MX2022011056A - Tensioactivos para productos electronicos. - Google Patents
Tensioactivos para productos electronicos.Info
- Publication number
- MX2022011056A MX2022011056A MX2022011056A MX2022011056A MX2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A MX 2022011056 A MX2022011056 A MX 2022011056A
- Authority
- MX
- Mexico
- Prior art keywords
- surfactants
- electronics products
- agents
- etchants
- formulated
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/04—Carboxylic acids or salts thereof
- C11D1/10—Amino carboxylic acids; Imino carboxylic acids; Fatty acid condensates thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C229/00—Compounds containing amino and carboxyl groups bound to the same carbon skeleton
- C07C229/02—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton
- C07C229/04—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
- C07C229/06—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton
- C07C229/10—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
- C07C229/12—Compounds containing amino and carboxyl groups bound to the same carbon skeleton having amino and carboxyl groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having only one amino and one carboxyl group bound to the carbon skeleton the nitrogen atom of the amino group being further bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings to carbon atoms of acyclic carbon skeletons
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C291/00—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00
- C07C291/02—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00 containing nitrogen-oxide bonds
- C07C291/04—Compounds containing carbon and nitrogen and having functional groups not covered by groups C07C201/00 - C07C281/00 containing nitrogen-oxide bonds containing amino-oxide bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/01—Sulfonic acids
- C07C309/02—Sulfonic acids having sulfo groups bound to acyclic carbon atoms
- C07C309/03—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton
- C07C309/13—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
- C07C309/14—Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton containing amino groups bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
- C11D3/04—Water-soluble compounds
- C11D3/042—Acids
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2068—Ethers
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/34—Organic compounds containing sulfur
- C11D3/3481—Organic compounds containing sulfur containing sulfur in a heterocyclic ring, e.g. sultones or sulfolanes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/38—Alkaline compositions for etching refractory metals
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
- G03F7/327—Non-aqueous alkaline compositions, e.g. anhydrous quaternary ammonium salts
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Detergent Compositions (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- ing And Chemical Polishing (AREA)
Abstract
a presente invención se refiere a agentes pre-texturizantes, agentes de grabado y agentes decapantes fotorresistentes que pueden formularse para incluir uno o más tensioactivos, de una o más clases de tensioactivos, tales como derivados de aminoácidos que tienen propiedades tensioactivas.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202062988175P | 2020-03-11 | 2020-03-11 | |
| PCT/US2021/021595 WO2021183581A1 (en) | 2020-03-11 | 2021-03-09 | Surfactants for electronics products |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2022011056A true MX2022011056A (es) | 2022-12-06 |
Family
