MX2019012721A - Peliculas basadas en altin ricas en al. - Google Patents

Peliculas basadas en altin ricas en al.

Info

Publication number
MX2019012721A
MX2019012721A MX2019012721A MX2019012721A MX2019012721A MX 2019012721 A MX2019012721 A MX 2019012721A MX 2019012721 A MX2019012721 A MX 2019012721A MX 2019012721 A MX2019012721 A MX 2019012721A MX 2019012721 A MX2019012721 A MX 2019012721A
Authority
MX
Mexico
Prior art keywords
altin
based film
aitin
rich
based films
Prior art date
Application number
MX2019012721A
Other languages
English (en)
Inventor
Kurapov Denis
Phani Kumar Yalamanchili Siva
Olof Eriksson Anders
Original Assignee
Oerlikon Surface Solutions Ag Pfaeffikon
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Surface Solutions Ag Pfaeffikon filed Critical Oerlikon Surface Solutions Ag Pfaeffikon
Publication of MX2019012721A publication Critical patent/MX2019012721A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0094—Reactive sputtering in transition mode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/345—Applying energy to the substrate during sputtering using substrate bias
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

Esta invención se refiere a un recubrimiento que comprende al menos una película a base de AlTiN depositada por medio de un proceso de DFV, en el que la al menos una película a base de AlTiN depositada comprende un contenido de Al, en relación con el contenido de Ti, en porcentaje atómico superior al 75 %, y en el que la película a base de AlTiN exhibe únicamente una fase cristalográfica cúbica y tensiones de compresión internas y esta invención se refiere a un método que implica la deposición de una película a base de AlTiN.
MX2019012721A 2017-09-05 2018-09-05 Peliculas basadas en altin ricas en al. MX2019012721A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201762554213P 2017-09-05 2017-09-05
PCT/EP2018/073915 WO2019048507A1 (en) 2017-09-05 2018-09-05 ALTIN FILMS RICH IN AL

Publications (1)

Publication Number Publication Date
MX2019012721A true MX2019012721A (es) 2019-12-05

Family

ID=63517888

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2019012721A MX2019012721A (es) 2017-09-05 2018-09-05 Peliculas basadas en altin ricas en al.

Country Status (7)

Country Link
US (2) US11965234B2 (es)
EP (1) EP3625377A1 (es)
JP (1) JP7266810B2 (es)
KR (1) KR20200049701A (es)
CN (1) CN110573645B (es)
MX (1) MX2019012721A (es)
WO (1) WO2019048507A1 (es)

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* Cited by examiner, † Cited by third party
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KR102064172B1 (ko) * 2017-09-01 2020-01-09 한국야금 주식회사 내마모성과 인성이 우수한 경질피막
JP2022507087A (ja) 2018-11-09 2022-01-18 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン セラミックターゲットから堆積されたＡｌリッチな立方晶ＡｌＴｉＮコーティング
US20220297196A1 (en) 2019-06-19 2022-09-22 Ab Sandvik Coromant Method of producing a coated cutting tool and a coated cutting tool
CN114929416A (zh) * 2020-01-20 2022-08-19 京瓷株式会社 涂层刀具
EP4108366A4 (en) 2020-02-21 2024-04-03 MOLDINO Tool Engineering, Ltd. COATED TOOL
KR20210138231A (ko) 2020-05-12 2021-11-19 이무헌 Hvof를 이용한 삼상코팅 절삭공구 제조 방법
CN114277336B (zh) * 2020-09-28 2022-10-14 上海交通大学 基于Al3Ti纳米针垂直排列的Al基合金薄膜及其制备方法
KR20230078682A (ko) * 2020-09-29 2023-06-02 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 금속 타겟으로부터 PVD에 의해 제조된 Al-풍부한 AlTiN 코팅층
CN117730166A (zh) * 2020-12-16 2024-03-19 欧瑞康表面解决方案股份公司，普费菲孔 由陶瓷靶通过PVD制备的硬质立方富铝AlTiN涂覆层
EP4330443A1 (en) * 2021-04-30 2024-03-06 Walter Ag A coated cutting tool
JP7319600B6 (ja) * 2021-12-10 2023-08-18 株式会社タンガロイ 被覆切削工具
US11724317B1 (en) 2022-03-10 2023-08-15 Kennametal Inc. Cubic phase refractory coatings and applications thereof
DE102022124181A1 (de) 2022-09-21 2024-03-21 Kennametal Inc. Verfahren zur Herstellung eines beschichteten Körpers sowie beschichteter Körper erhältlich gemäß dem Verfahren
JP7409554B1 (ja) * 2022-09-22 2024-01-09 住友電気工業株式会社 切削工具

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Publication number Priority date Publication date Assignee Title
DE3700633C2 (de) * 1987-01-12 1997-02-20 Reinar Dr Gruen Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma
JPH0634818B2 (ja) * 1992-04-09 1994-05-11 大 山岡 Ｔｉ−Ａｌ−Ｎ組成物の皮膜を備えた器具
JP2816786B2 (ja) * 1992-09-16 1998-10-27 健 増本 Ａｌ−Ｔｉ系又はＡｌ−Ｔａ系耐摩耗性硬質膜及びその製造方法
JP4703349B2 (ja) * 2005-10-11 2011-06-15 Ｏｋｉセミコンダクタ株式会社 アモルファス膜の成膜方法
EP2726648B1 (en) * 2011-06-30 2019-09-11 Oerlikon Surface Solutions AG, Pfäffikon Nano-layer coating for high performance tools
US9416440B2 (en) 2011-09-30 2016-08-16 Cemecon Ag Coating of substrates using HIPIMS
ES2631680T3 (es) * 2013-02-08 2017-09-04 Council Of Scientific And Industrial Research Un revestimiento solar selectivo híbrido multicapa para aplicaciones solares térmicas a alta temperatura y un proceso para la preparación del mismo
CN105088127B (zh) * 2015-08-31 2018-04-24 科汇纳米技术（深圳）有限公司 一种涂层及其制备方法
JPWO2017110463A1 (ja) 2015-12-22 2018-10-11 コニカミノルタ株式会社 ガスバリアーフィルム及びその製造方法

Also Published As

Publication number Publication date
JP7266810B2 (ja) 2023-05-01
JP2020532644A (ja) 2020-11-12
KR20200049701A (ko) 2020-05-08
US20210108306A1 (en) 2021-04-15
US11965234B2 (en) 2024-04-23
CN110573645A (zh) 2019-12-13
CN110573645B (zh) 2021-08-17
US20240043985A1 (en) 2024-02-08
EP3625377A1 (en) 2020-03-25
WO2019048507A1 (en) 2019-03-14

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