KR970002475A - 전자빔 노광장치의 노광방법 - Google Patents

전자빔 노광장치의 노광방법 Download PDF

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Publication number
KR970002475A
KR970002475A KR1019950015737A KR19950015737A KR970002475A KR 970002475 A KR970002475 A KR 970002475A KR 1019950015737 A KR1019950015737 A KR 1019950015737A KR 19950015737 A KR19950015737 A KR 19950015737A KR 970002475 A KR970002475 A KR 970002475A
Authority
KR
South Korea
Prior art keywords
electron beam
exposure
exposure apparatus
exposure method
beam exposure
Prior art date
Application number
KR1019950015737A
Other languages
English (en)
Other versions
KR0138814B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to KR1019950015737A priority Critical patent/KR0138814B1/ko
Publication of KR970002475A publication Critical patent/KR970002475A/ko
Application granted granted Critical
Publication of KR0138814B1 publication Critical patent/KR0138814B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2061—Electron scattering (proximity) correction or prevention methods

Landscapes

  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
KR1019950015737A 1995-06-14 1995-06-14 전자빔 노광장치의 노광방법 KR0138814B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950015737A KR0138814B1 (ko) 1995-06-14 1995-06-14 전자빔 노광장치의 노광방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950015737A KR0138814B1 (ko) 1995-06-14 1995-06-14 전자빔 노광장치의 노광방법

Publications (2)

Publication Number Publication Date
KR970002475A true KR970002475A (ko) 1997-01-24
KR0138814B1 KR0138814B1 (ko) 1998-04-28

Family

ID=19417105

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950015737A KR0138814B1 (ko) 1995-06-14 1995-06-14 전자빔 노광장치의 노광방법

Country Status (1)

Country Link
KR (1) KR0138814B1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100811641B1 (ko) * 2001-12-21 2008-03-11 엘지.필립스 엘시디 주식회사 액정 표시 장치 및 그의 제조 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100811641B1 (ko) * 2001-12-21 2008-03-11 엘지.필립스 엘시디 주식회사 액정 표시 장치 및 그의 제조 방법

Also Published As

Publication number Publication date
KR0138814B1 (ko) 1998-04-28

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