ID=75278382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2022011056A MX2022011056A (es) | 2020-03-11 | 2021-03-09 | Tensioactivos para productos electronicos. |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US12460131B2 (es) |
| EP (1) | EP4118165A1 (es) |
| JP (1) | JP7465366B2 (es) |
| KR (1) | KR102867891B1 (es) |
| CN (1) | CN115461429A (es) |
| AU (2) | AU2021234274B9 (es) |
| CA (1) | CA3170088A1 (es) |
| IL (1) | IL296231A (es) |
| MX (1) | MX2022011056A (es) |
| NZ (1) | NZ793239A (es) |
| WO (1) | WO2021183581A1 (es) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI786519B (zh) | 2020-01-29 | 2022-12-11 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI856233B (zh) | 2020-01-29 | 2024-09-21 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| UA129170C2 (uk) | 2020-03-11 | 2025-01-29 | Адвансікс Резінс Енд Чемікалс Ллс | Поверхнево-активні речовини для особистої гігієни та косметичної продукції |
| US12071600B2 (en) | 2020-03-11 | 2024-08-27 | Advansix Resins & Chemicals Llc | Surfactants for cleaning products |
| CA3261735A1 (en) | 2020-03-11 | 2025-04-02 | Advansix Resins & Chemicals Llc | Surfactants for inks, paints, and adhesives |
| MX2022011122A (es) | 2020-03-11 | 2022-10-03 | Advansix Resins & Chemicals Llc | Tensioactivos para productos agricolas. |
| JP2023517664A (ja) | 2020-03-11 | 2023-04-26 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | 油及びガス生産のための界面活性剤 |
| WO2022015674A2 (en) * | 2020-07-13 | 2022-01-20 | Advansix Resins & Chemicals Llc | Branched amino acid surfactants for inks, paints, and adhesives |
Family Cites Families (68)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3213500A (en) | 1963-11-12 | 1965-10-26 | Master Mold & Die Company | Fastener |
| GB1352322A (en) | 1970-04-06 | 1974-05-08 | Ft Products Ltd | Fastener |
| JPS5138691B2 (es) * | 1972-12-19 | 1976-10-23 | ||
| US4276460A (en) | 1979-05-29 | 1981-06-30 | Texas Instruments Incorporated | Printed circuit board switch |
| US4297769A (en) | 1979-12-26 | 1981-11-03 | Unarco Industries, Inc. | Locking stand off |
| US4502193A (en) | 1981-12-14 | 1985-03-05 | Hartwell Corporation | Stand-off fastener |
| US4548744A (en) * | 1983-07-22 | 1985-10-22 | Connor Daniel S | Ethoxylated amine oxides having clay soil removal/anti-redeposition properties useful in detergent compositions |
| JPH0717687B2 (ja) | 1985-06-04 | 1995-03-01 | ライオン株式会社 | 乳化重合用乳化剤 |
| US4664458A (en) | 1985-09-19 | 1987-05-12 | C W Industries | Printed circuit board connector |
| DE3778427D1 (de) | 1986-06-04 | 1992-05-27 | Fujitsu Ltd | Magnetplattenvorrichtung. |
| GB2204740B (en) | 1987-05-01 | 1990-11-14 | Otehall Limited | Electrical components |
| DE3939746C2 (de) | 1989-12-01 | 1998-08-20 | Itt Cannon Gmbh | Stift zum verrastbaren Befestigen in einer Bohrung einer Leiterplatte oder dgl. |
| JPH04349284A (ja) | 1991-03-14 | 1992-12-03 | Mitsubishi Electric Corp | 磁気ディスク装置 |
| US5563111A (en) | 1993-08-03 | 1996-10-08 | Kao Corporation | Agricultural chemical composition comprising amine surfactants with at least one ester or amide linkage |
| JPH087556A (ja) | 1994-06-24 | 1996-01-12 | Toshiba Corp | 磁気記録装置 |
| US5580203A (en) | 1994-12-21 | 1996-12-03 | General Instrument Corporation Of Delaware | Resilient snap fitting retainer for printed circuit board mounting or the like |
| DE19525821A1 (de) | 1995-07-15 | 1997-01-16 | Wella Ag | Haarbehandlungsmittel sowie Verfahren zu dessen Herstellung |
| DE19609679C2 (de) | 1996-03-12 | 2000-09-07 | Siemens Ag | Verbundteil |
| JP3750182B2 (ja) | 1996-03-28 | 2006-03-01 | 株式会社エンプラス | 電気部品用ソケット |
| DE19631685A1 (de) | 1996-08-06 | 1998-02-12 | Wella Ag | Hydrolytisch spaltbare Wirkstoffderivate, diese enthaltene Haarbehandlungsmittel und Verfahren zum Behandeln von Haaren |
