IT1283206B1 - Stazione di rivestimento - Google Patents
Stazione di rivestimentoInfo
- Publication number
- IT1283206B1 IT1283206B1 IT96MI000446A ITMI960446A IT1283206B1 IT 1283206 B1 IT1283206 B1 IT 1283206B1 IT 96MI000446 A IT96MI000446 A IT 96MI000446A IT MI960446 A ITMI960446 A IT MI960446A IT 1283206 B1 IT1283206 B1 IT 1283206B1
- Authority
- IT
- Italy
- Prior art keywords
- coating station
- station
- coating
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Manufacturing And Processing Devices For Dough (AREA)
- Fertilizers (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE29505497U DE29505497U1 (de) | 1995-03-31 | 1995-03-31 | Beschichtungsstation |
Publications (3)
Publication Number | Publication Date |
---|---|
ITMI960446A0 ITMI960446A0 (it) | 1996-03-08 |
ITMI960446A1 ITMI960446A1 (it) | 1997-09-08 |
IT1283206B1 true IT1283206B1 (it) | 1998-04-16 |
Family
ID=8006192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT96MI000446A IT1283206B1 (it) | 1995-03-31 | 1996-03-08 | Stazione di rivestimento |
Country Status (6)
Country | Link |
---|---|
US (2) | US5911861A (it) |
JP (1) | JPH08283938A (it) |
KR (1) | KR100371356B1 (it) |
DE (1) | DE29505497U1 (it) |
FR (1) | FR2732362B1 (it) |
IT (1) | IT1283206B1 (it) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19730993B4 (de) * | 1997-07-18 | 2008-04-03 | Ald Vacuum Technologies Ag | Vakuumbeschichtungsvorrichtung zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Partikelstrom |
DE29716440U1 (de) * | 1997-09-12 | 1997-12-11 | Balzers Ag, Balzers | Sputterstation |
US6730194B2 (en) * | 1997-11-05 | 2004-05-04 | Unaxis Balzers Aktiengesellschaft | Method for manufacturing disk-shaped workpieces with a sputter station |
US6485565B1 (en) | 1998-05-28 | 2002-11-26 | The Regents Of The University Of California | Process and apparatus for making oriented crystal layers |
AUPP740798A0 (en) * | 1998-11-30 | 1998-12-24 | Sola International Holdings Ltd | Customised coated lens |
CH694329A5 (de) * | 1999-11-22 | 2004-11-30 | Satis Vacuum Ind Vetriebs Ag | Vacuum-Beschichtungsanlage zum Aufbringen von Vergütungsschichten auf optische Substrate. |
US6466365B1 (en) * | 2000-04-07 | 2002-10-15 | Corning Incorporated | Film coated optical lithography elements and method of making |
US6914749B2 (en) * | 2000-07-25 | 2005-07-05 | Seagate Technology Llc | Magnetic anisotropy of soft-underlayer induced by magnetron field |
DE10145201C1 (de) * | 2001-09-13 | 2002-11-21 | Fraunhofer Ges Forschung | Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron-Zerstäuben |
DE10145050C1 (de) * | 2001-09-13 | 2002-11-21 | Fraunhofer Ges Forschung | Einrichtung zum Beschichten von Substraten mit gekrümmter Oberfläche durch Pulsmagnetron- Zerstäuben |
US7879209B2 (en) | 2004-08-20 | 2011-02-01 | Jds Uniphase Corporation | Cathode for sputter coating |
US8500973B2 (en) * | 2004-08-20 | 2013-08-06 | Jds Uniphase Corporation | Anode for sputter coating |
US20060049041A1 (en) * | 2004-08-20 | 2006-03-09 | Jds Uniphase Corporation | Anode for sputter coating |
US8146902B2 (en) * | 2006-12-21 | 2012-04-03 | Lam Research Corporation | Hybrid composite wafer carrier for wet clean equipment |
CZ305421B6 (cs) * | 2014-02-26 | 2015-09-09 | Hvm Plasma, Spol.S R.O. | Způsob unášení substrátů při depozici tenké vrstvy na povrch substrátů a rotační stolek pro unášení substrátů podle způsobu |
EP3868917A1 (de) | 2015-06-16 | 2021-08-25 | Schneider GmbH & Co. KG | Vorrichtung, verfahren und verwendung zur beschichtung von linsen |
DE102016125273A1 (de) | 2016-12-14 | 2018-06-14 | Schneider Gmbh & Co. Kg | Anlage, Verfahren und Träger zur Beschichtung von Brillengläsern |
CN107500559B (zh) * | 2017-10-12 | 2020-06-19 | 信利光电股份有限公司 | 一种曲面玻璃镀膜装置 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3889632A (en) * | 1974-05-31 | 1975-06-17 | Ibm | Variable incidence drive for deposition tooling |
JPS6365069A (ja) * | 1986-09-08 | 1988-03-23 | Hitachi Ltd | スパツタ装置 |
US4851095A (en) * | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
FR2644180B1 (fr) * | 1989-03-08 | 1991-05-10 | Commissariat Energie Atomique | Dispositif pour recouvrir une surface plane d'une couche d'epaisseur uniforme |
ES2093133T3 (es) * | 1991-04-12 | 1996-12-16 | Balzers Hochvakuum | Procedimiento e instalacion para el recubrimiento de al menos un objeto. |
US5525199A (en) * | 1991-11-13 | 1996-06-11 | Optical Corporation Of America | Low pressure reactive magnetron sputtering apparatus and method |
CH689767A5 (de) * | 1992-03-24 | 1999-10-15 | Balzers Hochvakuum | Verfahren zur Werkstueckbehandlung in einer Vakuumatmosphaere und Vakuumbehandlungsanlage. |
JPH0649637A (ja) * | 1992-08-03 | 1994-02-22 | Hitachi Metals Ltd | バイアススパッタリング方法 |
JPH06322538A (ja) * | 1993-05-11 | 1994-11-22 | Shibaura Eng Works Co Ltd | スパッタリング装置 |
-
1995
- 1995-03-31 DE DE29505497U patent/DE29505497U1/de not_active Expired - Lifetime
-
1996
- 1996-02-12 FR FR9601686A patent/FR2732362B1/fr not_active Expired - Fee Related
- 1996-03-08 IT IT96MI000446A patent/IT1283206B1/it active IP Right Grant
- 1996-03-27 KR KR1019960008648A patent/KR100371356B1/ko not_active IP Right Cessation
- 1996-03-29 JP JP8076151A patent/JPH08283938A/ja active Pending
- 1996-04-01 US US08/625,315 patent/US5911861A/en not_active Expired - Fee Related
-
1999
- 1999-01-27 US US09/238,060 patent/US6123814A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR960034457A (ko) | 1996-10-22 |
KR100371356B1 (ko) | 2003-04-08 |
US6123814A (en) | 2000-09-26 |
US5911861A (en) | 1999-06-15 |
FR2732362A1 (fr) | 1996-10-04 |
DE29505497U1 (de) | 1995-06-08 |
ITMI960446A0 (it) | 1996-03-08 |
JPH08283938A (ja) | 1996-10-29 |
ITMI960446A1 (it) | 1997-09-08 |
FR2732362B1 (fr) | 2003-05-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
0001 | Granted |