GB9517702D0 - Contact-type thermo chuck and fabricating method therefor - Google Patents

Contact-type thermo chuck and fabricating method therefor

Info

Publication number
GB9517702D0
GB9517702D0 GBGB9517702.8A GB9517702A GB9517702D0 GB 9517702 D0 GB9517702 D0 GB 9517702D0 GB 9517702 A GB9517702 A GB 9517702A GB 9517702 D0 GB9517702 D0 GB 9517702D0
Authority
GB
United Kingdom
Prior art keywords
contact
method therefor
fabricating method
type thermo
thermo chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9517702.8A
Other versions
GB2301480A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of GB9517702D0 publication Critical patent/GB9517702D0/en
Publication of GB2301480A publication Critical patent/GB2301480A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67103Apparatus for thermal treatment mainly by conduction
GB9517702A 1995-05-29 1995-08-30 Thermo chuck for mounting wafers Withdrawn GB2301480A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950013696A KR960043037A (en) 1995-05-29 1995-05-29 Contact type thermostatic chuck and its manufacturing method

Publications (2)

Publication Number Publication Date
GB9517702D0 true GB9517702D0 (en) 1995-11-01
GB2301480A GB2301480A (en) 1996-12-04

Family

ID=19415762

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9517702A Withdrawn GB2301480A (en) 1995-05-29 1995-08-30 Thermo chuck for mounting wafers

Country Status (6)

Country Link
JP (1) JPH08330399A (en)
KR (1) KR960043037A (en)
CN (1) CN1139766A (en)
DE (1) DE19531699A1 (en)
GB (1) GB2301480A (en)
TW (1) TW344087B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW303505B (en) * 1996-05-08 1997-04-21 Applied Materials Inc Substrate support chuck having a contaminant containment layer and method of fabricating same
JP4614416B2 (en) * 2003-05-29 2011-01-19 日東電工株式会社 Semiconductor chip manufacturing method and dicing sheet pasting apparatus
KR100695203B1 (en) * 2006-07-31 2007-03-16 안병돈 Shaft for transport roller glass having core

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4384918A (en) * 1980-09-30 1983-05-24 Fujitsu Limited Method and apparatus for dry etching and electrostatic chucking device used therein
JPS6059104B2 (en) * 1982-02-03 1985-12-23 株式会社東芝 electrostatic chuck board

Also Published As

Publication number Publication date
TW344087B (en) 1998-11-01
CN1139766A (en) 1997-01-08
KR960043037A (en) 1996-12-21
JPH08330399A (en) 1996-12-13
DE19531699A1 (en) 1996-12-05
GB2301480A (en) 1996-12-04

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)