KR970027087A - 세펨 유도체의 제조방법 - Google Patents

세펨 유도체의 제조방법 Download PDF

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Publication number
KR970027087A
KR970027087A KR1019950045661A KR19950045661A KR970027087A KR 970027087 A KR970027087 A KR 970027087A KR 1019950045661 A KR1019950045661 A KR 1019950045661A KR 19950045661 A KR19950045661 A KR 19950045661A KR 970027087 A KR970027087 A KR 970027087A
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South Korea
Prior art keywords
general formula
formula
compound
group
methyl
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KR1019950045661A
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English (en)
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KR0184037B1 (ko
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최영진
장교덕
김진환
김문식
김영훈
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김사웅
국제약품공업 주식회사
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Priority to KR1019950045661A priority Critical patent/KR0184037B1/ko
Publication of KR970027087A publication Critical patent/KR970027087A/ko
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Publication of KR0184037B1 publication Critical patent/KR0184037B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/02—Preparation
    • C07D501/04—Preparation from compounds already containing the ring or condensed ring systems, e.g. by dehydrogenation of the ring, by introduction, elimination or modification of substituents
    • C07D501/06—Acylation of 7-aminocephalosporanic acid
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/26—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group
    • C07D501/34—Methylene radicals, substituted by oxygen atoms; Lactones thereof with the 2-carboxyl group with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/36—Methylene radicals, substituted by sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D501/00—Heterocyclic compounds containing 5-thia-1-azabicyclo [4.2.0] octane ring systems, i.e. compounds containing a ring system of the formula:, e.g. cephalosporins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulfur-containing hetero ring
    • C07D501/14—Compounds having a nitrogen atom directly attached in position 7
    • C07D501/16—Compounds having a nitrogen atom directly attached in position 7 with a double bond between positions 2 and 3
    • C07D501/20—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids
    • C07D501/24—7-Acylaminocephalosporanic or substituted 7-acylaminocephalosporanic acids in which the acyl radicals are derived from carboxylic acids with hydrocarbon radicals, substituted by hetero atoms or hetero rings, attached in position 3
    • C07D501/48—Methylene radicals, substituted by hetero rings
    • C07D501/56—Methylene radicals, substituted by hetero rings with the 7-amino radical acylated by carboxylic acids containing hetero rings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cephalosporin Compounds (AREA)

Abstract

본 발명은 일반식 (I)의 세펨 유도체를 제조하는 방법에 관한 것으로, 이염화수은(HgCl2)과 일반식 (III)의 디설파이드의 존재하에, 하기 일반식(II)의 유기산과 트리페닐포스핀을 유기용매내에서 반응시키고 이때 얻어진 일반식 (IV)의 유기산의 반응성 유도체를 일반식(V)의 화합물과 아실화 반응시킴으로서 일반식(I) 화합물을 제조하는 것을 특징으로 한다.
상기 식에서, R1은 메틸, 2-카르복시이소프로필 또는 2-(차단된 카르복시)이소프로필을 의미하며, R2는 아세톡시메틸, 2,5-디히드로-6-히드록시-2-메틸-5-옥소-1,2,4-트리아진-3-일-티오메틸 또는 피리디늄메틸기를 의미하며 R3는2-벤조티아졸일, 2-피리딜, 2-니트로페닐 또는 3-시아노-4, 6-디메틸피리딘-2-일을 의미한다.

Description

세펨 유도체의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (3)

  1. 이염화수은과 일반식(III)의 디설파이드의 존재하에, 하기 일반식(II)의 유기산과 트리페닐포스핀을 반응시켜 얻어진 일반식(IV)의 화합물을 일반식(V)의 화합물과 아실화반응시킴으로서 일반식(I) 의 세펨 유도체를 제조하는 방법.
    상기 식에서, R1은 메틸, 2-카르복시이소프로필 또는 2-(차단된 카르복시)이소프로필을 의미하며, R2은 아세톡시메틸, 2,5-디하이드로-6-히드록시-2-메틸-5-옥소-1,2,4-트리아진-3-일-티오메틸 또는 피리디늄메틸기를 의미하며 R3는 2-벤조티아졸일, 2-피리딜, 2-니트로페닐 또는 3-시아노-4,6-디메틸피리딘-3-일을 의미한다.
  2. 제1항에 있어서, 상기 아실화반응은 아세토니트릴, 아세톤, 디클로로메탄, 클로로포름 및 테트라하이드로퓨란으로 이루어진 군으로부터 선택된 유기용매와 메탄올, 에탄올 및 이소프로판올로 이루어진 군으로부터 선택된 알콜 및 트리에틸아민을 포함하는 혼합용매내에서 이루어짐을 특징으로 하는 방법.
  3. 제1항에 있어서, 상기 아실화반응은 -10℃~40℃ 온도에서 1~5시간 진행됨을 특징으로 하는 제조방법.
    ※ 참고사항: 최초출원 내용에 의하여 공개하는 것임.
KR1019950045661A 1995-11-30 1995-11-30 세펨 유도체의 제조방법 KR0184037B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950045661A KR0184037B1 (ko) 1995-11-30 1995-11-30 세펨 유도체의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950045661A KR0184037B1 (ko) 1995-11-30 1995-11-30 세펨 유도체의 제조방법

Publications (2)

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KR970027087A true KR970027087A (ko) 1997-06-24
KR0184037B1 KR0184037B1 (ko) 1999-05-01

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