GB9622640D0 - Apparatus and method for projection exposure - Google Patents

Apparatus and method for projection exposure

Info

Publication number
GB9622640D0
GB9622640D0 GBGB9622640.2A GB9622640A GB9622640D0 GB 9622640 D0 GB9622640 D0 GB 9622640D0 GB 9622640 A GB9622640 A GB 9622640A GB 9622640 D0 GB9622640 D0 GB 9622640D0
Authority
GB
United Kingdom
Prior art keywords
projection exposure
exposure
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9622640.2A
Other versions
GB2307303A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9622640D0 publication Critical patent/GB9622640D0/en
Publication of GB2307303A publication Critical patent/GB2307303A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
GB9622640A 1995-11-14 1996-10-30 Apparatus and method for projection exposure Withdrawn GB2307303A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950041255A KR970028856A (en) 1995-11-14 1995-11-14 Projection Exposure Equipment and Exposure Method

Publications (2)

Publication Number Publication Date
GB9622640D0 true GB9622640D0 (en) 1997-01-08
GB2307303A GB2307303A (en) 1997-05-21

Family

ID=19434039

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9622640A Withdrawn GB2307303A (en) 1995-11-14 1996-10-30 Apparatus and method for projection exposure

Country Status (5)

Country Link
JP (1) JPH09148244A (en)
KR (1) KR970028856A (en)
CN (1) CN1152136A (en)
DE (1) DE19643952A1 (en)
GB (1) GB2307303A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10048243A1 (en) * 2000-09-29 2002-04-18 Bosch Gmbh Robert Smoothed surface substrate and process for its manufacture
JP5294490B2 (en) * 2009-12-22 2013-09-18 株式会社ブイ・テクノロジー Photo mask
JP5495334B2 (en) 2011-09-22 2014-05-21 Ｎｅｃエンジニアリング株式会社 Optical recording head and image forming apparatus
CN107561089B (en) * 2017-09-15 2024-04-02 深圳市牧激科技有限公司 Inner hole detection optical system and inner hole detection equipment

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3988066A (en) * 1974-01-12 1976-10-26 Canon Kabushiki Kaisha Light exposure apparatus for printing
US5747221A (en) * 1994-11-08 1998-05-05 Hyundai Electronics Industries Co., Ltd. Photolithography method and photolithography system for performing the method

Also Published As

Publication number Publication date
JPH09148244A (en) 1997-06-06
CN1152136A (en) 1997-06-18
GB2307303A (en) 1997-05-21
DE19643952A1 (en) 1997-05-15
KR970028856A (en) 1997-06-24

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)