AU2002216615A1 - In-situ thickness and refractive index monitoring and control system for thin film deposition - Google Patents

In-situ thickness and refractive index monitoring and control system for thin film deposition

Info

Publication number
AU2002216615A1
AU2002216615A1 AU2002216615A AU1661502A AU2002216615A1 AU 2002216615 A1 AU2002216615 A1 AU 2002216615A1 AU 2002216615 A AU2002216615 A AU 2002216615A AU 1661502 A AU1661502 A AU 1661502A AU 2002216615 A1 AU2002216615 A1 AU 2002216615A1
Authority
AU
Australia
Prior art keywords
thin film
control system
refractive index
film deposition
index monitoring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002216615A
Inventor
Jing Pan
Jian Zhang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OPNETICS Corp
Original Assignee
OPNETICS CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OPNETICS CORP filed Critical OPNETICS CORP
Publication of AU2002216615A1 publication Critical patent/AU2002216615A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/4133—Refractometers, e.g. differential
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/59—Transmissivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/39—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using tunable lasers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
AU2002216615A 2000-10-05 2001-10-04 In-situ thickness and refractive index monitoring and control system for thin film deposition Abandoned AU2002216615A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23799900P 2000-10-05 2000-10-05
US60/237,999 2000-10-05
PCT/US2001/031026 WO2002029358A1 (en) 2000-10-05 2001-10-04 In-situ thickness and refractive index monitoring and control system for thin film deposition

Publications (1)

Publication Number Publication Date
AU2002216615A1 true AU2002216615A1 (en) 2002-04-15

Family

ID=22896064

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002216615A Abandoned AU2002216615A1 (en) 2000-10-05 2001-10-04 In-situ thickness and refractive index monitoring and control system for thin film deposition

Country Status (4)

Country Link
US (1) US6646753B2 (en)
EP (1) EP1322908A1 (en)
AU (1) AU2002216615A1 (en)
WO (1) WO2002029358A1 (en)

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DE10150131C2 (en) * 2001-10-11 2003-10-09 Bruker Biospin Ag Faellanden RF receiver coil arrangement for an NMR resonator with macroscopically homogeneous distribution of the conductor structures
KR20030054157A (en) * 2001-12-24 2003-07-02 엘지엔시스(주) Sensing apparatus for thickness of transit body
US20040046969A1 (en) * 2002-09-10 2004-03-11 Honeywell International Inc. System and method for monitoring thin film deposition on optical substrates
US6879744B2 (en) * 2003-01-07 2005-04-12 Georgi A. Atanasov Optical monitoring of thin film deposition
WO2005008272A2 (en) * 2003-07-11 2005-01-27 Blue View Technologies, Inc. Systems and methods implementing frequency-steered acoutic arrays for 2d and 3d imaging
US9206500B2 (en) * 2003-08-11 2015-12-08 Boris Druz Method and apparatus for surface processing of a substrate using an energetic particle beam
US20050220984A1 (en) * 2004-04-02 2005-10-06 Applied Materials Inc., A Delaware Corporation Method and system for control of processing conditions in plasma processing systems
WO2006017782A1 (en) * 2004-08-05 2006-02-16 Acton Reserch Corporation A self-referencing instrument and method thereof for measuring electromagnetic properties
US20060054494A1 (en) * 2004-09-16 2006-03-16 Veeco Instruments Inc. Physical vapor deposition apparatus for depositing thin multilayer films and methods of depositing such films
CN1320352C (en) * 2004-11-18 2007-06-06 上海交通大学 Method for simultaneously measuring refractive index and thickness of polymer film using precision reflectometer
US7277819B2 (en) * 2005-10-31 2007-10-02 Eastman Kodak Company Measuring layer thickness or composition changes
US8248606B1 (en) * 2008-09-15 2012-08-21 J.A. Woollam Co., Inc. Sample mapping in environmental chamber
WO2015005905A1 (en) 2013-07-09 2015-01-15 Halliburton Energy Services, Inc. Integrated computational elements with laterally-distributed spectral filters
BR112015029784A2 (en) 2013-07-09 2017-07-25 Halliburton Energy Services Inc system, measuring tool and method
US9395721B2 (en) 2013-12-24 2016-07-19 Halliburton Energy Services, Inc. In-situ monitoring of fabrication of integrated computational elements
WO2015099707A1 (en) 2013-12-24 2015-07-02 Halliburton Energy Services, Inc. Fabrication of critical layers of integrated computational elements
WO2015099709A1 (en) 2013-12-24 2015-07-02 Halliburton Energy Services, Inc. Real-time monitoring of fabrication of integrated computational elements
EP2909763A4 (en) 2013-12-24 2015-12-23 Halliburton Energy Services Inc Adjusting fabrication of integrated computational elements
US11274365B2 (en) 2013-12-30 2022-03-15 Halliburton Energy Services, Inc. Determining temperature dependence of complex refractive indices of layer materials during fabrication of integrated computational elements
BR112016011904A2 (en) 2013-12-31 2017-08-08 Halliburton Energy Services Inc MANUFACTURE SYSTEM OF AN INTEGRATED COMPUTATIONAL ELEMENT
EP2946197A4 (en) 2014-02-14 2016-12-21 Halliburton Energy Services Inc In-situ spectroscopy for monitoring fabrication of integrated computational elements
EP2943774A4 (en) 2014-03-21 2016-05-11 Halliburton Energy Services Inc Monolithic band-limited integrated computational elements
US9708908B2 (en) 2014-06-13 2017-07-18 Halliburton Energy Services, Inc. Integrated computational element with multiple frequency selective surfaces
WO2016003401A1 (en) 2014-06-30 2016-01-07 Halliburton Energy Services, Inc. Deposition of integrated computational elements (ice) using a translation stage
WO2020142451A1 (en) * 2018-12-31 2020-07-09 Lam Research Corporation Monitoring process wall depositions and coatings
DE102020109742B4 (en) * 2020-04-07 2022-02-03 Hochschule Düsseldorf Körperschaft des öffentlichen Rechts Method and device for determining frequency-dependent refractive indices

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4878755A (en) 1986-03-29 1989-11-07 Leybold Aktiengesellschaft Process and device for measuring the optical properties of thin layers
US4748329A (en) 1987-02-17 1988-05-31 Canadian Patents And Development Ltd. Method for on-line thickness monitoring of a transparent film
JPH0518896A (en) 1990-02-22 1993-01-26 Heinrich Hertz Inst Nachrichtentech Berlin Gmbh Measuring method for detecting small quantity of extinction
JPH06222005A (en) * 1993-01-28 1994-08-12 Seiko Instr Inc Icp emission spectroscopic analysis
JP3491337B2 (en) 1994-05-13 2004-01-26 株式会社デンソー Semiconductor thickness non-contact measuring device
US5798837A (en) * 1997-07-11 1998-08-25 Therma-Wave, Inc. Thin film optical measurement system and method with calibrating ellipsometer
US6039806A (en) 1998-04-20 2000-03-21 E-Tek Dynamics, Inc. Precision thickness optical coating system and method of operation thereof

Also Published As

Publication number Publication date
US6646753B2 (en) 2003-11-11
US20020075486A1 (en) 2002-06-20
EP1322908A1 (en) 2003-07-02
WO2002029358A1 (en) 2002-04-11
WO2002029358A9 (en) 2002-10-17

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