KR970003618A - 반도체소자의 평탄화층 형성방법 - Google Patents

반도체소자의 평탄화층 형성방법 Download PDF

Info

Publication number
KR970003618A
KR970003618A KR1019950016036A KR19950016036A KR970003618A KR 970003618 A KR970003618 A KR 970003618A KR 1019950016036 A KR1019950016036 A KR 1019950016036A KR 19950016036 A KR19950016036 A KR 19950016036A KR 970003618 A KR970003618 A KR 970003618A
Authority
KR
South Korea
Prior art keywords
semiconductor device
planarization layer
forming planarization
forming
layer
Prior art date
Application number
KR1019950016036A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR1019950016036A priority Critical patent/KR970003618A/ko
Publication of KR970003618A publication Critical patent/KR970003618A/ko

Links

KR1019950016036A 1995-06-16 1995-06-16 반도체소자의 평탄화층 형성방법 KR970003618A (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950016036A KR970003618A (ko) 1995-06-16 1995-06-16 반도체소자의 평탄화층 형성방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950016036A KR970003618A (ko) 1995-06-16 1995-06-16 반도체소자의 평탄화층 형성방법

Publications (1)

Publication Number Publication Date
KR970003618A true KR970003618A (ko) 1997-01-28

Family

ID=60934271

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950016036A KR970003618A (ko) 1995-06-16 1995-06-16 반도체소자의 평탄화층 형성방법

Country Status (1)

Country Link
KR (1) KR970003618A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101202754B1 (ko) * 2006-04-27 2012-11-19 주식회사 대우일렉트로닉스 전자레인지의 바베큐바 감지장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101202754B1 (ko) * 2006-04-27 2012-11-19 주식회사 대우일렉트로닉스 전자레인지의 바베큐바 감지장치

Similar Documents

Publication Publication Date Title
GB2306779B (en) Method of fabricating semiconductor device
DE69637537D1 (de) Halbleiteranordnung mit verbessertem Verbindungsmuster und Herstellungsverfahren dafür
KR970004015A (ko) 반도체장치 및 그의 제조방법
GB2312552B (en) Method for forming element isolating film of semiconductor device
GB2313708B (en) Method of fabricating semiconductor device
EP0692821A3 (en) Method of manufacturing a semiconductor layer
KR960015805A (ko) 반도체 장치의 제조 방법
GB2307344B (en) Method for planarization of semiconductor device
KR970003618A (ko) 반도체소자의 평탄화층 형성방법
KR970003552A (ko) 반도체 소자의 평탄화 방법
GB2318451B (en) Method of fabricating semiconductor device
KR970004054A (ko) 반도체 소자의 폴리실리콘층 형성방법
KR970004171A (ko) 반도체장치 및 그 제조방법
GB2304997B (en) Method of fabricating semiconductor device
KR970003997A (ko) 반도체소자의 캐패시터 형성방법
KR960009211A (ko) 반도체장치의 제조방법
KR970004006A (ko) 반도체 소자의 캐패시터 제조 방법
KR970003476A (ko) 반도체 소자의 접합 영역 형성방법
KR970003958A (ko) 반도체소자의 제조방법
KR970003597A (ko) 반도체 소자의 제조방법
KR970003976A (ko) 반도체 소자의 캐패시터 제조방법
KR980005601A (ko) 반도체장치의 콘택 형성방법
KR970003418A (ko) 고집적 반도체 소자 제조 방법
KR970002476A (ko) 반도체 소자의 미세패턴 형성방법
KR970003467A (ko) 반도체소자의 콘택홀 형성방법

Legal Events

Date Code Title Description
WITN Withdrawal due to no request for examination