MX2016005757A - Ajuste de la fabricacion de elementos computacionales integrados. - Google Patents

Ajuste de la fabricacion de elementos computacionales integrados.

Info

Publication number
MX2016005757A
MX2016005757A MX2016005757A MX2016005757A MX2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A MX 2016005757 A MX2016005757 A MX 2016005757A
Authority
MX
Mexico
Prior art keywords
ice
design
performance
layers
target
Prior art date
Application number
MX2016005757A
Other languages
English (en)
Other versions
MX362272B (es
Inventor
michael jones Christopher
l perkins David
Paul Freese Robert
Neal Gardner Richard
M Price James
B Nayak Aditya
Original Assignee
Halliburton Energy Services Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Halliburton Energy Services Inc filed Critical Halliburton Energy Services Inc
Publication of MX2016005757A publication Critical patent/MX2016005757A/es
Publication of MX362272B publication Critical patent/MX362272B/es

Links

Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level
    • G06F30/398—Design verification or optimisation, e.g. using design rule check [DRC], layout versus schematics [LVS] or finite element methods [FEM]
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00—Computer-aided design [CAD]
    • G06F30/30—Circuit design
    • G06F30/39—Circuit design at the physical level
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N2021/8411—Application to online plant, process monitoring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/285—Interference filters comprising deposited thin solid films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Laminated Bodies (AREA)

Abstract

Las técnicas incluyen recibir un diseño de un elemento computacional integrado (ICE) que incluye (1) descripción de un sustrato y múltiples capas, sus espesores e índices de refracción diana respectivos, donde los índices de refracción de las capas adyacentes son diferentes entre sí, y donde un ICE hipotético fabricado según el diana de ICE está relacionado con una característica de una muestra, y (2) indicación de un rendimiento de ICE diana; formar una o más de las capas de un ICE en función del diseño de ICE; en respuesta a la determinación de que un rendimiento de ICE no cumple con el rendimiento diana si el ICE que tiene las capas formadas se completa en base al diseño de ICE recibido, actualizar el diseño de ICE a una nueva cantidad total de capas y nuevos espesores de capa diana, de manera que el rendimiento del ICE terminado en base al diseño de ICE actualizado cumple con el rendimiento diana; y formar algunas de las capas posteriores según el diseño de ICE actualizado.
MX2016005757A 2013-12-24 2013-12-24 Ajuste de la fabricacion de elementos computacionales integrados. MX362272B (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2013/077683 WO2015099706A1 (en) 2013-12-24 2013-12-24 Adjusting fabrication of integrated computational elements

Publications (2)

Publication Number Publication Date
MX2016005757A true MX2016005757A (es) 2017-05-11
MX362272B MX362272B (es) 2019-01-10

Family

ID=53479372

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2016005757A MX362272B (es) 2013-12-24 2013-12-24 Ajuste de la fabricacion de elementos computacionales integrados.

Country Status (4)

Country Link
US (1) US9495505B2 (es)
EP (1) EP2909763A4 (es)
MX (1) MX362272B (es)
WO (1) WO2015099706A1 (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MX364243B (es) * 2013-09-03 2019-04-17 Halliburton Energy Services Inc Elementos informaticos integrados simulados y sus aplicaciones.
CA2961338C (en) * 2014-10-28 2019-11-05 Halliburton Energy Services, Inc. Identification of material type and condition in a dry bulk material storage bin
US10317337B2 (en) 2016-05-27 2019-06-11 Halliburton Energy Services, Inc. Reverse design technique for optical processing elements
US11717910B2 (en) 2020-11-03 2023-08-08 General Electric Company Monitoring operation of electron beam additive manufacturing with piezoelectric crystals