| US5706559A (en) | 1996-10-18 | 1998-01-13 | Eaton Corporation | Leaf spring tip insert |
| DE29622184U1 (de) | 1996-12-20 | 1997-02-27 | Siemens AG, 80333 München | Einrichtung zur Halterung einer PCMCIA-Card |
| US5958894A (en) | 1997-04-04 | 1999-09-28 | Megabios Corporation | Amphiphilic biguanide derivatives |
| CZ295797B6 (cs) | 1997-04-04 | 2005-11-16 | Bochemie, S.R.O. | Sloučeniny na bázi derivátů omega-aminokyselin, způsob jejich výroby a jejich použití |
| JPH11233910A (ja) | 1998-02-10 | 1999-08-27 | Nec Saitama Ltd | 部品実装方法 |
| US6304986B1 (en) | 1999-03-12 | 2001-10-16 | Iomega Corporation | Method and apparatus for inspecting recording medium for defects |
| US6114757A (en) | 1999-09-27 | 2000-09-05 | Thomas & Betts International, Inc. | Leadless IC socket |
| US6501030B1 (en) | 1999-10-26 | 2002-12-31 | Cisco Technology, Inc. | Grounding plug for printed circuit board |
| JP4183864B2 (ja) * | 1999-10-27 | 2008-11-19 | 花王株式会社 | 第4級アンモニウム塩の製造法 |
| US6702592B1 (en) | 1999-12-03 | 2004-03-09 | Seagate Technology Llc | Printed circuit board assembly with secondary side rigid electrical pin to mate with compliant contact |
| SG112831A1 (en) | 2001-10-25 | 2005-07-28 | Seagate Technology Llc | Printed circuit cable connector attachment assembly |
| GB0203104D0 (en) * | 2002-02-11 | 2002-03-27 | Ici Plc | Surfactants and surfactant compositions |
| PT1789527E (pt) * | 2004-08-03 | 2010-01-15 | Mallinckrodt Baker Inc | Composições de limpeza para substratos microelectrónicos |
| JP2006294170A (ja) | 2005-04-13 | 2006-10-26 | Toshiba Corp | ディスク装置 |
| US7653847B1 (en) | 2005-05-05 | 2010-01-26 | Seagate Technology Llc | Methods and structure for field flawscan in a dynamically mapped mass storage device |
| WO2006138505A1 (en) * | 2005-06-16 | 2006-12-28 | Advanced Technology Materials, Inc. | Dense fluid compositions for removal of hardened photoresist, post-etch residue and/or bottom anti-reflective coating layers |
| US7646556B1 (en) | 2005-07-08 | 2010-01-12 | Seagate Technology Llc | Systems and methods for detecting flaws on a storage disk |
| US7781388B2 (en) * | 2006-05-04 | 2010-08-24 | American Sterilizer Company | Cleaning compositions for hard to remove organic material |
| CA2674622A1 (en) * | 2007-01-31 | 2008-08-07 | Basf Se | Cationic conditioning agent |
| US7880987B2 (en) | 2007-03-30 | 2011-02-01 | Seagate Technology Llc | Media servowriter/certifier |
| US8246155B2 (en) | 2007-04-18 | 2012-08-21 | Hewlett-Packard Development Company, L.P. | Fixer for a metallic inkjet ink system |
| JP2010278341A (ja) | 2009-05-29 | 2010-12-09 | Shin-Etsu Chemical Co Ltd | 貼り合わせsos基板 |
| US20110025151A1 (en) | 2009-07-28 | 2011-02-03 | Lim Pohlye | Fluid Dynamic Bearing Motor For Use With A Range Of Rotational Speed Rated Disc Drive Memory Device Products |
| EP2632893B1 (en) | 2010-10-25 | 2018-12-05 | Stepan Company | Esteramines and derivatives from natural oil metathesis |
| US8964320B1 (en) | 2010-12-09 | 2015-02-24 | Western Digital Technologies, Inc. | Disk drive defect scanning by writing consecutive data tracks and skipping tracks when reading the data tracks |
| US8599507B2 (en) | 2011-12-06 | 2013-12-03 | HGST Netherlands B.V. | Distributed field self-test for shingled magnetic recording drives |
| SG10201605172RA (en) | 2011-12-28 | 2016-08-30 | Entegris Inc | Compositions and methods for selectively etching titanium nitride |
| US9142246B1 (en) | 2014-10-10 | 2015-09-22 | Seagate Technology Llc | Apparatus and methods to reduce hard disk drive manufacturing test time |
| EP3324926B1 (en) | 2015-07-22 | 2020-07-01 | L'Oréal | Composition for cleansing keratin material containing amino acid surfactant |
