AU2002223780A1 - Method and device for depositing thin films - Google Patents

Method and device for depositing thin films

Info

Publication number
AU2002223780A1
AU2002223780A1 AU2002223780A AU2378002A AU2002223780A1 AU 2002223780 A1 AU2002223780 A1 AU 2002223780A1 AU 2002223780 A AU2002223780 A AU 2002223780A AU 2378002 A AU2378002 A AU 2378002A AU 2002223780 A1 AU2002223780 A1 AU 2002223780A1
Authority
AU
Australia
Prior art keywords
thin films
depositing thin
depositing
films
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002223780A
Inventor
Catherine Grezes-Besset
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HIGHWAVE OPTICAL TECHNOLOGIES MARSEILLE
Original Assignee
Highwave Optical Technologies SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Highwave Optical Technologies SA filed Critical Highwave Optical Technologies SA
Publication of AU2002223780A1 publication Critical patent/AU2002223780A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Filters (AREA)
AU2002223780A 2000-11-16 2001-11-08 Method and device for depositing thin films Abandoned AU2002223780A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR0014775A FR2816714B1 (en) 2000-11-16 2000-11-16 METHOD AND DEVICE FOR DEPOSITING THIN FILMS
FR0014775 2000-11-16
PCT/FR2001/003461 WO2002040737A1 (en) 2000-11-16 2001-11-08 Method and device for depositing thin films

Publications (1)

Publication Number Publication Date
AU2002223780A1 true AU2002223780A1 (en) 2002-05-27

Family

ID=8856534

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002223780A Abandoned AU2002223780A1 (en) 2000-11-16 2001-11-08 Method and device for depositing thin films

Country Status (5)

Country Link
US (1) US6620249B2 (en)
EP (1) EP1409763B1 (en)
AU (1) AU2002223780A1 (en)
FR (1) FR2816714B1 (en)
WO (1) WO2002040737A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10256909B3 (en) * 2002-11-30 2004-07-29 Hahn-Meitner-Institut Berlin Gmbh Process for producing a chalcogenide semiconductor layer with optical in-situ process control and device for carrying out the process
DE102005008889B4 (en) * 2005-02-26 2016-07-07 Leybold Optics Gmbh Optical monitoring system for coating processes
DE102010023517A1 (en) * 2010-06-11 2011-12-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Coating system and method for coating a substrate with simultaneous layer monitoring
DE102011100055B4 (en) * 2011-04-29 2015-05-13 Centrotherm Photovoltaics Ag Apparatus and method for thermal treatment of substrates and apparatus for supporting substrates
CN112996948A (en) * 2018-12-14 2021-06-18 应用材料公司 Measuring assembly for measuring deposition rate and method thereof
CN111197155A (en) * 2020-03-24 2020-05-26 常州市乐萌压力容器有限公司 Rotary magnetron sputtering film thickness multipoint measuring device capable of being followed and detection method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2438963A1 (en) * 1974-08-14 1976-02-26 Leybold Heraeus Gmbh & Co Kg PROCESS AND ARRANGEMENT FOR REGULATING THE STRUCTURE OF THE LAYER IN THE PRODUCTION OF OPTICALLY EFFECTIVE THIN LAYERS
CH584886A5 (en) * 1974-10-09 1977-02-15 Balzers Patent Beteilig Ag
WO1980000504A1 (en) * 1978-08-18 1980-03-20 Nat Res Dev Control of deposition of thin films
JPS5576064A (en) * 1978-11-30 1980-06-07 Fujitsu Ltd Monitor unit for continuous formation of multi-layer coating
JPS58128728A (en) * 1982-01-28 1983-08-01 Toshiba Mach Co Ltd Semiconductor vapor growth apparatus
US4582431A (en) * 1983-10-11 1986-04-15 Honeywell Inc. Optical monitor for direct thickness control of transparent films
JPH01239028A (en) * 1988-03-18 1989-09-25 Hitachi Cable Ltd Glass film deposition unit
US5656138A (en) * 1991-06-18 1997-08-12 The Optical Corporation Of America Very high vacuum magnetron sputtering method and apparatus for precision optical coatings
US5354575A (en) * 1993-04-16 1994-10-11 University Of Maryland Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers
JP3405562B2 (en) * 1993-07-15 2003-05-12 松下電器産業株式会社 Multilayer film forming apparatus, optical characteristic measuring method and film forming method
US5425964A (en) 1994-07-22 1995-06-20 Rockwell International Corporation Deposition of multiple layer thin films using a broadband spectral monitor
EP1038996B1 (en) * 1998-09-11 2007-09-05 Japan Science and Technology Agency Combinatorial molecular layer epitaxy device
JP2002022936A (en) * 2000-07-03 2002-01-23 Japan Aviation Electronics Industry Ltd Method and apparatus for forming film of optical multilayered film filter, and optical thickness gage
US6338775B1 (en) * 2000-08-07 2002-01-15 Advanced Ion Beam Technology, Inc. Apparatus and method for uniformly depositing thin films over substrates
US6547939B2 (en) * 2001-03-29 2003-04-15 Super Light Wave Corp. Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate
US6513451B2 (en) * 2001-04-20 2003-02-04 Eastman Kodak Company Controlling the thickness of an organic layer in an organic light-emiting device

Also Published As

Publication number Publication date
EP1409763A1 (en) 2004-04-21
WO2002040737A1 (en) 2002-05-23
US20020068126A1 (en) 2002-06-06
FR2816714A1 (en) 2002-05-17
US6620249B2 (en) 2003-09-16
EP1409763B1 (en) 2011-09-28
FR2816714B1 (en) 2003-10-10

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