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5075550A (en) 1990-07-12 1991-12-24 Amoco Corporation Infrared detector for hydrogen fluoride gas
JPH06214169A (ja) 1992-06-08 1994-08-05 Texas Instr Inc <Ti> 制御可能な光学的周期的表面フィルタ
US5399229A (en) 1993-05-13 1995-03-21 Texas Instruments Incorporated System and method for monitoring and evaluating semiconductor wafer fabrication
US5453716A (en) 1993-11-22 1995-09-26 Chrysler Corporation Adjustable clip detection system
US5537479A (en) 1994-04-29 1996-07-16 Miller And Kreisel Sound Corp. Dual-driver bass speaker with acoustic reduction of out-of-phase and electronic reduction of in-phase distortion harmonics
DE19640132B4 (de) 1996-09-28 2015-06-03 Volkswagen Ag Verfahren zur automatischen Begrenzung von Verzerrungen an Audio-Geräten und Schaltungsanordnung zur Durchführung des Verfahrens
US6198531B1 (en) 1997-07-11 2001-03-06 University Of South Carolina Optical computational system
US6905578B1 (en) 1998-04-27 2005-06-14 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
US6213250B1 (en) 1998-09-25 2001-04-10 Dresser Industries, Inc. Transducer for acoustic logging
US6529276B1 (en) 1999-04-06 2003-03-04 University Of South Carolina Optical computational system
US6163259A (en) 1999-06-04 2000-12-19 Research Electronics International Pulse transmitting non-linear junction detector
US6078389A (en) 1999-08-18 2000-06-20 Zetter; Mark S. Multivariate spectroscopy with optical computation
US7138156B1 (en) * 2000-09-26 2006-11-21 Myrick Michael L Filter design algorithm for multi-variate optical computing
US6646753B2 (en) 2000-10-05 2003-11-11 Unaxis, Usa, Inc. In-situ thickness and refractive index monitoring and control system for thin film deposition
US6804060B1 (en) 2001-09-28 2004-10-12 Fibera, Inc. Interference filter fabrication
US7163901B2 (en) 2002-03-13 2007-01-16 Varian Semiconductor Equipment Associates, Inc. Methods for forming thin film layers by simultaneous doping and sintering
TWI314762B (en) 2002-08-13 2009-09-11 Lam Res Corp Method for controlling a recess etch process
US6965431B2 (en) 2003-02-28 2005-11-15 Ut-Battelle, Llc Integrated tunable optical sensor (ITOS) system
EP1515158B1 (en) 2003-09-09 2013-07-17 Esaote S.p.A. Ultrasound imaging method combined with the presence of contrast media in the body under examination
US7753847B2 (en) 2003-10-03 2010-07-13 Mayo Foundation For Medical Education And Research Ultrasound vibrometry
US7679563B2 (en) 2004-01-14 2010-03-16 The Penn State Research Foundation Reconfigurable frequency selective surfaces for remote sensing of chemical and biological agents
WO2005079385A2 (en) 2004-02-13 2005-09-01 Coronado Technology Group, L.L.C. Fabrication of narrow-band thin-film optical filters
US7317535B2 (en) 2004-09-10 2008-01-08 National Research Council Of Canada Wavelength dispersive fourier transform spectrometer
EP1789752A4 (en) 2004-09-13 2009-11-04 Univ South Carolina THIN-FILTER INTERFERENTIAL FILTER AND BOOTSTRAP METHOD OF CONTROLLING THE THIN FILM INTERFERENTIAL FILTER DEPOSITION PROCESS
US7697141B2 (en) 2004-12-09 2010-04-13 Halliburton Energy Services, Inc. In situ optical computation fluid analysis system and method
US7828929B2 (en) 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
WO2007015115A1 (en) 2005-08-01 2007-02-08 Stergios Logothetidis In-situ and real-time determination of the thickness, optical properties and quality of transparent coatings
US7277819B2 (en) 2005-10-31 2007-10-02 Eastman Kodak Company Measuring layer thickness or composition changes
US7911605B2 (en) 2005-11-28 2011-03-22 Halliburton Energy Services, Inc. Multivariate optical elements for optical analysis system
US7920258B2 (en) 2005-11-28 2011-04-05 Halliburton Energy Services, Inc. Optical analysis system and elements to isolate spectral region
US8164061B2 (en) 2006-09-13 2012-04-24 Delphi Technologies, Inc. Method and apparatus for a universal infrared analyzer
