KR970024255A - Manufacturing method of semiconductor device - Google Patents
Manufacturing method of semiconductor device Download PDFInfo
- Publication number
- KR970024255A KR970024255A KR1019950033873A KR19950033873A KR970024255A KR 970024255 A KR970024255 A KR 970024255A KR 1019950033873 A KR1019950033873 A KR 1019950033873A KR 19950033873 A KR19950033873 A KR 19950033873A KR 970024255 A KR970024255 A KR 970024255A
- Authority
- KR
- South Korea
- Prior art keywords
- oxide film
- layer
- wsi
- semiconductor device
- cap oxide
- Prior art date
Links
Landscapes
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
본 발명은 반도체 소자에 관한 것으로, 특히 캔 산화막을 얇게 증착함으로써 게이트 폴리 형성시 게이트 산화막위의 캡 산화막, 실리사이드층 및 폴리 실리콘층을 한꺼번에 식감할 수 있게 함으로써 게이트 폴리 형성공정이 단순화된 반도체 소자의 제조방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device. In particular, a thin film of can oxide is deposited to allow the cap oxide, silicide, and polysilicon layers on the gate oxide to be etched at the same time. It relates to a manufacturing method.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제 2 도(a) - (c)는 본 발명의 게이트 폴리 형성방법을 나타낸 공정단면도.(A)-(c) are process cross-sectional views showing the gate poly forming method of the present invention.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950033873A KR970024255A (en) | 1995-10-04 | 1995-10-04 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950033873A KR970024255A (en) | 1995-10-04 | 1995-10-04 | Manufacturing method of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970024255A true KR970024255A (en) | 1997-05-30 |
Family
ID=66582588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950033873A KR970024255A (en) | 1995-10-04 | 1995-10-04 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970024255A (en) |
-
1995
- 1995-10-04 KR KR1019950033873A patent/KR970024255A/en not_active Application Discontinuation
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
N231 | Notification of change of applicant | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |