilizando los resultados de los al menos dos tipos diferentes de mediciones in situ, el rendimiento del ICE con respecto al diseño de ICE; y ajustar la formación de las capas que aún no se han formado, al menos en parte, mediante la actualización del diseño de ICE en función del rendimiento previsto.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2013/077690 WO2015099711A1 (en) | 2013-12-24 | 2013-12-24 | In-situ monitoring of fabrication of integrated computational elements |
Publications (2)
Publication Number | Publication Date |
---|---|
MX2016005565A MX2016005565A (es) | 2016-12-09 |
MX359911B true MX359911B (es) | 2018-10-16 |
Family
ID=53479377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2016005565A MX359911B (es) | 2013-12-24 | 2013-12-24 | Monitorizacion in situ de la fabricacion de elementos computacionales integrados. |
Country Status (5)
Country | Link |
---|---|
US (1) | US9395721B2 (es) |
EP (1) | EP2926116A4 (es) |
BR (1) | BR112016011057A8 (es) |
MX (1) | MX359911B (es) |
WO (1) | WO2015099711A1 (es) |
Families Citing this family (7)
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MX364775B (es) * | 2013-12-20 | 2019-05-06 | Halliburton Energy Services Inc | Sistema de medición óptica de películas finas en paralelo para analizar multianalitos. |
WO2015163875A1 (en) * | 2014-04-24 | 2015-10-29 | Halliburton Energy Services, Inc. | Engineering the optical properties of an integrated computational element by ion implantation |
US9772294B2 (en) * | 2014-10-28 | 2017-09-26 | Halliburton Energy Services, Inc. | Identification of material type and condition in a dry bulk material storage bin |
US11112238B2 (en) | 2015-07-07 | 2021-09-07 | Quality Vision International Inc. | Method and apparatus for scanning object |
WO2018063229A1 (en) * | 2016-09-29 | 2018-04-05 | Halliburton Energy Services, Inc. | Device and method for optical analysis using multiple integrated computational elements |
US20210063314A1 (en) * | 2018-05-17 | 2021-03-04 | Halliburton Energy Services, Inc. | Use of a backside roughened sample for multiple optical measurements to improve thin film fabrications |
US11717910B2 (en) | 2020-11-03 | 2023-08-08 | General Electric Company | Monitoring operation of electron beam additive manufacturing with piezoelectric crystals |
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-
2013
- 2013-12-24 US US14/397,818 patent/US9395721B2/en active Active
- 2013-12-24 EP EP13884378.4A patent/EP2926116A4/en not_active Withdrawn
- 2013-12-24 WO PCT/US2013/077690 patent/WO2015099711A1/en active Application Filing
- 2013-12-24 BR BR112016011057A patent/BR112016011057A8/pt not_active Application Discontinuation
- 2013-12-24 MX MX2016005565A patent/MX359911B/es active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
MX2016005565A (es) | 2016-12-09 |
WO2015099711A1 (en) | 2015-07-02 |
EP2926116A1 (en) | 2015-10-07 |
US9395721B2 (en) | 2016-07-19 |
BR112016011057A8 (pt) | 2020-04-22 |
EP2926116A4 (en) | 2016-11-30 |
US20160018818A1 (en) | 2016-01-21 |
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