US7777870B2 (en) 2006-12-12 2010-08-17 Evident Technologies, Inc. Method and system for the recognition of an optical signal
US8106850B1 (en) 2006-12-21 2012-01-31 Hrl Laboratories, Llc Adaptive spectral surface
WO2008106391A1 (en) 2007-02-28 2008-09-04 University Of South Carolina Design of multivariate optical elements for nonlinear calibration
US7550749B2 (en) 2007-03-30 2009-06-23 Tel Epion Inc. Methods and processing systems for using a gas cluster ion beam to offset systematic non-uniformities in workpieces processed in a process tool
US8699027B2 (en) 2007-07-27 2014-04-15 Rudolph Technologies, Inc. Multiple measurement techniques including focused beam scatterometry for characterization of samples
US7792644B2 (en) 2007-11-13 2010-09-07 Battelle Energy Alliance, Llc Methods, computer readable media, and graphical user interfaces for analysis of frequency selective surfaces
US20090182693A1 (en) 2008-01-14 2009-07-16 Halliburton Energy Services, Inc. Determining stimulation design parameters using artificial neural networks optimized with a genetic algorithm
US8216161B2 (en) 2008-08-06 2012-07-10 Mirabilis Medica Inc. Optimization and feedback control of HIFU power deposition through the frequency analysis of backscattered HIFU signals
US8252112B2 (en) 2008-09-12 2012-08-28 Ovshinsky Innovation, Llc High speed thin film deposition via pre-selected intermediate
US8054212B1 (en) 2009-03-27 2011-11-08 The Boeing Company Multi-band receiver using harmonic synchronous detection
GB2491307A (en) 2010-02-16 2012-11-28 Sky Holdings Company Llc Systems, methods and apparatuses for remote device detection
US10094955B2 (en) * 2011-02-11 2018-10-09 Halliburton Energy Services, Inc. Method for fabrication of a multivariate optical element
US9441149B2 (en) 2011-08-05 2016-09-13 Halliburton Energy Services, Inc. Methods for monitoring the formation and transport of a treatment fluid using opticoanalytical devices
US8780352B2 (en) 2012-04-26 2014-07-15 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8912477B2 (en) 2012-04-26 2014-12-16 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8823939B2 (en) 2012-04-26 2014-09-02 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9080943B2 (en) 2012-04-26 2015-07-14 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9383307B2 (en) 2012-04-26 2016-07-05 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9013698B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US9019501B2 (en) 2012-04-26 2015-04-28 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US8879053B2 (en) 2012-04-26 2014-11-04 Halliburton Energy Services, Inc. Devices having an integrated computational element and a proximal interferent monitor and methods for determining a characteristic of a sample therewith
US9013702B2 (en) 2012-04-26 2015-04-21 Halliburton Energy Services, Inc. Imaging systems for optical computing devices
US8941046B2 (en) 2012-04-26 2015-01-27 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance
US9658149B2 (en) 2012-04-26 2017-05-23 Halliburton Energy Services, Inc. Devices having one or more integrated computational elements and methods for determining a characteristic of a sample by computationally combining signals produced therewith
US9702811B2 (en) 2012-04-26 2017-07-11 Halliburton Energy Services, Inc. Methods and devices for optically determining a characteristic of a substance using integrated computational elements
MX359718B (es) 2013-12-23 2018-10-08 Halliburton Energy Services Inc Sistemas y metodos para mejorar la fidelidad del espectro optico en elementos informaticos integrados.

Also Published As

Publication number Publication date
US9495505B2 (en) 2016-11-15
EP2909763A4 (en) 2015-12-23
US20160196380A1 (en) 2016-07-07
EP2909763A1 (en) 2015-08-26
WO2015099706A1 (en) 2015-07-02
MX362272B (es) 2019-01-10

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