KR960043037A - 접촉식 서머척 및 그 제조방법 - Google Patents

접촉식 서머척 및 그 제조방법 Download PDF

Info

Publication number
KR960043037A
KR960043037A KR1019950013696A KR19950013696A KR960043037A KR 960043037 A KR960043037 A KR 960043037A KR 1019950013696 A KR1019950013696 A KR 1019950013696A KR 19950013696 A KR19950013696 A KR 19950013696A KR 960043037 A KR960043037 A KR 960043037A
Authority
KR
South Korea
Prior art keywords
wafer
chuck
anodization film
flaking
anodization
Prior art date
Application number
KR1019950013696A
Other languages
English (en)
Korean (ko)
Inventor
임가순
심경보
강병진
김상원
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950013696A priority Critical patent/KR960043037A/ko
Priority to DE19531699A priority patent/DE19531699A1/de
Priority to GB9517702A priority patent/GB2301480A/en
Priority to CN95116697A priority patent/CN1139766A/zh
Priority to TW084109048A priority patent/TW344087B/zh
Priority to JP26885495A priority patent/JPH08330399A/ja
Publication of KR960043037A publication Critical patent/KR960043037A/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67103Apparatus for thermal treatment mainly by conduction

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Resistance Heating (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1019950013696A 1995-05-29 1995-05-29 접촉식 서머척 및 그 제조방법 KR960043037A (ko)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1019950013696A KR960043037A (ko) 1995-05-29 1995-05-29 접촉식 서머척 및 그 제조방법
DE19531699A DE19531699A1 (de) 1995-05-29 1995-08-29 Thermo-Waferhaltevorrichtung vom Kontakttyp und Verfahren zu ihrer Herstellung
GB9517702A GB2301480A (en) 1995-05-29 1995-08-30 Thermo chuck for mounting wafers
CN95116697A CN1139766A (zh) 1995-05-29 1995-08-30 接触型热卡盘及其制造方法
TW084109048A TW344087B (en) 1995-05-29 1995-08-30 Contact-type thermo chuck and fabricating method therefor
JP26885495A JPH08330399A (ja) 1995-05-29 1995-10-17 接触式サーモチャック及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950013696A KR960043037A (ko) 1995-05-29 1995-05-29 접촉식 서머척 및 그 제조방법

Publications (1)

Publication Number Publication Date
KR960043037A true KR960043037A (ko) 1996-12-21

Family

ID=19415762

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950013696A KR960043037A (ko) 1995-05-29 1995-05-29 접촉식 서머척 및 그 제조방법

Country Status (6)

Country Link
JP (1) JPH08330399A (zh)
KR (1) KR960043037A (zh)
CN (1) CN1139766A (zh)
DE (1) DE19531699A1 (zh)
GB (1) GB2301480A (zh)
TW (1) TW344087B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100695203B1 (ko) * 2006-07-31 2007-03-16 안병돈 내부에 지지심을 갖는 기판 이송롤러용 샤프트

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW303505B (en) * 1996-05-08 1997-04-21 Applied Materials Inc Substrate support chuck having a contaminant containment layer and method of fabricating same
JP4614416B2 (ja) * 2003-05-29 2011-01-19 日東電工株式会社 半導体チップの製造方法およびダイシング用シート貼付け装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4384918A (en) * 1980-09-30 1983-05-24 Fujitsu Limited Method and apparatus for dry etching and electrostatic chucking device used therein
JPS6059104B2 (ja) * 1982-02-03 1985-12-23 株式会社東芝 静電チヤツク板

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100695203B1 (ko) * 2006-07-31 2007-03-16 안병돈 내부에 지지심을 갖는 기판 이송롤러용 샤프트

Also Published As

Publication number Publication date
TW344087B (en) 1998-11-01
CN1139766A (zh) 1997-01-08
DE19531699A1 (de) 1996-12-05
JPH08330399A (ja) 1996-12-13
GB2301480A (en) 1996-12-04
GB9517702D0 (en) 1995-11-01

Similar Documents

Publication Publication Date Title
JP4149002B2 (ja) 静電チャックおよび物体の温度をプラズマ処理中制御する方法
CN101809717B (zh) 用于等离子处理设备的喷头电极总成的温度控制模块
KR940012570A (ko) 저열팽창 클램프 장치 및 클램핑 방법
US8529729B2 (en) Plasma processing chamber component having adaptive thermal conductor
KR940022750A (ko) 반도체 웨이퍼 냉각방법 및 장치
JPS6432675A (en) Method of forming insulated island on silicon substrate
DE69939131D1 (de) Polyamidfilm und Polyamidlaminatfilm
ES2086509T3 (es) Captador semiconductor para caudal.
SE8101683L (sv) Vermeelement, serskilt som golv eller golvelement, och sett att framstella detsamma
JPH04321814A (ja) セラミツクス部材と金属部材との焼ばめ結合体
KR960043037A (ko) 접촉식 서머척 및 그 제조방법
GB1413922A (en) Cooling system for semiconductor devices
Reeber et al. Heat transfer of modified silicon surfaces
US2288788A (en) Method of treating the heat-responsive elements of thermostats
JP2020080365A (ja) ウェハーステージ、半導体製造装置、ウェハーステージの製造方法
KR870003472A (ko) 양극처리된 메모리 디스크 기판 및 그 제조방법
JPH0328439Y2 (zh)
JP2003342752A (ja) 真空用耐熱耐蝕コーティング部材、同部材を用いた部品を有する真空装置及び同コーティング方法
KR900003603A (ko) 냉각 장치
KR100572970B1 (ko) 마오코팅이 적용된 반도체 제조장치
KR20240036897A (ko) 표면 처리 방법 및 이를 이용한 정전척 제조 방법
US11309203B2 (en) Wafer stage and method of manufacturing the same
KR940004252Y1 (ko) 냉장고의 증발기
KR970023592A (ko) 웨이퍼 온도 측정 방법
JP2024047964A (ja) 試料保持具

Legal Events

Date Code Title Description
A201 Request for examination
WITB Written withdrawal of application