| US9993408B2 (en) | 2015-09-17 | 2018-06-12 | Johnson & Johnson Consumer Inc. | Compositions comprising zwitterionic alkyl-alkanoylamides and/or alkyl alkanoates |
| CN105802600B (zh) | 2016-03-29 | 2018-11-23 | 大庆市富杰化工有限公司 | 一种注水井用降压増注剂及制备方法 |
| JP6741367B2 (ja) | 2016-04-18 | 2020-08-19 | 日本圧着端子製造株式会社 | 金具 |
| US9552846B1 (en) | 2016-04-28 | 2017-01-24 | Seagate Technology Llc | Variable speed data storage device testing system |
| WO2017199921A1 (ja) | 2016-05-20 | 2017-11-23 | 株式会社Adeka | 抗菌性組成物、それを含む化粧料組成物及び肌用シート状製品 |
| CN119194461A (zh) * | 2016-08-24 | 2024-12-27 | Ppg工业俄亥俄公司 | 用于处理金属基材的碱性组合物 |
| IT201600130571A1 (it) | 2016-12-23 | 2018-06-23 | Lamberti Spa | Inibitori di idrati di gas |
| CA3069250C (en) * | 2017-07-07 | 2022-07-19 | The Procter & Gamble Company | Cleaning compositions comprising non-alkoxylated esteramines |
| TWI778497B (zh) | 2020-01-29 | 2022-09-21 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI786518B (zh) | 2020-01-29 | 2022-12-11 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI856233B (zh) | 2020-01-29 | 2024-09-21 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI807245B (zh) | 2020-01-29 | 2023-07-01 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| TWI786519B (zh) | 2020-01-29 | 2022-12-11 | 美商艾德凡斯化學公司 | 胺基酸界面活性劑 |
| UA129170C2 (uk) | 2020-03-11 | 2025-01-29 | Адвансікс Резінс Енд Чемікалс Ллс | Поверхнево-активні речовини для особистої гігієни та косметичної продукції |
| US12071600B2 (en) | 2020-03-11 | 2024-08-27 | Advansix Resins & Chemicals Llc | Surfactants for cleaning products |
| CA3261735A1 (en) | 2020-03-11 | 2025-04-02 | Advansix Resins & Chemicals Llc | Surfactants for inks, paints, and adhesives |
| MX2022011018A (es) | 2020-03-11 | 2022-12-15 | Advansix Resins & Chemicals Llc | Tensioactivos para productos para el cuidado de la salud. |
| MX2022011122A (es) | 2020-03-11 | 2022-10-03 | Advansix Resins & Chemicals Llc | Tensioactivos para productos agricolas. |
| JP2023517664A (ja) | 2020-03-11 | 2023-04-26 | アドバンシックス・レジンズ・アンド・ケミカルズ・リミテッド・ライアビリティ・カンパニー | 油及びガス生産のための界面活性剤 |
-
2021
- 2021-03-09 MX MX2022011056A patent/MX2022011056A/es unknown
- 2021-03-09 NZ NZ793239A patent/NZ793239A/en unknown
- 2021-03-09 CA CA3170088A patent/CA3170088A1/en active Pending
- 2021-03-09 US US17/196,994 patent/US12460131B2/en active Active
- 2021-03-09 EP EP21715404.6A patent/EP4118165A1/en active Pending
- 2021-03-09 CN CN202180034693.4A patent/CN115461429A/zh active Pending
- 2021-03-09 JP JP2022554767A patent/JP7465366B2/ja active Active
- 2021-03-09 WO PCT/US2021/021595 patent/WO2021183581A1/en not_active Ceased
- 2021-03-09 KR KR1020227035063A patent/KR102867891B1/ko active Active
- 2021-03-09 IL IL296231A patent/IL296231A/en unknown
- 2021-03-09 AU AU2021234274A patent/AU2021234274B9/en active Active
-
2024
- 2024-01-24 AU AU2024200456A patent/AU2024200456B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023517670A (ja) | 2023-04-26 |
| US12460131B2 (en) | 2025-11-04 |
| IL296231A (en) | 2022-11-01 |
| AU2024200456B2 (en) | 2025-11-06 |
| AU2024200456A1 (en) | 2024-02-15 |
| CN115461429A (zh) | 2022-12-09 |
| AU2021234274A1 (en) | 2022-11-10 |
| WO2021183581A1 (en) | 2021-09-16 |
| KR20220165250A (ko) | 2022-12-14 |
| AU2021234274B2 (en) | 2024-01-04 |
| AU2021234274B9 (en) | 2024-01-18 |
| CA3170088A1 (en) | 2021-09-16 |
| JP7465366B2 (ja) | 2024-04-10 |
| EP4118165A1 (en) | 2023-01-18 |
| BR112022017701A2 (pt) | 2022-10-18 |
| NZ793239A (en) | 2025-10-31 |
| KR102867891B1 (ko) | 2025-10-14 |
| US20210292647A1 (en) | 2021-09-23 |
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