KR970025796U - 반도체 금속증착장치 - Google Patents

반도체 금속증착장치

Info

Publication number
KR970025796U
KR970025796U KR2019950034801U KR19950034801U KR970025796U KR 970025796 U KR970025796 U KR 970025796U KR 2019950034801 U KR2019950034801 U KR 2019950034801U KR 19950034801 U KR19950034801 U KR 19950034801U KR 970025796 U KR970025796 U KR 970025796U
Authority
KR
South Korea
Prior art keywords
metal deposition
deposition equipment
semiconductor metal
semiconductor
equipment
Prior art date
Application number
KR2019950034801U
Other languages
English (en)
Other versions
KR0132413Y1 (ko
Inventor
김영도
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950034801U priority Critical patent/KR0132413Y1/ko
Publication of KR970025796U publication Critical patent/KR970025796U/ko
Application granted granted Critical
Publication of KR0132413Y1 publication Critical patent/KR0132413Y1/ko

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
KR2019950034801U 1995-11-22 1995-11-22 반도체 금속증착장치 KR0132413Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950034801U KR0132413Y1 (ko) 1995-11-22 1995-11-22 반도체 금속증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950034801U KR0132413Y1 (ko) 1995-11-22 1995-11-22 반도체 금속증착장치

Publications (2)

Publication Number Publication Date
KR970025796U true KR970025796U (ko) 1997-06-20
KR0132413Y1 KR0132413Y1 (ko) 1999-02-01

Family

ID=19429788

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950034801U KR0132413Y1 (ko) 1995-11-22 1995-11-22 반도체 금속증착장치

Country Status (1)

Country Link
KR (1) KR0132413Y1 (ko)

Also Published As

Publication number Publication date
KR0132413Y1 (ko) 1999-02-01

Similar Documents

Publication Publication Date Title
KR970001588A (ko) Cvd 장치
DE69534965D1 (de) Abscheidungsverfahren
IT1283206B1 (it) Stazione di rivestimento
DE59611409D1 (de) Lotdepotträger
DE69519983D1 (de) Metall-Semiconductor-Metall-Photodetektoren
BR9605217A (pt) Superfície metálica revestida
FI961227A (fi) Suihkupää
DE59607616D1 (de) Metall-Halbleiterkontakt
KR970025796U (ko) 반도체 금속증착장치
KR960032728U (ko) 웨이퍼 증착장치
DE59609570D1 (de) Übergangsmetallverbindung
KR950031464U (ko) 플라즈마 증착장비
KR960006194U (ko) 메탈백 증착장치
KR970025784U (ko) 반도체 상압증착장치
KR970019733U (ko) 반도체 소자 증착 장치
KR970045362U (ko) 반도체 노광장치
KR950030403U (ko) 금속의 진공증착장치
KR950007259U (ko) 메탈백 증착장치
KR950010189U (ko) 웨이퍼 코팅장치
KR960006325U (ko) 반도체 제조용 증착장치
KR950025879U (ko) 플라즈마 증착장치
KR960027170U (ko) 화학 기상 증착장치
KR970015294U (ko) 화학기상증착장치
KR970011213U (ko) 반도체 제조용 장치
KR950009980U (ko) 금속막 증착장치

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20080617

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee