KR960703266A - 피막 경화 방법(Method of curing a film) - Google Patents
피막 경화 방법(Method of curing a film) Download PDFInfo
- Publication number
- KR960703266A KR960703266A KR1019950705871A KR19950705871A KR960703266A KR 960703266 A KR960703266 A KR 960703266A KR 1019950705871 A KR1019950705871 A KR 1019950705871A KR 19950705871 A KR19950705871 A KR 19950705871A KR 960703266 A KR960703266 A KR 960703266A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- film
- laser beam
- curing
- coating
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/86—Vessels; Containers; Vacuum locks
- H01J29/867—Means associated with the outside of the vessel for shielding, e.g. magnetic shields
- H01J29/868—Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/25—Oxides by deposition from the liquid phase
- C03C17/253—Coating containing SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/23—Mixtures
- C03C2217/231—In2O3/SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/73—Anti-reflective coatings with specific characteristics
- C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/012—Coating
- H01J2209/015—Machines therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
기판, 예를 들어 음극선관의 디스플레이 윈도우에 인가되는 ITO와 같은 전도성 물질의 졸-겔 코팅은 레이저에 의해 경화된다. 이것은 바람직하게도 수분 함유 대기, 예를 들어 애퀴어스 에어로졸과 같은 수분 함유 대기 또는 포밍 기체와 같은 수소 함유 기체에서 실행된다. 이것은 몇백 시간으로 이루어지는 안정된 저항 감소를 가져온다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 본 발명에 따른 방법의 실시예를 도시하는 도면,
제3도는 본 발명에 따른 방법의 다른 실시예를 도시하는 도면.
Claims (8)
- 기판 표면의 피막을 경화하는 방법에 있어서, 상기 피막은 피막의 제한된 영역에 입사되고 표면을 주사하는 레이저빔에 의해 경화되는 것을 특징으로하는 피막 경화 방법.
- 제1항에 있어서, 상기 피막은 약한 레이저광을 흡수하고 에너지 방출은 피막 아래 영역에서 10㎛이하의 깊이까지 집중되는 것을 특징으로 하는 피막 경화 방법.
- 제1항 또는 제2항에 있어서, 전도성의 피막이 수소 함유 대기에서 레이저 빔에 의해 경화되는 것을 특징으로 하는 피막 경화 방법.
- 제1항 내지 제3항중 어느 한 항에 있어서, 전도성 피막이 수분 함유 대기에서 레이저 빔에 의해 경화되거나 또는 수분 함유 대기는 경화 동작이 끝난 즉시 제공되는 것을 특징으로하는 피막 경화 방법.
- 제2항 내지 제4항중 어느 한 항에 있어서, 상기 피막은 ITO 졸-겔 코팅인 것을 특징으로 하는 피막 경화 방법.
- 제1항 내지 제5항중 어느 한 항에 있어서, 상기 기판이 음극선관의 디스플레이 윈도우인 것을 특징으로 하는 피막 경화 방법.
- 기판의 피막을 경화하는 장치에 있어서, 기판 홀더, 기판에 레이저빔을 조사하는 수단, 레이저 빔으로 기판을 주사하는 수단과 상기 레이저빔이 기판에 입사되는 점에로 수소 함유 기체를 제공하는 수단을 구비하는 것을 특징으로 하는 피막 경화 장치.
- 기판의 피막을 경화하는 장치에 있어서, 기판 홀더, 상기 기판에 레이저빔을 조사하는 수단, 상기 레이저빔으로 기판을 주사하는 수단과 상기 레이저빔이 상기 기판에 입사되는 점에 수소 기체를 공급하는 수단을 구비하는 것을 특징으로 하는 피막 경화 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP94201138 | 1994-04-25 | ||
EP94201138.8 | 1994-04-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960703266A true KR960703266A (ko) | 1996-06-19 |
KR100379843B1 KR100379843B1 (ko) | 2003-06-19 |
Family
ID=8216823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950705871A KR100379843B1 (ko) | 1994-04-25 | 1995-04-13 | 피막경화방법및장치 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6025037A (ko) |
EP (1) | EP0705483B1 (ko) |
JP (1) | JPH08512096A (ko) |
KR (1) | KR100379843B1 (ko) |
DE (1) | DE69513482T2 (ko) |
TW (1) | TW310443B (ko) |
WO (1) | WO1995029501A1 (ko) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6280838B1 (en) * | 1997-01-10 | 2001-08-28 | U. S. Philips Corporation | Optical element, a display device provided with said optical element, and a method of manufacturing the optical element |
JP2000513694A (ja) * | 1997-04-28 | 2000-10-17 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 基板上に導電層を作製する方法 |
JP2000515264A (ja) * | 1997-04-28 | 2000-11-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 静電防止、反射防止フィルタを具える表示装置及び陰極線管上に反射防止フィルタを製造する方法 |
US7108894B2 (en) * | 1998-09-30 | 2006-09-19 | Optomec Design Company | Direct Write™ System |
US8110247B2 (en) * | 1998-09-30 | 2012-02-07 | Optomec Design Company | Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials |
US20040197493A1 (en) * | 1998-09-30 | 2004-10-07 | Optomec Design Company | Apparatus, methods and precision spray processes for direct write and maskless mesoscale material deposition |
US7294366B2 (en) * | 1998-09-30 | 2007-11-13 | Optomec Design Company | Laser processing for heat-sensitive mesoscale deposition |
US7045015B2 (en) | 1998-09-30 | 2006-05-16 | Optomec Design Company | Apparatuses and method for maskless mesoscale material deposition |
US7938079B2 (en) * | 1998-09-30 | 2011-05-10 | Optomec Design Company | Annular aerosol jet deposition using an extended nozzle |
KR100348702B1 (ko) * | 1999-12-28 | 2002-08-13 | 주식회사 루밴틱스 | 급속 열처리 방법에 의한 도전성 투명 박막의 제조방법 및 그 방법에 의해 제조된 도전성 투명 박막 |
JP2004503675A (ja) * | 2000-06-13 | 2004-02-05 | エレメント シックス (プロプライエタリイ)リミテッド | 複合ダイヤモンド圧縮体 |
MXPA05002891A (es) | 2002-09-20 | 2005-06-22 | Fmc Corp | Composicion cosmetica que contiene celulosa microcristalina. |
WO2005039814A2 (en) | 2003-09-26 | 2005-05-06 | Optomec Design Company | Laser processing for heat-sensitive mesoscale deposition |
TWI242606B (en) * | 2003-09-26 | 2005-11-01 | Optomec Design | Laser treatment process for maskless low-temperature deposition of electronic materials |
US20060280866A1 (en) * | 2004-10-13 | 2006-12-14 | Optomec Design Company | Method and apparatus for mesoscale deposition of biological materials and biomaterials |
US7938341B2 (en) * | 2004-12-13 | 2011-05-10 | Optomec Design Company | Miniature aerosol jet and aerosol jet array |
US20080013299A1 (en) * | 2004-12-13 | 2008-01-17 | Optomec, Inc. | Direct Patterning for EMI Shielding and Interconnects Using Miniature Aerosol Jet and Aerosol Jet Array |
US7674671B2 (en) | 2004-12-13 | 2010-03-09 | Optomec Design Company | Aerodynamic jetting of aerosolized fluids for fabrication of passive structures |
US20070154634A1 (en) * | 2005-12-15 | 2007-07-05 | Optomec Design Company | Method and Apparatus for Low-Temperature Plasma Sintering |
DE102007013181B4 (de) | 2007-03-20 | 2017-11-09 | Evonik Degussa Gmbh | Transparente, elektrisch leitfähige Schicht |
US20100310630A1 (en) * | 2007-04-27 | 2010-12-09 | Technische Universitat Braunschweig | Coated surface for cell culture |
TWI482662B (zh) | 2007-08-30 | 2015-05-01 | Optomec Inc | 機械上一體式及緊密式耦合之列印頭以及噴霧源 |
TWI538737B (zh) * | 2007-08-31 | 2016-06-21 | 阿普托麥克股份有限公司 | 材料沉積總成 |
TW200918325A (en) * | 2007-08-31 | 2009-05-01 | Optomec Inc | AEROSOL JET® printing system for photovoltaic applications |
US8887658B2 (en) * | 2007-10-09 | 2014-11-18 | Optomec, Inc. | Multiple sheath multiple capillary aerosol jet |
DE202008005553U1 (de) | 2008-04-22 | 2008-08-14 | Evonik Degussa Gmbh | Hochleitfähige, transparente Metalloxid-Schichten durch Plasmaimmersion |
FR2992957A1 (fr) * | 2012-07-09 | 2014-01-10 | Saint Gobain | Procede de depot de couches minces avec etape de traitement sous atmosphere controlee et produit obtenu |
US10994473B2 (en) | 2015-02-10 | 2021-05-04 | Optomec, Inc. | Fabrication of three dimensional structures by in-flight curing of aerosols |
KR20200087196A (ko) | 2017-11-13 | 2020-07-20 | 옵토멕 인코포레이티드 | 에어로졸 스트림의 셔터링 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2025122C3 (de) * | 1969-07-17 | 1974-07-25 | Vianova-Kunstharz Ag, Wien | Verfahren zur Härtung von Anstrichstoffen und Überzügen mittels von einem Laser emittierter Infrarot-Strahlung |
US4593228A (en) * | 1984-05-15 | 1986-06-03 | Albrechtson Loren R | Laminated electroluminescent lamp structure and method of manufacturing |
JPS6134826A (ja) * | 1984-07-27 | 1986-02-19 | Hitachi Ltd | カラーブラウン管の製造方法 |
US4693906A (en) * | 1985-12-27 | 1987-09-15 | Quantex Corporation | Dielectric for electroluminescent devices, and methods for making |
JPS62195828A (ja) * | 1986-02-21 | 1987-08-28 | Hitachi Ltd | カラ−受像管螢光面の形成方法 |
JPS6348725A (ja) * | 1986-08-19 | 1988-03-01 | Matsushita Electric Ind Co Ltd | スクリ−ンの製造方法 |
US5154945A (en) * | 1990-03-05 | 1992-10-13 | Iowa Laser Technology, Inc. | Methods using lasers to produce deposition of diamond thin films on substrates |
NL9002769A (nl) * | 1990-12-17 | 1992-07-16 | Philips Nv | Werkwijze voor het vervaardigen van een beeldvenster voor een beeldweergave-apparaat. |
-
1995
- 1995-04-13 EP EP95913922A patent/EP0705483B1/en not_active Expired - Lifetime
- 1995-04-13 KR KR1019950705871A patent/KR100379843B1/ko not_active IP Right Cessation
- 1995-04-13 DE DE69513482T patent/DE69513482T2/de not_active Expired - Fee Related
- 1995-04-13 WO PCT/IB1995/000263 patent/WO1995029501A1/en active IP Right Grant
- 1995-04-13 JP JP7527501A patent/JPH08512096A/ja not_active Ceased
- 1995-04-17 US US08/423,606 patent/US6025037A/en not_active Expired - Fee Related
- 1995-05-13 TW TW084104752A patent/TW310443B/zh active
Also Published As
Publication number | Publication date |
---|---|
JPH08512096A (ja) | 1996-12-17 |
TW310443B (ko) | 1997-07-11 |
KR100379843B1 (ko) | 2003-06-19 |
US6025037A (en) | 2000-02-15 |
EP0705483B1 (en) | 1999-11-24 |
EP0705483A1 (en) | 1996-04-10 |
DE69513482D1 (de) | 1999-12-30 |
WO1995029501A1 (en) | 1995-11-02 |
DE69513482T2 (de) | 2000-05-18 |
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Legal Events
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
LAPS | Lapse due to unpaid annual fee |